Inventor · disambiguated record
Yoshihiro Takezawa
Also filed as: TAKEZAWA YOSHIHIRO
12 granted patents·12 pending applications·6 citations·filing 2008–2025
81Inventor score
Files withTOKYO ELECTRON LTD24
Top patents by PatentIndex Score
24 records- 0182US11260433B2Cleaning method of substrate processing apparatus and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Mar 1, 2022·2 cites·7 claims
- 0273US11047044B2Film forming apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2017·Granted Jun 29, 2021·2 cites·11 claims
- 0367US9234275B2Method and apparatus of forming metal compound film, and electronic productTOKYO ELECTRON LTD·Filed 2013·Granted Jan 12, 2016·2 cites·10 claims
- 0465US11486043B2Metal contamination prevention method and apparatus, and substrate processing method using the same and apparatus thereforTOKYO ELECTRON LTD·Filed 2019·Granted Nov 1, 2022·0 cites·14 claims
- 0565US2025313933A1Method for operating film forming device and film forming deviceTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0662US12351904B2Film deposition method and method for forming polycrystalline silicon filmTOKYO ELECTRON LTD·Filed 2022·Granted Jul 8, 2025·0 cites·8 claims
- 0760US11587787B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Feb 21, 2023·0 cites·12 claims
- 0860US2025079171A1Substrate-processing method and substrate-processing deviceTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0959US12080552B2Method of depositing silicon film and film deposition apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Sep 3, 2024·0 cites·4 claims
- 1057US12252786B2Cleaning method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Mar 18, 2025·0 cites·12 claims
- 1156US12112947B2Method of crystallizing amorphous silicon film and deposition apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Oct 8, 2024·0 cites·11 claims
- 1256US11749530B2Method of removing phosphorus-doped silicon film and system thereforTOKYO ELECTRON LTD·Filed 2021·Granted Sep 5, 2023·0 cites·12 claims
- 1356US2025313932A1Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1456US2024128081A1Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1553US2025316477A1Film forming methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1653US2024328033A1Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1750US12027384B2Heat treatment apparatus and dummy substrate processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Jul 2, 2024·0 cites·6 claims
- 1850US2025270689A1Film-forming method and film-forming apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1948US2022068642A1Substrate processing method and substrate processing deviceTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 2045US2009110824A1Substrate processing apparatus and method of controlling substrate processing apparatusTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 2143US10734221B2Method of manufacturing semiconductor device and method of forming metal oxide filmTOKYO ELECTRON LTD·Filed 2018·Granted Aug 4, 2020·0 cites·15 claims
- 2242US2020312677A1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 2341US2020308696A1Film Forming Method and Film Forming ApparatusTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 2435US2018182652A1Substrate processing apparatus, substrate processing method, and substrate processing systemTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →