Inventor · disambiguated record
Yohei Yamazawa
Also filed as: YAMAZAWA YOHEI
70 granted patents·33 pending applications·1,253 citations·filing 2001–2025
99Inventor score
Top patents by PatentIndex Score
103 records- 0198US9941097B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Apr 10, 2018·110 cites·8 claims
- 0298US9313872B2Plasma processing apparatus and plasma processing methodYAMAZAWA YOHEI·Filed 2010·Granted Apr 12, 2016·52 cites·27 claims
- 0398US7951262B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted May 31, 2011·486 cites·21 claims
- 0497US8603293B2Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2011·Granted Dec 10, 2013·73 cites·22 claims
- 0597US7988816B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted Aug 2, 2011·63 cites·22 claims
- 0696US11600474B2RF voltage and current (V-I) sensors and measurement methodsTOKYO ELECTRON LTD·Filed 2020·Granted Mar 7, 2023·6 cites·19 claims
- 0796US7415940B2Plasma processorTOKYO ELECTRON LTD·Filed 2002·Granted Aug 26, 2008·75 cites·32 claims
- 0895US11990318B2Filter circuitTOKYO ELECTRON LTD·Filed 2021·Granted May 21, 2024·2 cites·10 claims
- 0995US9997332B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2016·Granted Jun 12, 2018·11 cites·6 claims
- 1095US8415885B2Plasma processing apparatus and plasma processing methodYAMAZAWA YOHEI·Filed 2011·Granted Apr 9, 2013·25 cites·26 claims
- 1195US7740737B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted Jun 22, 2010·25 cites·14 claims
- 1294US9953811B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2014·Granted Apr 24, 2018·16 cites·9 claims
- 1394US9293299B2Plasma processing apparatusYAMAZAWA YOHEI·Filed 2012·Granted Mar 22, 2016·16 cites·27 claims
- 1494US8894806B2Plasma processing apparatus and plasma processing methodKOSHIMIZU CHISHIO·Filed 2010·Granted Nov 25, 2014·22 cites·10 claims
- 1593US9627181B2Plasma processing apparatusYAMAZAWA YOHEI·Filed 2011·Granted Apr 18, 2017·17 cites·24 claims
- 1693US9253867B2Plasma processing apparatus and plasma processing methodYAMAZAWA YOHEI·Filed 2010·Granted Feb 2, 2016·11 cites·10 claims
- 1793US8137471B2Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2010·Granted Mar 20, 2012·12 cites·22 claims
- 1891US7582182B2Method and apparatus for measuring electron density of plasma and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2007·Granted Sep 1, 2009·14 cites·6 claims
- 1990US12451327B2Apparatus for plasma processingTOKYO ELECTRON LTD·Filed 2022·Granted Oct 21, 2025·1 cites·9 claims
- 2089US11817296B2RF voltage and current (V-I) sensors and measurement methodsTOKYO ELECTRON LTD·Filed 2020·Granted Nov 14, 2023·2 cites·20 claims
- 2189US11410832B2RF measurement system and methodTOKYO ELECTRON LTD·Filed 2020·Granted Aug 9, 2022·2 cites·22 claims
- 2289US9490105B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2013·Granted Nov 8, 2016·6 cites·19 claims
- 2389US8398815B2Plasma processing apparatusYAMAZAWA YOHEI·Filed 2008·Granted Mar 19, 2013·12 cites·32 claims
- 2489US8251011B2Plasma processing apparatusYAMAZAWA YOHEI·Filed 2007·Granted Aug 28, 2012·13 cites·19 claims
- 2589US7712436B2Plasma processing apparatus with filter circuitTOKYO ELECTRON LTD·Filed 2008·Granted May 11, 2010·15 cites·24 claims
- 2688US8741097B2Plasma processing apparatus and plasma processing methodYAMAZAWA YOHEI·Filed 2010·Granted Jun 3, 2014·7 cites·11 claims
- 2788US8608903B2Plasma processing apparatus and plasma processing methodYAMAZAWA YOHEI·Filed 2010·Granted Dec 17, 2013·9 cites·13 claims
- 2888US7432467B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2007·Granted Oct 7, 2008·11 cites·14 claims
- 2987US10854431B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2019·Granted Dec 1, 2020·2 cites·12 claims
- 3086US9218943B2Plasma processing apparatus and plasma processing methodYAMAZAWA YOHEI·Filed 2011·Granted Dec 22, 2015·8 cites·15 claims
- 3185US9275837B2Plasma processing apparatusYAMAZAWA YOHEI·Filed 2010·Granted Mar 1, 2016·7 cites·8 claims
- 3284US10020167B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Jul 10, 2018·3 cites·14 claims
- 3383US10546727B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2016·Granted Jan 28, 2020·2 cites·9 claims
- 3483US8261691B2Plasma processing apparatusYAMAZAWA YOHEI·Filed 2008·Granted Sep 11, 2012·7 cites·19 claims
- 3583US7611603B2Plasma processing apparatus having impedance varying electrodesTOKYO ELECTRON LTD·Filed 2007·Granted Nov 3, 2009·7 cites·10 claims
- 3682US9583312B2Film formation device, substrate processing device, and film formation methodTOKYO ELECTRON LTD·Filed 2013·Granted Feb 28, 2017·5 cites·9 claims
- 3782US9167680B2Plasma processing apparatus, plasma generating apparatus, antenna structure and plasma generating methodTOKYO ELECTRON LTD·Filed 2013·Granted Oct 20, 2015·5 cites·19 claims
- 3882US7339656B2Method and apparatus for measuring electron density of plasma and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2004·Granted Mar 4, 2008·20 cites·31 claims
- 3981US10804076B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2016·Granted Oct 13, 2020·3 cites·6 claims
- 4080US8790490B2Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2012·Granted Jul 29, 2014·3 cites·14 claims
- 4180US7737706B2Method and apparatus for inspecting process performance for use in a plasma processing apparatusTOKYO ELECTRON LTD·Filed 2007·Granted Jun 15, 2010·5 cites·15 claims
- 4280US7527016B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2003·Granted May 5, 2009·16 cites·11 claims
- 4379US12176183B2RF voltage and current (V-I) sensors and measurement methodsTOKYO ELECTRON LTD·Filed 2023·Granted Dec 24, 2024·0 cites·18 claims
- 4479US8647442B2Cleaning substrate and cleaning methodYAMAZAWA YOHEI·Filed 2012·Granted Feb 11, 2014·2 cites·4 claims
- 4579US8431035B2Plasma processing apparatus and methodIWATA MANABU·Filed 2009·Granted Apr 30, 2013·4 cites·5 claims
- 4679US7462293B2Method and apparatus for measuring electron density of plasma and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2007·Granted Dec 9, 2008·4 cites·8 claims
- 4778US7655110B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2007·Granted Feb 2, 2010·4 cites·19 claims
- 4876US10679867B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Jun 9, 2020·1 cites·10 claims
- 4976US10381197B2Transformer, plasma processing apparatus, and plasma processing methodTOKYO ELECTRON LTD·Filed 2017·Granted Aug 13, 2019·2 cites·24 claims
- 5074US2021082669A1Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
Showing the top 50 of 103 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →