Inventor · disambiguated record
Yutaka Kouzuma
Also filed as: KOUZUMA YUTAKA
20 granted patents·4 pending applications·81 citations·filing 2007–2022
92Inventor score
Technology areasH10P
Top patents by PatentIndex Score
24 records- 0192US12449825B2Gas supply control deviceHITACHI HIGH TECH CORP·Filed 2021·Granted Oct 21, 2025·2 cites·11 claims
- 0286USD900760SIon shield plate for semiconductor manufacturing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Nov 3, 2020·26 cites·1 claims
- 0384US11915951B2Plasma processing methodHITACHI HIGH TECH CORP·Filed 2020·Granted Feb 27, 2024·1 cites·5 claims
- 0483US10825664B2Wafer processing method and wafer processing apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted Nov 3, 2020·3 cites·5 claims
- 0583USD864885SInfrared lamp heater transmission window for semiconductor manufacturing apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted Oct 29, 2019·24 cites·1 claims
- 0683US10325781B2Etching method and etching apparatusHITACHI HIGH TECH CORP·Filed 2017·Granted Jun 18, 2019·3 cites·12 claims
- 0772US11515167B2Plasma etching method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Nov 29, 2022·1 cites·14 claims
- 0870US11557463B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2021·Granted Jan 17, 2023·0 cites·10 claims
- 0969US10872779B2Plasma etching method and plasma etching apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Dec 22, 2020·1 cites·13 claims
- 1066USD924824SIon shield plate base for semiconductor manufacturing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Jul 13, 2021·10 cites·1 claims
- 1164USD901407SIntegrated type ion shield for semiconductor manufacturing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Nov 10, 2020·9 cites·1 claims
- 1263US12224158B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2022·Granted Feb 11, 2025·0 cites·10 claims
- 1362US10937635B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Mar 2, 2021·0 cites·10 claims
- 1455US10290472B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2016·Granted May 14, 2019·0 cites·8 claims
- 1555US8092637B2Manufacturing method in plasma processing apparatusKOUZUMA YUTAKA·Filed 2008·Granted Jan 10, 2012·1 cites·8 claims
- 1651US2018122665A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2017·Application pending·0 cites
- 1750US12442455B2Gas supply apparatus, vacuum processing apparatus, and gas supply methodHITACHI HIGH TECH CORP·Filed 2021·Granted Oct 14, 2025·0 cites·8 claims
- 1847US11276579B2Substrate processing method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted Mar 15, 2022·0 cites·12 claims
- 1946US2008236614A1Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2008·Application pending·0 cites
- 2045US11835465B2Detecting method and detecting device of gas components and processing apparatus using detecting device of gas componentsHITACHI HIGH TECH CORP·Filed 2019·Granted Dec 5, 2023·0 cites·5 claims
- 2145US2009321017A1Plasma Processing Apparatus and Plasma Processing MethodTSUBONE TSUNEHIKO·Filed 2008·Application pending·0 cites
- 2244US2008237184A1Method and apparatus for plasma processingYAKUSHIJI MAMORU·Filed 2007·Application pending·0 cites
- 2339US8282848B2Plasma processing method and plasma processing apparatusOHMOTO YUTAKA·Filed 2008·Granted Oct 9, 2012·0 cites·1 claims
- 2438US10141207B2Operation method of plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2017·Granted Nov 27, 2018·0 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →