Inventor · disambiguated record
Yongjing Lin
Also filed as: LIN YONGJING
12 granted patents·16 pending applications·13 citations·filing 2009–2024
85Inventor score
Top patents by PatentIndex Score
28 records- 0196US11289579B2P-type dipole for p-FETAPPLIED MATERIALS INC·Filed 2020·Granted Mar 29, 2022·4 cites·10 claims
- 0295US11658218B2P-type dipole for p-FETAPPLIED MATERIALS INC·Filed 2022·Granted May 23, 2023·2 cites·19 claims
- 0388US11245022B2Integrated dipole flow for transistorAPPLIED MATERIALS INC·Filed 2020·Granted Feb 8, 2022·2 cites·7 claims
- 0480US11996455B2P-type dipole for P-FETAPPLIED MATERIALS INC·Filed 2023·Granted May 28, 2024·0 cites·16 claims
- 0574US8216436B2Hetero-nanostructures for solar energy conversions and methods of fabricating sameWANG DUNWEI·Filed 2009·Granted Jul 10, 2012·4 cites·20 claims
- 0673US11075276B2Methods and apparatus for n-type metal oxide semiconductor (NMOS) metal gate materials using atomic layer deposition (ALD) processes with metal based precursorsAPPLIED MATERIALS INC·Filed 2019·Granted Jul 27, 2021·1 cites·16 claims
- 0772US12328872B2Liner for V-NAND word line stackAPPLIED MATERIALS INC·Filed 2022·Granted Jun 10, 2025·0 cites·7 claims
- 0868US11888045B2Integrated dipole flow for transistorAPPLIED MATERIALS INC·Filed 2021·Granted Jan 30, 2024·0 cites·16 claims
- 0962US11476267B2Liner for V-NAND word line stackAPPLIED MATERIALS INC·Filed 2020·Granted Oct 18, 2022·0 cites·8 claims
- 1059US2025343067A1Volume reduction in semiconductor processing chamberAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1159US2023193463A1Gas Distribution ApparatusesAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1258US2014061036A1Hematite Photovoltaic JunctionsTRUSTEES BOSTON COLLEGE·Filed 2013·Application pending·0 cites
- 1357US2023313378A1Methods of preventing metal contamination by ceramic heaterAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1456US2025118563A1Titanium nitride gapfill processes for semiconductor structuresAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1556US2020071825A1Methods Of Depositing Metal Carbide FilmsAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 1655US11171047B2Fluorine-doped nitride films for improved high-k reliabilityAPPLIED MATERIALS INC·Filed 2020·Granted Nov 9, 2021·0 cites·18 claims
- 1754US2025081593A1Methods of improving pmos transistor performanceAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1853US2025046600A1Titanium nitride gapfill processes for semiconductor devicesAPPLIED MATERLALS INC·Filed 2023·Application pending·0 cites
- 1953US2023295803A1Methods of growing metal-containing filmsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2051US2023113514A1Methods for seamless gap filling using gradient oxidationAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 2151US2024087899A1Radical treatment for metal gate stackAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 2250US2024204061A1Method of reducing metal gate resistance for next generation nmos device applicationAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 2350US2022367236A1Heater pedestal with improved uniformityAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 2446US11101128B1Methods for gapfill in substratesAPPLIED MATERIALS INC·Filed 2020·Granted Aug 24, 2021·0 cites·20 claims
- 2546US2021134972A1PMOS High-K Metal GatesAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 2645US2022064785A1Apparatus and methods for gas phase particle reductionAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 2743US11276569B2On stack overlay improvement for 3D NANDAPPLIED MATERIALS INC·Filed 2019·Granted Mar 15, 2022·0 cites·20 claims
- 2837US2014000697A1Nanonet-Based Hematite Hetero-Nanostructures for Solar Energy Conversions and Methods of Fabricating SameWANG DUNWEI·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →