Inventor · disambiguated record
Zhigang Chen
Also filed as: CHEN III ZHIGANG · CHEN ZHIGANG
90 granted patents·37 pending applications·1,404 citations·filing 1998–2025
99Inventor score
Top patents by PatentIndex Score
127 records- 0198US11587766B2Symmetric VHF source for a plasma reactorAPPLIED MATERIALS INC·Filed 2021·Granted Feb 21, 2023·4 cites·15 claims
- 0298US10580620B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2016·Granted Mar 3, 2020·38 cites·17 claims
- 0398US10546728B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2016·Granted Jan 28, 2020·39 cites·11 claims
- 0498US10535502B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2016·Granted Jan 14, 2020·35 cites·14 claims
- 0598US10453656B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2016·Granted Oct 22, 2019·36 cites·15 claims
- 0698US10115568B2Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ringLAM RES CORP·Filed 2017·Granted Oct 30, 2018·57 cites·26 claims
- 0798US10026592B2Systems and methods for tailoring ion energy distribution function by odd harmonic mixingLAM RES CORP·Filed 2016·Granted Jul 17, 2018·37 cites·20 claims
- 0898US9852889B1Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ringLAM RES CORP·Filed 2016·Granted Dec 26, 2017·135 cites·21 claims
- 0998US9741546B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2012·Granted Aug 22, 2017·385 cites·17 claims
- 1098US9536749B2Ion energy control by RF pulse shapeLAM RES CORP·Filed 2014·Granted Jan 3, 2017·69 cites·21 claims
- 1197US9385021B2Electronic knob for tuning radial etch non-uniformity at VHF frequenciesLAM RES CORP·Filed 2014·Granted Jul 5, 2016·28 cites·18 claims
- 1297US8933628B2Inductively coupled plasma source with phase controlAPPLIED MATERIALS INC·Filed 2012·Granted Jan 13, 2015·37 cites·17 claims
- 1396US10283330B2Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generatorsLAM RES CORP·Filed 2017·Granted May 7, 2019·14 cites·19 claims
- 1496US9705289B2High brightness multijunction diode stackingNLIGHT INC·Filed 2015·Granted Jul 11, 2017·23 cites·19 claims
- 1596US8313664B2Efficient and accurate method for real-time prediction of the self-bias voltage of a wafer and feedback control of ESC voltage in plasma processing chamberCHEN ZHIGANG·Filed 2009·Granted Nov 20, 2012·44 cites·8 claims
- 1695US10615003B2Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ringLAM RES CORP·Filed 2018·Granted Apr 7, 2020·9 cites·20 claims
- 1795US9620334B2Control of etch rate using modeling, feedback and impedance matchLAM RES CORP·Filed 2014·Granted Apr 11, 2017·20 cites·23 claims
- 1895US7394535B1Optical metrology using a photonic nanojetTOKYO ELECTRON LTD·Filed 2007·Granted Jul 1, 2008·37 cites·20 claims
- 1994US9096773B2Highly functional epoxidized resins and coatingsWEBSTER DEAN C·Filed 2011·Granted Aug 4, 2015·21 cites·37 claims
- 2093US11195706B2Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generatorsLAM RES CORP·Filed 2019·Granted Dec 7, 2021·7 cites·21 claims
- 2193US10833482B2Diode laser apparatus with FAC lens out-of-plane beam steeringNLIGHT INC·Filed 2019·Granted Nov 10, 2020·9 cites·33 claims
- 2293US10340122B2Systems and methods for tailoring ion energy distribution function by odd harmonic mixingLAM RES CORP·Filed 2018·Granted Jul 2, 2019·7 cites·15 claims
- 2392US10002746B1Multi regime plasma wafer processing to increase directionality of ionsLAM RES CORP·Filed 2017·Granted Jun 19, 2018·8 cites·26 claims
- 2492US9862141B2Selective laser-assisted transfer of discrete componentsNDSU RES FOUNDATION·Filed 2015·Granted Jan 9, 2018·16 cites·14 claims
- 2591US10825656B2Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ringLAM RES CORP·Filed 2020·Granted Nov 3, 2020·2 cites·20 claims
- 2690US10392580B1Seed oil based reactive diluentRUST OLEUM CORP·Filed 2017·Granted Aug 27, 2019·7 cites·25 claims
- 2790US10381201B2Control of etch rate using modeling, feedback and impedance matchLAM RES CORP·Filed 2017·Granted Aug 13, 2019·5 cites·18 claims
- 2890US10304662B2Multi regime plasma wafer processing to increase directionality of ionsLAM RES CORP·Filed 2018·Granted May 28, 2019·5 cites·26 claims
- 2990US8920597B2Symmetric VHF source for a plasma reactorRAMASWAMY KARTIK·Filed 2011·Granted Dec 30, 2014·9 cites·8 claims
- 3090US6680976B1Robust, reliable compression and packetization scheme for transmitting videoUNIV ILLINOIS·Filed 1998·Granted Jan 20, 2004·154 cites·40 claims
- 3188US11043361B2Symmetric VHF source for a plasma reactorAPPLIED MATERIALS INC·Filed 2017·Granted Jun 22, 2021·3 cites·20 claims
- 3288US8815969B2Plant oil-based UV-curable coatingCHEN ZHIGANG·Filed 2012·Granted Aug 26, 2014·4 cites·12 claims
- 3388US8206552B2RF power delivery system in a semiconductor apparatusCHEN ZHIGANG·Filed 2008·Granted Jun 26, 2012·9 cites·15 claims
- 3487US10049862B2Chamber with vertical support stem for symmetric conductance and RF deliveryLAM RES CORP·Filed 2016·Granted Aug 14, 2018·4 cites·25 claims
- 3586US10855056B2Power and brightness scaling in fiber coupled diode lasers using diodes with optimized beam dimensionsNLIGHT INC·Filed 2018·Granted Dec 1, 2020·3 cites·16 claims
- 3686US9824862B2Symmetric VHF source for a plasma reactorAPPLIED MATERIALS INC·Filed 2014·Granted Nov 21, 2017·4 cites·6 claims
- 3786US9578722B2Methods for selecting and controlling devicesFENG LEI·Filed 2009·Granted Feb 21, 2017·22 cites·8 claims
- 3885US10910195B2Substrate support with improved process uniformityLAM RES CORP·Filed 2017·Granted Feb 2, 2021·3 cites·12 claims
- 3985US10741425B2Helium plug design to reduce arcingLAM RES CORP·Filed 2017·Granted Aug 11, 2020·4 cites·16 claims
- 4084US11935724B2Symmetric VHF source for a plasma reactorAPPLIED MATERIALS INC·Filed 2023·Granted Mar 19, 2024·0 cites·15 claims
- 4184US11315760B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2020·Granted Apr 26, 2022·1 cites·20 claims
- 4284US10755895B2Ion energy control by RF pulse shapeLAM RES CORP·Filed 2016·Granted Aug 25, 2020·3 cites·23 claims
- 4384US10242847B2Plasma processing apparatus and liner assembly for tuning electrical skewsAPPLIED MATERIALS INC·Filed 2015·Granted Mar 26, 2019·3 cites·12 claims
- 4482US9373936B1Resonant active grating mirror for surface emitting lasersNLIGHT PHOTONICS CORP·Filed 2015·Granted Jun 21, 2016·3 cites·11 claims
- 4581US10615006B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2017·Granted Apr 7, 2020·1 cites·20 claims
- 4681US10573493B2Inductively coupled plasma apparatusAPPLIED MATERIALS INC·Filed 2016·Granted Feb 25, 2020·2 cites·12 claims
- 4780US8652297B2Symmetric VHF plasma power coupler with active uniformity steeringCOLLINS KENNETH S·Filed 2011·Granted Feb 18, 2014·7 cites·14 claims
- 4879US10461505B2High brightness coherent multi-junction diode lasersNLIGHT INC·Filed 2017·Granted Oct 29, 2019·2 cites·31 claims
- 4979US8114567B2Polyol photosensitizers, carrier gas UV laser ablation sensitizers, and other additives and methods for making and using sameWEBSTER DEAN C·Filed 2007·Granted Feb 14, 2012·6 cites·36 claims
- 5078US11069553B2Electrostatic chuck with features for preventing electrical arcing and light-up and improving process uniformityLAM RES CORP·Filed 2017·Granted Jul 20, 2021·2 cites·16 claims
Showing the top 50 of 127 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →