Inventor · disambiguated record
Zeqing Shen
Also filed as: SHEN ZEQING
14 granted patents·17 pending applications·5 citations·filing 2019–2025
84Inventor score
Files withAPPLIED MATERIALS INC31
Top patents by PatentIndex Score
31 records- 0193US11545354B2Molecular layer deposition method and systemAPPLIED MATERIALS INC·Filed 2020·Granted Jan 3, 2023·3 cites·20 claims
- 0287US11972940B2Area selective carbon-based film depositionAPPLIED MATERIALS INC·Filed 2022·Granted Apr 30, 2024·1 cites·7 claims
- 0385US11990369B2Selective patterning with molecular layer depositionAPPLIED MATERIALS INC·Filed 2021·Granted May 21, 2024·1 cites·20 claims
- 0474US2024321589A1Processes to deposit amorphous-silicon etch protection linerAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0571US2024234127A1Area selective carbon-based film depositionAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0667US12027374B2Processes to deposit amorphous-silicon etch protection linerAPPLIED MATERIALS INC·Filed 2021·Granted Jul 2, 2024·0 cites·20 claims
- 0762US12438050B2Electronic device fabrication using area-selective depositionAPPLIED MATERIALS INC·Filed 2023·Granted Oct 7, 2025·0 cites·20 claims
- 0862US11732352B2Hydrogen free silicon dioxideAPPLIED MATERIALS INC·Filed 2021·Granted Aug 22, 2023·0 cites·8 claims
- 0959US2024183035A1Area selective deposition through surface silylationAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1059US2025329531A1Selective chemical method for contact hole shrinkingAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1157US11658026B2Conformal silicon oxide film depositionAPPLIED MATERIALS INC·Filed 2020·Granted May 23, 2023·0 cites·20 claims
- 1256US11830729B2Low-k boron carbonitride filmsAPPLIED MATERIALS INC·Filed 2021·Granted Nov 28, 2023·0 cites·20 claims
- 1356US11756785B2Molecular layer deposition contact landing protection for 3D NANDAPPLIED MATERIALS INC·Filed 2021·Granted Sep 12, 2023·0 cites·20 claims
- 1456US11655537B2HDP sacrificial carbon gapfillAPPLIED MATERIALS INC·Filed 2020·Granted May 23, 2023·0 cites·19 claims
- 1556US11626278B2Catalytic formation of boron and carbon filmsAPPLIED MATERIALS INC·Filed 2021·Granted Apr 11, 2023·0 cites·18 claims
- 1656US11355354B1Thermal deposition of doped silicon oxideAPPLIED MATERIALS INC·Filed 2021·Granted Jun 7, 2022·0 cites·20 claims
- 1756US2024290612A1Conformal and selective sin depositionAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1854US11276573B2Methods of forming high boron-content hard mask materialsAPPLIED MATERIALS INC·Filed 2019·Granted Mar 15, 2022·0 cites·17 claims
- 1954US2024145235A1Sin gap fill via nucleation inhibitionAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2053US11682554B2Catalytic thermal deposition of carbon-containing materialsAPPLIED MATERIALS INC·Filed 2021·Granted Jun 20, 2023·0 cites·15 claims
- 2153US2023105408A1Hexagonal boron nitride depositionAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 2252US2024120193A1Carbon replenishment of silicon-containing materialAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 2352US2023360906A1Silicon-and-carbon-containing materials with low dielectric constantsAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 2452US2024055255A1Selective deposition for sub 20 nm pitch euv patterningAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 2552US2024105499A1Molecular layer deposition carbon masks for direct selective deposition of silicon-containing materialsAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 2651US2024027912A1Method to reduce line edge roughness for euv photoresist patternAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 2751US2024332028A1Compressive films for large area gapfillAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2851US2024420934A1In-situ etch and inhibition in plasma enhanced atomic layer depositionAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2949US2023058831A1Molecular layer deposition liner for 3d nandAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 3049US2024420952A1Nested-loop plasma enhanced atomic layer depositionAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3148US2025259837A1Responsive layer for photolithography film stackAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →