Inventor · disambiguated record
Yuichi Furuya
Also filed as: FURUYA YUICHI
10 granted patents·6 pending applications·2 citations·filing 2012–2024
76Inventor score
Top patents by PatentIndex Score
16 records- 0184US11441224B2Method of controlling substrate processing apparatus, and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Sep 13, 2022·2 cites·12 claims
- 0261US11796460B2Absorbance analysis apparatus for DCR gas, absorbance analysis method for DCR gas, and absorbance analysis program recording medium on which program for DCR gas is recordedTOKYO ELECTRON LTD·Filed 2022·Granted Oct 24, 2023·0 cites·5 claims
- 0361US2024124971A1Vaporization device, semiconductor manufacturing system, and method for vaporizing solid raw materialTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0460US11753720B2Film forming apparatus, source supply apparatus, and film forming methodTOKYO ELECTRON LTD·Filed 2019·Granted Sep 12, 2023·0 cites·15 claims
- 0559US2023093323A1Film forming apparatus, film forming method, and film forming systemTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 0658US2025075319A1Substrate processing apparatus and method of suppressing oxygen incorporationTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0757US12392033B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Aug 19, 2025·0 cites·10 claims
- 0855US2021388493A1Film forming apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 0949US12344930B2Deposition method and deposition apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jul 1, 2025·0 cites·3 claims
- 1047US12400841B2Trap device and semiconductor manufacturing deviceTOKYO ELECTRON LTD·Filed 2021·Granted Aug 26, 2025·0 cites·9 claims
- 1145US11306847B2Valve device, processing apparatus, and control methodTOKYO ELECTRON LTD·Filed 2019·Granted Apr 19, 2022·0 cites·9 claims
- 1241US11466365B2Film-forming apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Oct 11, 2022·0 cites·12 claims
- 1340US11193205B2Source material containerTOKYO ELECTRON LTD·Filed 2018·Granted Dec 7, 2021·0 cites·7 claims
- 1436US10156014B2Gas treatment apparatus and gas treatment methodTOKYO ELECTRON LTD·Filed 2017·Granted Dec 18, 2018·0 cites·6 claims
- 1536US2019078207A1Gas supply apparatus and film forming apparatusTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 1631US2013180448A1Substrate transfer device and substrate processing systemSAKAUE HIROMITSU·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →