Inventor · disambiguated record
Yung-Hee Yvette Lee
Also filed as: LEE YUNG HEE YVETTE · LEE YUNG-HEE · LEE YUNG-HEE Y
17 granted patents·5 pending applications·465 citations·filing 1998–2013
94Inventor score
Files withSAMSUNG ELECTRONICS CO LTD8APPLIED MATERIALS INC6UNIV CALIFORNIA4CHANDRACHOOD MADHAVI R1JEON YUN-KWANG1
Top patents by PatentIndex Score
22 records- 0197US7682518B2Process for etching a metal layer suitable for use in photomask fabricationAPPLIED MATERIALS INC·Filed 2006·Granted Mar 23, 2010·183 cites·18 claims
- 0292US8202441B2Process for etching a metal layer suitable for use in photomask fabricationCHANDRACHOOD MADHAVI R·Filed 2010·Granted Jun 19, 2012·22 cites·17 claims
- 0391US7250309B2Integrated phase angle and optical critical dimension measurement metrology for feed forward and feedback process controlAPPLIED MATERIALS INC·Filed 2004·Granted Jul 31, 2007·39 cites·19 claims
- 0488US6094012ALow energy spread ion source with a coaxial magnetic filterUNIV CALIFORNIA·Filed 1998·Granted Jul 25, 2000·54 cites·20 claims
- 0584US7285788B2Ion beam extractorSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Oct 23, 2007·10 cites·25 claims
- 0683US5945677AFocused ion beam systemUNIV CALIFORNIA·Filed 1999·Granted Aug 31, 1999·69 cites·20 claims
- 0781US7858464B2Methods of manufacturing non-volatile memory devices having insulating layers treated using neutral beam irradiationSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Dec 28, 2010·7 cites·17 claims
- 0880US8742400B2Graphene switching device including tunable barrierSAMSUNG ELECTRONICS CO LTD·Filed 2013·Granted Jun 3, 2014·5 cites·16 claims
- 0974US6921723B1Etching method having high silicon-to-photoresist selectivityAPPLIED MATERIALS INC·Filed 2002·Granted Jul 26, 2005·20 cites·32 claims
- 1072US9054708B2Touch sensor and touch panel including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2013·Granted Jun 9, 2015·3 cites·20 claims
- 1169US7521000B2Process for etching photomasksAPPLIED MATERIALS INC·Filed 2004·Granted Apr 21, 2009·6 cites·19 claims
- 1269US6486480B1Plasma formed ion beam projection lithography systemUNIV CALIFORNIA·Filed 1999·Granted Nov 26, 2002·26 cites·20 claims
- 1365US7365014B2Reticle fabrication using a removable hard maskAPPLIED MATERIALS INC·Filed 2004·Granted Apr 29, 2008·7 cites·13 claims
- 1453US7737040B2Method of reducing critical dimension bias during fabrication of a semiconductor deviceAPPLIED MATERIALS INC·Filed 2007·Granted Jun 15, 2010·0 cites·8 claims
- 1551US2007296980A1Integrated phase angle and optical critical dimension measurement metrology for feed forward and feedback process controlMAK ALFRED W·Filed 2007·Application pending·0 cites
- 1651US2008164819A1Semiconductor apparatus using ion beamSAMSUNG ELECTRONICS CO LTD·Filed 2008·Application pending·0 cites
- 1746US10157989B2Graphene electronic device and manufacturing method thereofLEE CHANG SEUNG·Filed 2012·Granted Dec 18, 2018·0 cites·20 claims
- 1846US6124834AGlass antenna for RF-ion source operationUNIV CALIFORNIA·Filed 1998·Granted Sep 26, 2000·14 cites·14 claims
- 1946US2008156771A1Etching apparatus using neutral beam and method thereofSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 2043US2007068624A1Apparatus to treat a substrate and method thereofJEON YUN-KWANG·Filed 2006·Application pending·0 cites
- 2139US7804250B2Apparatus and method to generate plasmaSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Sep 28, 2010·0 cites·36 claims
- 2238US2008032427A1Ion analysis system based on analyzer of ion energy distribution using retarded electric fieldSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →