Inventor · disambiguated record
Yoshimasa Nagatomi
Also filed as: NAGATOMI YOSHIMASA
9 granted patents·5 pending applications·19 citations·filing 2018–2024
82Inventor score
Technology areasH10P
Top patents by PatentIndex Score
14 records- 0192US11293096B2Substrate processing apparatus, method for manufacturing semiconductor device and vaporizerHITACHI INT ELECTRIC INC·Filed 2018·Granted Apr 5, 2022·8 cites·12 claims
- 0289US10707074B2Method for manufacturing semiconductor device, non-transitory computer-readable recording medium, and substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2018·Granted Jul 7, 2020·5 cites·5 claims
- 0383US12503767B2Non-transitory computer-readable recording medium, substrate processing apparatus and substrate processing methodKOKUSAI ELECTRIC CORP·Filed 2024·Granted Dec 23, 2025·0 cites·20 claims
- 0481US10910217B2Method for manufacturing semiconductor device, non-transitory computer-readable recording medium, and substrate processing apparatusKOKUSAI ELECTRIC CORP·Filed 2020·Granted Feb 2, 2021·1 cites·4 claims
- 0573USD1020668SGas injector for substrate processing apparatusKOKUSAI ELECTRIC CORP·Filed 2021·Granted Apr 2, 2024·5 cites·1 claims
- 0672US12000045B2Method of manufacturing semiconductor device, non-transitory computer-readable recording medium, substrate processing apparatus and substrate processing methodKOKUSAI ELECTRIC CORP·Filed 2021·Granted Jun 4, 2024·0 cites·21 claims
- 0771US11970771B2Vaporizer, substrate processing apparatus and method for manufacturing semiconductor deviceKOKUSAI ELECTRIC CORP·Filed 2022·Granted Apr 30, 2024·0 cites·22 claims
- 0860US2025006490A1Substrate processing method, method of manufacturing semiconductor device, non-transitory computer-readable recording medium and substrate processing apparatusKOKUSAI ELECTRIC CORP·Filed 2024·Application pending·0 cites
- 0959US2024287672A1Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2024·Application pending·0 cites
- 1055US12503768B2Substrate processing apparatus, method of manufacturing semiconductor device, method of processing substrate, and gas injectorKOKUSAI ELECTRIC CORP·Filed 2022·Granted Dec 23, 2025·0 cites·14 claims
- 1154US2022403511A1Substrate processing apparatus, exhaust device and method of manufacturing semiconductor deviceKOKUSAI ELECTRIC CORP·Filed 2022·Application pending·0 cites
- 1254US2023098746A1Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2022·Application pending·0 cites
- 1351US12249502B2Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording mediumKOKUSAI ELECTRIC CORP·Filed 2021·Granted Mar 11, 2025·0 cites·19 claims
- 1447US2022119949A1Substrate processing apparatus, recording medium, and method of processing substrateKOKUSAI ELECTRIC CORP·Filed 2021·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →