Inventor · disambiguated record
Yoshinori Morisada
Also filed as: MORISADA YOSHINORI
21 granted patents·11 pending applications·2,450 citations·filing 1999–2024
96Inventor score
Top patents by PatentIndex Score
32 records- 0197US6559520B2Siloxan polymer film on semiconductor substrateASM JAPAN·Filed 2002·Granted May 6, 2003·87 cites·3 claims
- 0297US6383955B1Silicone polymer insulation film on semiconductor substrate and method for forming the filmASM JAPAN·Filed 1999·Granted May 7, 2002·857 cites·13 claims
- 0397US6352945B1Silicone polymer insulation film on semiconductor substrate and method for forming the filmASM JAPAN·Filed 1999·Granted Mar 5, 2002·718 cites·12 claims
- 0496US7504344B2Method of forming a carbon polymer film using plasma CVDASM JAPAN·Filed 2005·Granted Mar 17, 2009·419 cites·31 claims
- 0595US6631692B1Plasma CVD film-forming deviceASM JAPAN·Filed 2000·Granted Oct 14, 2003·73 cites·13 claims
- 0694US6881683B2Insulation film on semiconductor substrate and method for forming sameASM JAPAN·Filed 2002·Granted Apr 19, 2005·51 cites·28 claims
- 0793US7064088B2Method for forming low-k hard filmASM JAPAN·Filed 2003·Granted Jun 20, 2006·62 cites·31 claims
- 0893US6514880B2Siloxan polymer film on semiconductor substrate and method for forming sameASM JAPAN·Filed 2001·Granted Feb 4, 2003·63 cites·11 claims
- 0991US6740367B2Plasma CVD film-forming deviceASM JAPAN·Filed 2002·Granted May 25, 2004·34 cites·6 claims
- 1087US6784123B2Insulation film on semiconductor substrate and method for forming sameASM JAPAN·Filed 2003·Granted Aug 31, 2004·28 cites·19 claims
- 1180US6852650B2Insulation film on semiconductor substrate and method for forming sameASM JAPAN·Filed 2002·Granted Feb 8, 2005·19 cites·20 claims
- 1278US7410915B2Method of forming carbon polymer film using plasma CVDASM JAPAN·Filed 2006·Granted Aug 12, 2008·6 cites·40 claims
- 1378US7381291B2Dual-chamber plasma processing apparatusASM JAPAN·Filed 2004·Granted Jun 3, 2008·24 cites·19 claims
- 1474US2024240324A1Carbon hard mask, film forming apparatus, and film forming methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1568US7470633B2Method of forming a carbon polymer film using plasma CVDASM JAPAN·Filed 2006·Granted Dec 30, 2008·3 cites·15 claims
- 1664US7799134B2Shower plate having projections and plasma CVD apparatus using sameASM JAPAN·Filed 2005·Granted Sep 21, 2010·1 cites·13 claims
- 1762US7638441B2Method of forming a carbon polymer film using plasma CVDASM JAPAN·Filed 2007·Granted Dec 29, 2009·1 cites·11 claims
- 1861US11993849B2Carbon hard mask, film forming apparatus, and film forming methodTOKYO ELECTRON LTD·Filed 2019·Granted May 28, 2024·0 cites·3 claims
- 1961US2025144667A1Substrate-processing methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2057US12060635B2Hard mask, substrate processing method, and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Aug 13, 2024·0 cites·7 claims
- 2155US2009090382A1Method of self-cleaning of carbon-based filmASM JAPAN·Filed 2007·Application pending·0 cites
- 2255US2024321571A1Insulating film forming method and substrate processing systemTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2355US2021301402A1Film forming apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 2454US6759344B2Method for forming low dielectric constant interlayer insulation filmASM JAPAN·Filed 2002·Granted Jul 6, 2004·4 cites·25 claims
- 2554US2025166990A1Method for forming insulating film, and substrate processing systemTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2653US2025171890A1Embedding method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2750US2023295797A1Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 2849US9422452B2Polymerized film forming methodTOKYO ELECTRON LTD·Filed 2015·Granted Aug 23, 2016·0 cites·13 claims
- 2949US2024087883A1Method for forming silicon-containing film and film forming apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 3048US2007065597A1Plasma CVD film formation apparatus provided with maskSAMSUNG ELECTRONICS CO LTD·Filed 2005·Application pending·0 cites
- 3140US9708507B2Method for improving chemical resistance of polymerized film, polymerized film forming method, film forming apparatus, and electronic product manufacturing methodTOKYO ELECTRON LTD·Filed 2015·Granted Jul 18, 2017·0 cites·15 claims
- 3237US2006105583A1Formation technology of nano-particle films having low dielectric constantUNIV KYUSHU NAT UNIV CORP·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →