Coupling apparatus, exposure apparatus, and device fabricating method

Abstract

An exposure apparatus is an exposure apparatus that exposes a substrate by filling a liquid between a projection optical system and the substrate, and projecting a pattern image onto the substrate via the projection optical system and the liquid, wherein the projection optical system has a first group comprising an optical member that contacts the liquid, and a second group that differs from that first group; the first group is supported by a first support member; and the second group is separated from the first group and is supported by the second support member that differs from the first support member.

1 . A lithographic projection apparatus comprising: 
 an illumination system arranged to condition a radiation beam;    a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern;    a substrate table configured to hold a substrate;    a projection system arranged to project the patterned radiation beam onto a target portion of the substrate, the projection system comprising two separate physical parts that are decoupled, wherein each part comprises an optical element or the projection system; and    a liquid supply system configured to at least partly fill a space between the projection system and the substrate, with a liquid.    
   
   
       2 . The lithographic apparatus according to  claim 1 , wherein the parts of the projection system are separated at a location between two lens elements.  
   
   
       3 . The lithographic apparatus according to  claim 1 , further comprising: 
 a sensor configured to establish a position between a first optical element in the first part of the projection system and a second optical element in the second part of the projection system;    an actuator configured to vary the position between the first and second optical elements; and    a controller configured to control the actuator on the basis of output from the sensor to maintain a predetermined position between the first and second optical elements.    
   
   
       4 . The lithographic apparatus according to  claim 3 , wherein the position is a distance in the direction substantially parallel to the direction of the optical axis of the projection system.  
   
   
       5 . The lithographic apparatus according to  claim 1 , further comprising: 
 an actuator configured to vary the position between the first and second parts; and    a controller configured to control the actuator to maintain a predetermined relative positioning between the first and second parts.    
   
   
       6 . The lithographic apparatus according to  claim 1 , wherein the second part is at least partly supported by a resilient member connected between the second part and a base frame.  
   
   
       7 . The lithographic apparatus according to  claim 6 , wherein the base frame is decoupled from a frame to which the first part is attached.  
   
   
       8 . A device manufacturing method, comprising: 
 providing a liquid to a space between a substrate on a substrate table of a lithographic apparatus and a first part of a projection system of the lithographic apparatus, a second part of the projection system being substantially decoupled from the first part; and    projecting a patterned beam of radiation, using the first and second parts of the projection system, through the liquid onto a target portion of a substrate.    
   
   
       9 . The method according to  claim 8 , further comprising: 
 establishing a position between a first optical element in the first part of the projection system and a second optical element in the second part of the projection system; and    adjusting the position of the first optical element, the second optical element, or both such that the established position is maintained at a predetermined position.    
   
   
       10 . The method according to  claim 9 , wherein the position is a distance in the direction substantially parallel to the direction of the optical axis of the projection system.  
   
   
       11 . The method according to  claim 8 , further comprising adjusting the relative positioning of the first and second parts of the projection system to maintain a predetermined relative positioning between them.  
   
   
       12 . The method according to  claim 8 , wherein the parts of the projection system are separated at a location between two lens elements.  
   
   
       13 . The method according to  claim 8 , comprising at least partly supporting the second part using a resilient member connected between the second part and a base frame of the lithographic apparatus.  
   
   
       14 . The method according to  claim 13 , wherein the base frame is decoupled from a frame to which the first part is attached.  
   
   
       15 . A lithographic projection apparatus comprising: 
 an illumination system arranged to condition a radiation beam;    a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern;    a substrate table configured to hold a substrate;    a projection system arranged to project the patterned radiation beam onto a target portion of the substrate, the projection system comprising two separate physical parts that are decoupled, wherein each part comprises an optical element of the projection system; and    a liquid supply system configured to at least partly fill a space between the projection system and the substrate, with a liquid.    
   
   
       16 . The lithographic apparatus according to  claim 15 , wherein the parts of the projection system are separated at a location between two lens elements.  
   
   
       17 . The lithographic apparatus according to  claim 15 , further comprising: 
 a sensor configured to establish a position between a first optical element in the first part of the projection system and a second optical element in the second part of the projection system;    an actuator configured to vary the position between the first and second optical elements; and    a controller configured to control the actuator on the basis of output from the sensor to maintain a predetermined position between the first and second optical elements.    
   
   
       18 . The lithographic apparatus according to  claim 17 , wherein the position is a distance in the direction substantially parallel to the direction of the optical axis of the projection system.  
   
   
       19 . The lithographic apparatus according to  claim 15 , further comprising: 
 an actuator configured to vary the position between the first and second parts; and    a controller configured to control the actuator to maintain a predetermined relative positioning between the first and second parts.    
   
   
       20 . The lithographic apparatus according to  claim 15 , wherein the second part is at least partly supported by a resilient member connected between the second part and a base frame.  
   
   
       21 . The lithographic apparatus according to  claim 20 , wherein the base frame is decoupled from a frame to which the first part is attached.