Inventor · disambiguated record
Yuri Paskover
Also filed as: PASKOVER YURI
30 granted patents·7 pending applications·117 citations·filing 2015–2024
96Inventor score
Top patents by PatentIndex Score
37 records- 0197US10197389B2Approaches in first order scatterometry overlay based on introduction of auxiliary electromagnetic fieldsKLA TENCOR CORP·Filed 2016·Granted Feb 5, 2019·19 cites·23 claims
- 0296US10190979B2Metrology imaging targets having reflection-symmetric pairs of reflection-asymmetric structuresKLA TENCOR CORP·Filed 2015·Granted Jan 29, 2019·12 cites·21 claims
- 0396US10048132B2Simultaneous capturing of overlay signals from multiple targetsKLA TENCOR CORP·Filed 2016·Granted Aug 14, 2018·10 cites·17 claims
- 0495US11119417B2Single cell grey scatterometry overlay targets and their measurement using varying illumination parameter(s)KLA TENCOR CORP·Filed 2019·Granted Sep 14, 2021·5 cites·13 claims
- 0595US10824079B2Diffraction based overlay scatterometryKLA TENCOR CORP·Filed 2018·Granted Nov 3, 2020·12 cites·16 claims
- 0695US10401228B2Simultaneous capturing of overlay signals from multiple targetsKLA TENCOR CORP·Filed 2018·Granted Sep 3, 2019·6 cites·23 claims
- 0795US9864209B2Self-moire target design principles for measuring unresolved device-like pitchesKLA TENCOR CORP·Filed 2016·Granted Jan 9, 2018·13 cites·16 claims
- 0894US11841621B2Moiré scatterometry overlayKLA CORP·Filed 2021·Granted Dec 12, 2023·2 cites·39 claims
- 0993US11378394B1On-the-fly scatterometry overlay metrology targetKLA CORP·Filed 2020·Granted Jul 5, 2022·7 cites·24 claims
- 1092US12001148B2Enhancing performance of overlay metrologyKLA CORP·Filed 2023·Granted Jun 4, 2024·2 cites·26 claims
- 1190US11874539B1Perception camera with road surface glare reductionGM GLOBAL TECH OPERATIONS LLC·Filed 2022·Granted Jan 16, 2024·3 cites·14 claims
- 1287US11409205B2Non-orthogonal target and method for using the same in measuring misregistration of semiconductor devicesKLA CORP·Filed 2020·Granted Aug 9, 2022·2 cites·22 claims
- 1386US10520832B2Topographic phase control for overlay measurementKLA TENCOR CORP·Filed 2016·Granted Dec 31, 2019·4 cites·7 claims
- 1486US10101592B2Self-moiré target design principles for measuring unresolved device-like pitchesKLA TENCOR CORP·Filed 2017·Granted Oct 16, 2018·3 cites·14 claims
- 1584US10677588B2Localized telecentricity and focus optimization for overlay metrologyKLA TENCOR CORP·Filed 2018·Granted Jun 9, 2020·5 cites·44 claims
- 1684US10444161B2Systems and methods for metrology with layer-specific illumination spectraKLA TENCOR CORP·Filed 2017·Granted Oct 15, 2019·2 cites·57 claims
- 1783US11592755B2Enhancing performance of overlay metrologyKLA CORP·Filed 2021·Granted Feb 28, 2023·1 cites·30 claims
- 1882US11314173B2Topographic phase control for overlay measurementKLA TENCOR CORP·Filed 2019·Granted Apr 26, 2022·2 cites·6 claims
- 1982US11281111B2Off-axis illumination overlay measurement using two-diffracted orders imagingKLA TENCOR CORP·Filed 2018·Granted Mar 22, 2022·2 cites·29 claims
- 2081US10579768B2Process compatibility improvement by fill factor modulationKLA TENCOR CORP·Filed 2016·Granted Mar 3, 2020·3 cites·5 claims
- 2175US11852590B1Systems and methods for metrology with layer-specific illumination spectraKLA TENCOR CORP·Filed 2019·Granted Dec 26, 2023·1 cites·34 claims
- 2272US11101153B2Parameter-stable misregistration measurement amelioration in semiconductor devicesKLA CORP·Filed 2019·Granted Aug 24, 2021·1 cites·20 claims
- 2370US2021373445A1Single Cell Grey Scatterometry Overlay Targets and Their Measurement Using Varying Illumination Parameter(s)KLA TENCOR CORP·Filed 2021·Application pending·0 cites
- 2468US2025146964A1Thermal imaging method for crack and hole detection in semiconductor devicesORBOTECH LTD·Filed 2024·Application pending·0 cites
- 2559US10139528B1Compound objectives for imaging and scatterometry overlayKLA TENCOR CORP·Filed 2017·Granted Nov 27, 2018·0 cites·15 claims
- 2659US2021255551A1Topographic Phase Control For Overlay MeasurementKLA TENCOR CORP·Filed 2021·Application pending·0 cites
- 2758US12487190B2System and method for isolation of specific fourier pupil frequency in overlay metrologyKLA CORP·Filed 2022·Granted Dec 2, 2025·0 cites·26 claims
- 2858US2025109934A1Multi-phase interferometer for 3d metrologyORBOTECH LTD·Filed 2023·Application pending·0 cites
- 2957US2025116632A1Ultrasonic detection of voids and cracks in substratesORBOTECH LTD·Filed 2024·Application pending·0 cites
- 3053US12422363B2Scanning scatterometry overlay metrologyKLA CORP·Filed 2022·Granted Sep 23, 2025·0 cites·51 claims
- 3152US10866090B2Estimating amplitude and phase asymmetry in imaging technology for achieving high accuracy in overlay metrologyKLA TENCOR CORP·Filed 2018·Granted Dec 15, 2020·0 cites·14 claims
- 3251US11815347B2Optical near-field metrologyKLA TENCOR CORP·Filed 2017·Granted Nov 14, 2023·0 cites·19 claims
- 3348US12222199B2Systems and methods for measurement of misregistration and amelioration thereofKLA CORP·Filed 2020·Granted Feb 11, 2025·0 cites·22 claims
- 3446US2023068016A1Systems and methods for rotational calibration of metrology toolsKLA CORP·Filed 2021·Application pending·0 cites
- 3544US10408602B2Quality estimation and improvement of imaging metrology targetsKLA TENCOR CORP·Filed 2016·Granted Sep 10, 2019·0 cites·10 claims
- 3643US10565697B2Utilizing overlay misregistration error estimations in imaging overlay metrologyKLA TENCOR CORP·Filed 2017·Granted Feb 18, 2020·0 cites·22 claims
- 3740US2018342063A1Diffraction Based Overlay ScatterometryKLA TENCOR CORP·Filed 2018·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →