Workpiece processing system

Abstract

A workpiece processing system for processing semiconductor wafers and other flat media includes a standalone processing unit having two or more modules vertically stacked on top of one another. A first module includes an ozone generator, a DI water supply, a purge gas/drying gas supply, and optionally includes an ammonium hydroxide generator. A second module is preferably stacked on top of the first module and includes a processing chamber in communication with the devices in the first module. The processing chamber preferably includes a rotor for holding and rotating workpieces, one or more spray manifolds, an ozone destructor, an anti-static generator, and/or any other suitable workpiece-processing devices. The rotor is preferably designed to hold two workpiece-carrying cassettes each capable of holding up to 25 workpieces. A third module is preferably stacked on top of the second module and includes the system electronics and controls.

What is claimed is:  
     
         1 . A system for processing a workpiece, comprising: 
 a first module including an ozone generator;    a second module attached to the first module, the second module including a processing chamber for processing a workpiece, wherein the ozone generator is connected to supply ozone gas to the processing chamber; and    a rotor rotatably supported within the processing chamber.    
     
     
         2 . The system of  claim 1  wherein the rotor is adapted to hold a first cassette and a second cassette, with each cassette holding a batch of workpieces.  
     
     
         3 . The system of  claim 1  wherein the ozone generator produces ozone gas at a rate of at least 90 grams/hour.  
     
     
         4 . The system of  claim 1  wherein the first, second, and third modules all have approximately the same width and length.  
     
     
         5 . The system of  claim 1  further comprising a source of NH4OH connecting into the processing chamber.  
     
     
         6 . The system of  claim 1  further comprising a manually operated door moveable from an open position, for loading and unloading workpieces into the rotor, to a closed position, for processing.  
     
     
         7 . The system of  claim 1  further comprising an ozone destructor connecting with the processing chamber for converting ozone in exhaust gases flowing out from the processing chamber into oxygen.  
     
     
         8 . The system of  claim 1  wherein the ozone destructor includes: 
 an inlet and an outlet adjacent to the upper end;  
 a chamber exhaust line connecting from the processing chamber to the inlet of the ozone destructor; and  
 a system exhaust line connecting to the outlet of the ozone destructor.  
 
     
     
         9 . The system of  claim 7  wherein the ozone destructor contains a catalyst.  
     
     
         10 . The system of  claim 1  further comprising at least one spray manifold in the processing chamber for spraying a process liquid onto the workpieces.  
     
     
         11 . The system of  claim 1  further comprising a DI water supply in the first module connecting into the processing chamber.  
     
     
         12 . The system of  claim 11  further comprising a heater in the first module for heating the DI water.  
     
     
         13 . The system of  claim 1  further comprising an anti-static generator in the processing chamber.  
     
     
         14 . The system of  claim 1  further comprising a purge gas generator in the first module, with the purge gas generator connecting into the processing chamber.  
     
     
         15 . The system of  claim 14  wherein the purge gas generator comprises an N 2  gas generator.  
     
     
         16 . The system of  claim 1  further comprising a compressed dry air supply in the first module connecting into the processing chamber.  
     
     
         17 . A standalone system for processing a workpiece, comprising: 
 a first module including a processing fluid supply;    a second module on top of and attached to the first module, the second module including a processing chamber for processing a workpiece, wherein the processing fluid supply is in communication with the processing chamber; and    a third module on top of and attached to the second module.    
     
     
         18 . The system of  claim 17  wherein the first module has a footprint of 6-12 square feet.  
     
     
         19 . The system of  claim 17  wherein the height of the system is more than double the width of the system.  
     
     
         20 . The system of  claim 17  with the third module including a system controller.  
     
     
         21 . The system of  claim 17  wherein the processing fluid supply comprises an ozone generator for supplying ozone gas into the processing chamber.  
     
     
         22 . A method for processing a wafer comprising the steps of: 
 loading a first cassette of wafers into a rotor in a process chamber;    loading a second cassette of wafers into the rotor;    wetting the wafers with water heated to 30-95 degrees C.;    rotating the rotor;    introducing ozone gas into the process chamber, with ozone gas diffusing through a layer of the heated water on;    purging the ozone gas from the chamber; and    drying the wafers.    
     
     
         23 . The method of  claim 22  further comprising the step of rinsing the wafers.  
     
     
         24 . A system for processing articles, comprising: 
 support means for supporting a batch of articles within a process chamber;    liquid supply means for supplying a heated liquid onto the articles;    ozone supply means for supplying ozone into the process chamber; and    rotation means for rotating the articles within the chamber.    
     
     
         25 . The system of  claim 24  further comprising a device for destroying ozone, including: 
 a container having an upper end and a lower end;  
 a container inlet in the container, adjacent to the upper end of the container;  
 a container outlet in the container, adjacent to the upper end of the container;  
 a canister within the container, with the canister having an upper end and a lower end;  
 a canister inlet adjacent to the lower end of the canister;  
 a canister outlet adjacent to the upper end of the canister, with the canister outlet leading into the container outlet; and  
 a catalyst within the canister, above the canister inlet and below the canister outlet.