P
US11199528B2ActiveUtilityPatentIndex 68

Sensor built-in filter structure and wafer accommodation container

Assignee: TDK CORPPriority: Jul 30, 2018Filed: Jul 29, 2019Granted: Dec 14, 2021
Est. expiryJul 30, 2038(~12.1 yrs left)· nominal 20-yr term from priority
Inventors:KOTSUGAI TATSUHIROMIYAJIMA TOSHIHIKOKAGAYA TAKESHI
H10P 72/1924H10P 72/3408H10P 72/3406H10P 72/1926H10P 72/0604B01D 46/448G01N 33/0011G01N 1/405G01N 1/2205G01N 33/0029G01N 33/0047G01N 7/10G01N 2001/4016B01D 46/446H01L 21/67389H10P 72/06H10P 72/0406
68
PatentIndex Score
2
Cited by
79
References
15
Claims

Abstract

Provided is sensor built-in filter structure arranged in a wafer accommodation container, comprising: a first filter; a second filter arranged closer to a wafer accommodation chamber of the wafer accommodation container than to the first filter; and a gas detection sensor arranged between the first filter and the second filter to detect a state of a gas.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
       1. A sensor built-in filter structure arranged in a wafer accommodation container, comprising:
 a first filter; 
 a second filter arranged closer to a wafer accommodation chamber of the wafer accommodation container than to the first filter; and 
 a gas detection sensor arranged between the first filter and the second filter to detect a state of a gas, 
 wherein the first filter and the second filter are overlapped with the gas detection sensor interposed between the first filter and the second filter. 
 
     
     
       2. The sensor built-in filter structure according to  claim 1 ,
 wherein the first filter removes dust contained in the gas. 
 
     
     
       3. The sensor built-in filter structure according to  claim 1 ,
 wherein the first filter has a particle collection rate higher than that of the second filter. 
 
     
     
       4. The sensor built-in filter structure according to  claim 1 ,
 wherein the second filter blocks passage of water as a liquid and allows the gas to pass. 
 
     
     
       5. The sensor built-in filter structure according to  claim 1 ,
 wherein the second filter has a water resistance higher than that of the first filter. 
 
     
     
       6. The sensor built-in filter structure according to  claim 1 ,
 wherein the state detected by the gas detection sensor is at least one of temperature, humidity, pressure and component of the gas or the dust in the gas. 
 
     
     
       7. The sensor built-in filter structure according to  claim 1 , wherein the second filter has a smaller area than the first filter and is provided on a surface of the gas detection sensor on a side closer to the wafer accommodation chamber. 
     
     
       8. A wafer accommodation container comprising:
 the sensor built-in filter structure according to  claim 1 ; 
 the wafer accommodation chamber; and 
 a purge port having the flow path for introducing a cleaning gas into the wafer accommodation chamber or for discharging the gas from the wafer accommodation chamber. 
 
     
     
       9. The wafer accommodation container according to  claim 8 , wherein the flow path provided with the sensor built-in filter structure is a portion of the purge port for discharging the gas from the wafer accommodation chamber. 
     
     
       10. A sensor built-in filter structure arranged in a wafer accommodation container, comprising:
 a first filter; 
 a second filter arranged closer to a wafer accommodation chamber of the wafer accommodation container than to the first filter; and 
 a gas detection sensor arranged between the first filter and the second filter to detect a state of a gas, wherein 
 the sensor built-in filter structure is in a flow path connected from an outside to the wafer accommodation chamber, 
 the first filter and the second filter are arranged with a predetermined interval, and 
 the gas detection sensor is provided on a surface of the first filter on a side closer to the wafer accommodation chamber. 
 
     
     
       11. A wafer accommodation container comprising:
 the sensor built-in filter structure according to  claim 10 ; 
 the wafer accommodation chamber; and 
 a purge port having the flow path for introducing a cleaning gas into the wafer accommodation chamber or for discharging the gas from the wafer accommodation chamber. 
 
     
     
       12. The wafer accommodation container according to  claim 11 , wherein the flow path provided with the sensor built-in filter structure is a portion of the purge port for discharging the gas from the wafer accommodation chamber. 
     
     
       13. A sensor built-in filter structure arranged in a wafer accommodation container, comprising:
 a first filter; 
 a second filter arranged closer to a wafer accommodation chamber of the wafer accommodation container than to the first filter; and 
 a gas detection sensor arranged between the first filter and the second filter to detect a state of a gas, wherein 
 the sensor built-in filter structure is in a flow path connected from an outside to the wafer accommodation chamber, 
 the first filter and the second filter are arranged with a predetermined interval, and 
 the gas detection sensor is provided on a surface of the second filter on a side opposite to the wafer accommodation chamber. 
 
     
     
       14. A wafer accommodation container comprising:
 the sensor built-in filter structure according to  claim 13 ; 
 the wafer accommodation chamber; and 
 a purge port having the flow path for introducing a cleaning gas into the wafer accommodation chamber or for discharging the gas from the wafer accommodation chamber. 
 
     
     
       15. The wafer accommodation container according to  claim 14 , wherein the flow path provided with the sensor built-in filter structure is a portion of the purge port for discharging the gas from the wafer accommodation chamber.

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