Inventor · disambiguated record
Yusuke Hirayama
Also filed as: HIRAYAMA YUSUKE
18 granted patents·1 pending application·394 citations·filing 1998–2021
92Inventor score
Top patents by PatentIndex Score
19 records- 0197US8114245B2Plasma etching deviceOHMI TADAHIRO·Filed 2002·Granted Feb 14, 2012·157 cites·12 claims
- 0297US6585851B1Plasma etching deviceOHMI TADAHIRO·Filed 1998·Granted Jul 1, 2003·178 cites·26 claims
- 0389US11705313B2Inspection method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jul 18, 2023·2 cites·9 claims
- 0481US11183374B2Wastage determination method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Nov 23, 2021·1 cites·16 claims
- 0580US10290476B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted May 14, 2019·3 cites·15 claims
- 0680US7628931B2Processing method for conservation of processing gasesTOKYO ELECTRON LTD·Filed 2005·Granted Dec 8, 2009·7 cites·6 claims
- 0779US6153068AParallel plate sputtering device with RF powered auxiliary electrodes and applied external magnetic fieldOHMI TADAHIRO·Filed 1998·Granted Nov 28, 2000·34 cites·2 claims
- 0871US8975188B2Plasma etching methodHIRAYAMA YUSUKE·Filed 2012·Granted Mar 10, 2015·4 cites·6 claims
- 0970US7405162B2Etching method and computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2005·Granted Jul 29, 2008·3 cites·10 claims
- 1062US8664117B2Method for manufacturing semiconductor device using anisotropic etchingONO KATSUYUKI·Filed 2011·Granted Mar 4, 2014·2 cites·10 claims
- 1160US8821683B2Substrate processing apparatus and method, and program and storage mediumHIRAYAMA YUSUKE·Filed 2006·Granted Sep 2, 2014·1 cites·9 claims
- 1259US8716144B2Method for manufacturing semiconductor deviceUDA SHUICHIRO·Filed 2010·Granted May 6, 2014·2 cites·4 claims
- 1358US12121963B2Metastable single-crystal rare earth magnet fine powder and method for producing sameAIST·Filed 2020·Granted Oct 22, 2024·0 cites·9 claims
- 1454US10763089B2Wastage determination method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Sep 1, 2020·0 cites·17 claims
- 1551US8558134B2Plasma processing apparatus and plasma processing methodHIRAYAMA YUSUKE·Filed 2009·Granted Oct 15, 2013·0 cites·16 claims
- 1645US2009221148A1Plasma etching method, plasma etching apparatus and computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1744US7682978B2Plasma processing method and high-rate plasma etching apparatusTOKYO ELECTRON LTD·Filed 2006·Granted Mar 23, 2010·0 cites·15 claims
- 1839US10068778B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Sep 4, 2018·0 cites·16 claims
- 1930US8975191B2Plasma etching methodTOHNOE KAZUHITO·Filed 2012·Granted Mar 10, 2015·0 cites·4 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →