Inventor · disambiguated record
Yumi Nakajima
Also filed as: NAKAJIMA YUMI
14 granted patents·5 pending applications·15 citations·filing 2008–2023
87Inventor score
Top patents by PatentIndex Score
19 records- 0194US11647630B2Semiconductor memory deviceKIOXIA CORP·Filed 2020·Granted May 9, 2023·4 cites·20 claims
- 0289US11652094B2Semiconductor device and method of manufacturing the sameKIOXIA CORP·Filed 2022·Granted May 16, 2023·1 cites·7 claims
- 0380US12068301B2Semiconductor device and method of manufacturing the sameKIOXIA CORP·Filed 2023·Granted Aug 20, 2024·0 cites·9 claims
- 0474US8187773B2Method for generating mask pattern data and method for manufacturing maskNAKAJIMA YUMI·Filed 2009·Granted May 29, 2012·4 cites·20 claims
- 0569US11302684B2Semiconductor device and method of manufacturing the sameKIOXIA CORP·Filed 2020·Granted Apr 12, 2022·0 cites·7 claims
- 0669US11088162B2Semiconductor memory device and semiconductor device manufacturing methodTOSHIBA MEMORY CORP·Filed 2019·Granted Aug 10, 2021·1 cites·24 claims
- 0769US9153456B2Pattern forming method using block copolymersTOSHIBA KK·Filed 2013·Granted Oct 6, 2015·2 cites·20 claims
- 0868US9418887B2Method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2014·Granted Aug 16, 2016·2 cites·12 claims
- 0963US9209052B2Semiconductor manufacturing apparatus and device manufacturing method using substrate distortion correctionTOSHIBA KK·Filed 2013·Granted Dec 8, 2015·1 cites·10 claims
- 1061US10600771B2Semiconductor device and method of manufacturing the sameTOSHIBA MEMORY CORP·Filed 2018·Granted Mar 24, 2020·0 cites·8 claims
- 1156US8071263B2Reflective mask and manufacturing method for reflective maskINANAMI RYOICHI·Filed 2009·Granted Dec 6, 2011·0 cites·18 claims
- 1250US11462562B2Semiconductor deviceKIOXIA CORP·Filed 2020·Granted Oct 4, 2022·0 cites·19 claims
- 1350US2012040293A1Reflective mask, manufacturing method for reflective mask, and manufacturing method for semiconductor deviceINANAMI RYOICHI·Filed 2011·Application pending·0 cites
- 1450US2009095711A1Microfabrication apparatus and device manufacturing methodKOSHIBA TAKESHI·Filed 2008·Application pending·0 cites
- 1548US2010055584A1Exposure device and exposure methodSATO TAKASHI·Filed 2009·Application pending·0 cites
- 1641US10877375B2Reflection type exposure mask and pattern forming methodTOSHIBA MEMORY CORP·Filed 2018·Granted Dec 29, 2020·0 cites·10 claims
- 1741US8728711B2Cleaning reticle, method for cleaning reticle stage, and method for manufacturing semiconductor deviceNAKAJIMA YUMI·Filed 2010·Granted May 20, 2014·0 cites·8 claims
- 1836US2012068372A1Nanoimprint template and pattern transcription apparatusMIMOTOGI AKIKO·Filed 2011·Application pending·0 cites
- 1934US2011151357A1Exposure dose monitoring method and method of manufacturing exposure dose monitoring maskNAKAJIMA YUMI·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →