Advanced Illumination System for Use in Microlithography

Abstract

A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.

1 - 32 . (canceled)  
   
   
       33 . A system for microlithography comprising: 
 an illumination source;    an illumination optical system including, in order from an objective side: 
 (a) a first diffractive optical element that receives illumination from said illumination source;  
 (b) a second diffractive optical element;  
 (c) a condenser lens; and  
 (d) a relay lens, wherein an illumination field between the condenser and the relay lens are continuously adjustable.