US2005101233A1PendingUtilityA1
Polishing element
Priority: Nov 12, 2003Filed: Nov 19, 2003Published: May 12, 2005
Est. expiryNov 12, 2023(expired)· nominal 20-yr term from priority
B24B 37/26B24B 37/245
28
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Claims
Abstract
A polishing element comprising a polishing platen, a polishing sub-pad and a polishing pad is provided. The polishing sub-pad is set up over the polishing platen and the polishing pad is set up over the polishing sub-pad. A first surface of the polishing sub-pad interfaces with the polishing pad and a second surface of the polishing sub-pad interfaces with the platen. Either the first surface or the second surface of the polishing sub-pad is an undulating surface.
Claims
exact text as granted — not AI-modified1 . A polishing element for a non-slurry polishing process, comprising:
a polishing platen; a fixed abrasive polishing pad; and a polishing sub-pad set up over the polishing platen and below the polishing pad.
wherein a first surface of the polishing sub-pad interfaces with the fixed abrasive polishing pad and a second surface of the polishing sub-pad interfaces with polishing platen, and either the first surface or the second surface of the polishing sub-pad is an undulating surface, and an upper surface of the fixed abrasive polishing pad undulates with the undulating surface when the fixed abrasive polishing pad is subjected to a pressure.
2 . The polishing element of claim 1 , wherein the undulating surface of the polishing sub-pad comprises a plurality of alternately positioned grooves and protruding sections.
3 . The polishing element of claim 2 , wherein the grooves form a pattern comprising a series of straights, a series of crosses, concentric circles, spiral or any combination of them.
4 . The polishing element of claim 1 , wherein both the first surface and the second surface of the polishing sub-pad are undulating surface.
5 . (canceled).
6 . A polishing element for a non-slurry polishing process, comprising:
a polishing platen; a polishing sub-pad set up over the polishing platen; and a fixed abrasive polishing pad set up over the polishing sub-pad, wherein a first surface of the polishing sub-pad interfaces with the fixed abrasive polishing pad and a second surface of the polishing sub-pad interfaces with polishing platen, a third surface of the fixed abrasive polishing pad interfaces with the polishing sub-pad and a fourth surface of the polishing platen interfaces with the polishing sub-pad, and the first surface, the second surface, the third surface or the fourth surface is a undulating surface, and an upper surface of the fixed abrasive polishing pad undulates with the undulating surface when the fixed abrasive polishing pad is subjected to a pressure.
7 . The polishing element of claim 6 , wherein both the first surface and the second surface of the polishing sub-pad is an undulating surface.
8 . The polishing element of claim 6 , wherein the undulating surface of the polishing sub-pad comprises a plurality of alternately positioned grooves and protruding sections.
9 . The polishing element of claim 8 , wherein the grooves form a pattern comprising a series of straights, a series of crosses, concentric circles, spiral or any combination of them.
10 . (canceled).
11 . A polishing platen for assembling with a polishing sub-pad and a fixed abrasive polishing pad to form a polishing element for a non-slurry polishing process, wherein the polishing platen has a body, and a surface of the polishing platen interfaces with the polishing sub-pad such that the surface is an undulating surface, and an upper surface of the fixed abrasive polishing pad undulates with the undulating surface when the fixed abrasive polishing pad is subjected to a pressure.
12 . The polishing platen of claim 11 , wherein the undulating surface of the polishing platen comprises a plurality of alternatively positioned grooves and protruding sections.
13 . The polishing platen of claim 12 , wherein the grooves form a pattern comprising a series of straights, a series of crosses, concentric circles, spiral or any combination of them.
14 . A polishing sub-pad for assembling with a polishing platen and a fixed abrasive polishing pad to form a polishing element used in a non-slurry polishing process, wherein the polishing sub-pad has a body, and a first surface of the polishing sub-pad interfaces with the fixed abrasive polishing pad and a second surface of the polishing sub-pad interfaces with the polishing platen such that at least one of the first surface or the second surface of the polishing sub-pad is an undulating surface and an upper surface of the fixed abrasive polishing pad undulates with the undulating surface when the fixed abrasive polishing pad is subjected to a pressure.
15 . The polishing sub-pad of claim 14 , wherein the undulating surface of the polishing sub-pad comprises a plurality of alternatively positioned grooves and protruding sections.
16 . The polishing sub-pad of claim 15 , wherein the grooves form a pattern comprising a series of straights, a series of crosses, concentric circles, spiral or any combination of them.
17 . The polishing sub-pad of claim 14 , wherein both the first surface and the second surface of the polishing sub-pad are undulating surfaces.
18 . A fixed abrasive polishing pad for assembling with a polishing platen and a polishing sub-pad to form a polishing element for a non-slurry polishing process, wherein the fixed abrasive polishing pad has a body, and a surface of the fixed abrasive polishing pad interfaces with the polishing sub-pad such that the surface is an undulating surface and an upper surface of the fixed abrasive polishing pad undulates with the undulating surface when the fixed abrasive polishing Pad is subjected to a pressure.
19 . The polishing pad of claim 18 , wherein the surface of the fixed abrasive polishing pad comprises a plurality of alternately positioned grooves and protruding sections.
20 . The polishing pad of claim 19 , wherein the grooves form a pattern comprising a series of straights, a series of crosses, concentric circles, spiral or any combination of them.
21 . (canceled).Cited by (0)
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