Inventor · disambiguated record
Lev Ryzhikov
Also filed as: AUGUSTYN LEGAL REPRESENTATIVE · RYZHIKOV LEV
28 granted patents·12 pending applications·1,179 citations·filing 1996–2020
96Inventor score
Top patents by PatentIndex Score
40 records- 0197US6778257B2Imaging apparatusASML NETHERLANDS BV·Filed 2002·Granted Aug 17, 2004·953 cites·28 claims
- 0294US6307682B1Zoom illumination system for use in photolithographySILICON VALLEY GROUP·Filed 2000·Granted Oct 23, 2001·77 cites·24 claims
- 0384US7859647B2Lithographic apparatus and device manufacturing methodASML HOLDING NV·Filed 2008·Granted Dec 28, 2010·7 cites·10 claims
- 0483US6813003B2Advanced illumination system for use in microlithographyFiled 2002·Granted Nov 2, 2004·18 cites·96 claims
- 0579US7365848B2System and method using visible and infrared light to align and measure alignment patterns on multiple layersASML HOLDING NV·Filed 2005·Granted Apr 29, 2008·6 cites·18 claims
- 0678US9411244B2Optical system, inspection system and manufacturing methodASML HOLDING NV·Filed 2013·Granted Aug 9, 2016·2 cites·20 claims
- 0777US8164740B2Illumination system coherence remover with two sets of stepped mirrorsVISSER HUIBERT·Filed 2008·Granted Apr 24, 2012·4 cites·14 claims
- 0876US7023525B2Imaging apparatusASML NETHERLANDS BV·Filed 2004·Granted Apr 4, 2006·13 cites·39 claims
- 0975US7859756B2Optical system for transforming numerical apertureASML HOLDING NV·Filed 2009·Granted Dec 28, 2010·3 cites·19 claims
- 1075US6775069B2Advanced illumination system for use in microlithographyASML HOLDING NV·Filed 2002·Granted Aug 10, 2004·18 cites·18 claims
- 1174US7187430B2Advanced illumination system for use in microlithographyASML HOLDING NV·Filed 2004·Granted Mar 6, 2007·10 cites·30 claims
- 1273US9285687B2Inspection apparatus, lithographic apparatus, and device manufacturing methodSMIRNOV STANISLAV Y·Filed 2012·Granted Mar 15, 2016·2 cites·21 claims
- 1369US7532403B2Optical system for transforming numerical apertureASML HOLDING NV·Filed 2006·Granted May 12, 2009·2 cites·21 claims
- 1468US8013979B2Illumination system with low telecentricity error and dynamic telecentricity correctionASML HOLDING NV·Filed 2007·Granted Sep 6, 2011·2 cites·25 claims
- 1568US7630136B2Optical integrators for lithography systems and methodsASML HOLDING NV·Filed 2006·Granted Dec 8, 2009·3 cites·24 claims
- 1666US7227613B2Lithographic apparatus having double telecentric illuminationASML HOLDING NV·Filed 2004·Granted Jun 5, 2007·8 cites·19 claims
- 1765US8558988B2Thin film continuous spatially modulated grey attenuators and filtersVLADIMIRSKY YULI·Filed 2008·Granted Oct 15, 2013·2 cites·19 claims
- 1863US11960216B2Invariable magnification multilevel optical device with telecentric converterASML HOLDING NV·Filed 2020·Granted Apr 16, 2024·0 cites·16 claims
- 1962US11754935B2Lithographic patterning device multichannel position and level gaugeASML HOLDING NV·Filed 2020·Granted Sep 12, 2023·0 cites·20 claims
- 2060US5898524AMicroscope objective with ball lens and protection plateNIKON CORP·Filed 1996·Granted Apr 27, 1999·23 cites·15 claims
- 2155US9671337B2High numerical aperture objective lens systemASML HOLDING NV·Filed 2016·Granted Jun 6, 2017·0 cites·6 claims
- 2255US8159651B2Illumination system coherence remover with a series of partially reflective surfacesVISSER HUIBERT·Filed 2008·Granted Apr 17, 2012·0 cites·10 claims
- 2353US9513559B2High numerical aperture objective lens systemASML HOLDING NV·Filed 2015·Granted Dec 6, 2016·0 cites·11 claims
- 2453US2007146674A1Advanced Illumination System for Use in MicrolithographyASML HOLDING NV·Filed 2007·Application pending·0 cites
- 2553US2007165200A1System and Method for Reducing Disturbances Caused by Movement in an Immersion Lithography SystemASML HOLDING NV·Filed 2007·Application pending·0 cites
- 2653US2007165201A1System and Method for Reducing Disturbances Caused by Movement in an Immersion Lithography SystemASML HOLDING NV·Filed 2007·Application pending·0 cites
- 2753US2007247606A1Illumination systemASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 2852US7289277B2Relay lens used in an illumination system of a lithography systemASML HOLDING NV·Filed 2003·Granted Oct 30, 2007·3 cites·12 claims
- 2948US7242456B2System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portionsASML HOLDINGS N V·Filed 2004·Granted Jul 10, 2007·2 cites·25 claims
- 3048US2008198363A1System and Method to Align and Measure Alignment Patterns on Multiple LayersASML HOLDING NV·Filed 2008·Application pending·0 cites
- 3148US2015085291A1Compact Self-Contained Holographic and Interferometric ApparatusASML HOLDING NV·Filed 2013·Application pending·0 cites
- 3247US8692977B2Optical system, inspection system and manufacturing methodRYZHIKOV LEV·Filed 2011·Granted Apr 8, 2014·0 cites·21 claims
- 3346US5808807AMicroscope objective lens with cemented biconvex tripletNIKON CORP·Filed 1996·Granted Sep 15, 1998·12 cites·16 claims
- 3446US2007127005A1Illumination systemASML NETHERLANDS BV·Filed 2005·Application pending·0 cites
- 3546US2010079748A1Inspection Apparatus, Lithographic Apparatus and Method for Sphero-Chromatic Aberration CorrectionASML HOLDING NV·Filed 2009·Application pending·0 cites
- 3643US2006044533A1System and method for reducing disturbances caused by movement in an immersion lithography systemASMLHOLDING N V·Filed 2004·Application pending·0 cites
- 3741US5886827AMicroscope objective lens with separated lens groupsNIKON CORP·Filed 1997·Granted Mar 23, 1999·9 cites·20 claims
- 3841US2006138349A1Lithographic apparatus and device manufacturing methodASML HOLDING NV·Filed 2004·Application pending·0 cites
- 3937US2012086800A1Surface Inspection System with Advanced IlluminationVLADIMIRSKY YULI·Filed 2010·Application pending·0 cites
- 4032US2011317136A1Inspection Apparatus Employing Wide Angle Objective Lens With Optical WindowRYZHIKOV LEV·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →