Optical arrangement and projection exposure system for microlithography with passive thermal compensation

Abstract

An optical arrangement with a light source includes an optical element that is fastened in a mount. The light source emits radiation and the optical element is acted on thereby such that the heat that results lacks symmetry corresponding to the shape of the optical element. A connecting structure is provided between the optical element and the mount and has a symmetry that does not correspond to the shape of the optical element and effects an at least partial homogenization of the temperature distribution in the optical element.

1 - 46 . (canceled) 
   
   
       47 . A projection exposure system for microlithography, comprising:
 an optical element that is heated by radiation in a manner that lacks rotational symmetry, and   a cooling system for said optical element that lacks rotational symmetry, said cooling system including passive thermally conducting elements that effect cooling,   in which—said thermally conducting elements comprise adjustable portions.   
   
   
       48 . A projection exposure system for microlithography, comprising an optical element that is heated by radiation in a manner that lacks rotational symmetry, and
 at least one passive thermally conducting part arranged in thermal contact with said optical element,   which part covers a portion of the cross section of said optical element which is not exposed to said radiation, and which part reduces temperature gradients in said optical element, in which said at least one passive thermally conducting part of a thermal conductor in thermal contact with said optical element comprises a plurality of different materials and in which said at least one passive thermally conducting part of a thermal conductor in thermal contact with said optical element is at least partially adjustable.   
   
   
       49 - 52 . (canceled) 
   
   
       53 . The projection exposure system according to  claim 48 , in which said optical element comprises a transmitting element. 
   
   
       54 . The projection exposure system according to  claim 53 , in which said transmitting element comprises a lens. 
   
   
       55 - 58 . (canceled) 
   
   
       59 . The projection exposure system according to  claim 48 , in which said optical element comprises a mirror. 
   
   
       60 - 62 . (canceled) 
   
   
       63 . The projection exposure system according to  claim 48 , having a slit-shaped image field. 
   
   
       64 - 66 . (canceled) 
   
   
       67 . The projection exposure system according to  claim 48 , in which said optical element is arranged near a field plane. 
   
   
       68 - 72 . (canceled) 
   
   
       73 . The projection exposure system according  claim 48 , further comprising a reticle, the illumination of which lacks rotational symmetry. 
   
   
       74 . The projection exposure system according to  claim 73 , in which said reticle illumination consists of off-axis, dipole or quadrupole illumination type. 
   
   
       75 . The projection exposure system according to  claim 48 , in which said optical element is arranged near a pupil plane. 
   
   
       76 - 88 . (canceled)