Inventor · disambiguated record
Yuri Granik
Also filed as: GRANIK YURI
31 granted patents·8 pending applications·742 citations·filing 1999–2019
97Inventor score
Files withMENTOR GRAPHICS CORP16GRANIK YURI13TORRES ROBLES JUAN ANDRES3KUSNADI IR2ROBLES JUAN ANDRES TORRES2
Top patents by PatentIndex Score
39 records- 0198US7237221B2Matrix optical process correctionGRANIK YURI·Filed 2005·Granted Jun 26, 2007·80 cites·8 claims
- 0297US7245354B2Source optimization for image fidelity and throughputGRANIK YURI·Filed 2005·Granted Jul 17, 2007·32 cites·19 claims
- 0397US6928634B2Matrix optical process correctionFiled 2003·Granted Aug 9, 2005·94 cites·16 claims
- 0496US8434031B2Inverse mask design and correction for electronic designGRANIK YURI·Filed 2011·Granted Apr 30, 2013·17 cites·19 claims
- 0596US7487489B2Calculation system for inverse masksGRANIK YURI·Filed 2006·Granted Feb 3, 2009·33 cites·14 claims
- 0696US7378202B2Grid-based resist simulationMENTOR GRAPHICS CORP·Filed 2006·Granted May 27, 2008·39 cites·6 claims
- 0796US7013439B2Contrast based resolution enhancing technologyROBLES JUAN ANDRES TORRES·Filed 2003·Granted Mar 14, 2006·92 cites·21 claims
- 0895US7623220B2Source optimization for image fidelity and throughputGRANIK YURI·Filed 2007·Granted Nov 24, 2009·21 cites·34 claims
- 0995US7552416B2Calculation system for inverse masksGRANIK YURI·Filed 2007·Granted Jun 23, 2009·24 cites·9 claims
- 1094US11061373B1Method and system for calculating probability of success or failure for a lithographic process due to stochastic variations of the lithographic processMENTOR GRAPHICS CORP·Filed 2019·Granted Jul 13, 2021·12 cites·17 claims
- 1194US7987434B2Calculation system for inverse masksMENTOR GRAPHICS CORP·Filed 2009·Granted Jul 26, 2011·20 cites·18 claims
- 1294US6643616B1Integrated device structure prediction based on model curvatureFiled 1999·Granted Nov 4, 2003·100 cites·6 claims
- 1391US7234130B2Long range corrections in integrated circuit layout designsWORD JAMES·Filed 2005·Granted Jun 19, 2007·31 cites·15 claims
- 1489US7293249B2Contrast based resolution enhancement for photolithographic processingTORRES ROBLES JUAN ANDRES·Filed 2004·Granted Nov 6, 2007·53 cites·23 claims
- 1587US8799832B1Optical proximity correction for topographically non-uniform substratesMENTOR GRAPHICS CORP·Filed 2013·Granted Aug 5, 2014·5 cites·20 claims
- 1686US8037429B2Model-based SRAF insertionMENTOR GRAPHICS CORP·Filed 2005·Granted Oct 11, 2011·18 cites·6 claims
- 1785US9330228B2Generating guiding patterns for directed self-assemblyMENTOR GRAPHICS CORP·Filed 2015·Granted May 3, 2016·4 cites·20 claims
- 1883US7562336B2Contrast based resolution enhancement for photolithographic processingTORRES ROBLES JUAN ANDRES·Filed 2007·Granted Jul 14, 2009·11 cites·15 claims
- 1982US9032357B1Generating guiding patterns for directed self-assemblyMENTOR GRAPHICS CORP·Filed 2013·Granted May 12, 2015·6 cites·20 claims
- 2082US8788982B2Layout design defect repair using inverse lithographyMENTOR GRAPHICS CORP·Filed 2013·Granted Jul 22, 2014·5 cites·15 claims
- 2181US8108806B2Contrast-based resolution enhancement for photolithographic processingROBLES JUAN ANDRES TORRES·Filed 2009·Granted Jan 31, 2012·8 cites·20 claims
- 2281US7805699B2Shape-based photolithographic model calibrationMENTOR GRAPHICS CORP·Filed 2007·Granted Sep 28, 2010·8 cites·34 claims
- 2381US7392168B2Method of compensating for etch effects in photolithographic processingGRANIK YURI·Filed 2001·Granted Jun 24, 2008·19 cites·24 claims
- 2475US9418195B2Layout content analysis for source mask optimization accelerationMENTOR GRAPHICS CORP·Filed 2014·Granted Aug 16, 2016·2 cites·16 claims
- 2574US9323161B2Source optimization by assigning pixel intensities for diffractive optical element using mathematical relationshipGRANIK YURI·Filed 2009·Granted Apr 26, 2016·2 cites·13 claims
- 2674US8843859B2Layout content analysis for source mask optimization accelerationMENTOR GRAPHICS CORP·Filed 2012·Granted Sep 23, 2014·2 cites·14 claims
- 2769US9678435B1Horizontal development bias in negative tone development of photoresistMENTOR GRAPHICS CORP·Filed 2014·Granted Jun 13, 2017·1 cites·9 claims
- 2868US8464185B2Electron beam simulation corner correction for optical lithographyGRANIK YURI·Filed 2009·Granted Jun 11, 2013·2 cites·16 claims
- 2960US10248028B2Source optimization for image fidelity and throughputMENTOR GRAPHICS CORP·Filed 2016·Granted Apr 2, 2019·0 cites·19 claims
- 3057US2010269084A1Visibility and Transport Kernels for Variable Etch Bias Modeling of Optical LithographyGRANIK YURI·Filed 2009·Application pending·0 cites
- 3154US8607168B2Contour alignment for model calibrationKUSNADI IR·Filed 2011·Granted Dec 10, 2013·1 cites·25 claims
- 3252US9355201B2Density-based integrated circuit design adjustmentMENTOR GRAPHICS CORP·Filed 2013·Granted May 31, 2016·0 cites·15 claims
- 3348US2011138343A1Pattern Transfer Modeling for Optical Lithographic ProcessesGRANIK YURI·Filed 2010·Application pending·0 cites
- 3448US2010023915A1Calculation System For Inverse MasksGRANIK YURI·Filed 2009·Application pending·0 cites
- 3548US2011004856A1Inverse Mask Design and Correction for Electronic DesignGRANIK YURI·Filed 2010·Application pending·0 cites
- 3646US2011047519A1Layout Content Analysis for Source Mask Optimization AccelerationTORRES ROBLES JUAN ANDRES·Filed 2010·Application pending·0 cites
- 3742US2013227500A1Calculation System For Inverse MasksMENTOR GRAPHICS CORP·Filed 2012·Application pending·0 cites
- 3837US2016140278A1Modeling Photoresist Shrinkage Effects In LithographyMENTOR GRAPHICS CORP·Filed 2016·Application pending·0 cites
- 3925US2011202893A1Contour Self-Alignment For Optical Proximity Correction Model CalibrationKUSNADI IR·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →