Inventor · disambiguated record
Christian Wagner
Also filed as: WAGNER CHRISTIAN · WAGNER CHRISTIAN H · WÄGNER CHRISTIAN KURT · Wägner Christian
62 granted patents·24 pending applications·937 citations·filing 1999–2025
98Inventor score
Files withZEISS CARL SMT AG16MHT MOLD & HOTRUNNER TECH AG11ZEISS STIFTUNG11ASML NETHERLANDS BV9EREMA ENG RECYCLING MASCHINEN & ANLAGEN GMBH3
Top patents by PatentIndex Score
86 records- 0197US6252712B1Optical system with polarization compensatorZEISS STIFTUNG·Filed 1999·Granted Jun 26, 2001·213 cites·14 claims
- 0296US7345740B2Polarized radiation in lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Mar 18, 2008·65 cites·25 claims
- 0394US7145720B2Objective with fluoride crystal lensesZEISS CARL SMT AG·Filed 2003·Granted Dec 5, 2006·49 cites·97 claims
- 0492US7113260B2Projection exposure system for microlithography and method for generating microlithographic imagesZEISS CARL SMT AG·Filed 2005·Granted Sep 26, 2006·13 cites·3 claims
- 0592US6504597B2Optical arrangementZEISS STIFTUNG·Filed 2001·Granted Jan 7, 2003·54 cites·15 claims
- 0691US6388823B1Optical system, especially a projection light facility for microlithographyZEISS STIFTUNG·Filed 1999·Granted May 14, 2002·126 cites·13 claims
- 0790US10281223B2Heat exchangerMAHLE BEHR GMBH & CO KG·Filed 2015·Granted May 7, 2019·7 cites·16 claims
- 0890US6930758B2Projection exposure system for microlithography and method for generating microlithographic imagesZEISS CARL SMT AG·Filed 2001·Granted Aug 16, 2005·36 cites·45 claims
- 0989US6781668B2Optical arrangementZEISS STIFTUNG·Filed 2000·Granted Aug 24, 2004·36 cites·14 claims
- 1088US10100715B2Inter coolerMAHLE INT GMBH·Filed 2016·Granted Oct 16, 2018·5 cites·19 claims
- 1188US9516732B2Radiation sourceWAGNER CHRISTIAN·Filed 2012·Granted Dec 6, 2016·9 cites·9 claims
- 1288US6879379B2Projection lens and microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2003·Granted Apr 12, 2005·27 cites·51 claims
- 1388US6788471B2Projection exposure apparatus for microlithographyZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Sep 7, 2004·34 cites·14 claims
- 1488US6521877B1Optical arrangement having improved temperature distribution within an optical elementZEISS STIFTUNG·Filed 2000·Granted Feb 18, 2003·37 cites·17 claims
- 1587US6522392B1Optical systems and methods of compensating rotationally non-symmetrical image defects in an optical systemZEISS STIFTUNG·Filed 2000·Granted Feb 18, 2003·34 cites·5 claims
- 1686US9956708B2Injection mold plate and injection mold having such an injection mold plateMHT MOLD & HOTRUNNER TECH AG·Filed 2013·Granted May 1, 2018·8 cites·15 claims
- 1786US6590718B2Projection exposure system having a reflective reticleZEISS STIFTUNG·Filed 2001·Granted Jul 8, 2003·42 cites·23 claims
- 1885US7317512B2Different polarization in cross-section of a radiation beam in a lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Jan 8, 2008·8 cites·24 claims
- 1984US7859647B2Lithographic apparatus and device manufacturing methodASML HOLDING NV·Filed 2008·Granted Dec 28, 2010·7 cites·10 claims
- 2081US6583850B2Optical systemZEISS STIFTUNG·Filed 2001·Granted Jun 24, 2003·21 cites·24 claims
- 2180US6466382B2Optical arrangementZEISS STIFTUNG·Filed 2000·Granted Oct 15, 2002·26 cites·10 claims
- 2277US7126765B2Objective with fluoride crystal lensesZEISS CARL SMT AG·Filed 2005·Granted Oct 24, 2006·3 cites·14 claims
- 2372USRE40743EProjection exposure system having a reflective reticleZEISS CARL SMT AG·Filed 2004·Granted Jun 16, 2009·13 cites·40 claims
- 2470US8901942B2System for locating and identifying at least two separate itemsFERGEN IMMANUEL·Filed 2012·Granted Dec 2, 2014·5 cites·6 claims
- 2569US10054035B2Inter coolerMAHLE INT GMBH·Filed 2016·Granted Aug 21, 2018·1 cites·20 claims
- 2667US10264730B2Agricultural tool control systemAGCO FEUCHT GMBH·Filed 2017·Granted Apr 23, 2019·3 cites·8 claims
- 2767US8953141B2Immersion lithographic apparatus and device manufacturing method with asymmetric acceleration profile of substrate table to maintain meniscus of immersion liquidLEENDERS MARTINUS HENDRIKUS ANTONIUS·Filed 2008·Granted Feb 10, 2015·2 cites·20 claims
- 2867US8696347B2System for post-treating and transferring preformsNETER WITOLD·Filed 2008·Granted Apr 15, 2014·3 cites·13 claims
- 2967US7605914B2Optical system and method for improving imaging properties thereofZEISS CARL SMT AG·Filed 2009·Granted Oct 20, 2009·2 cites·41 claims
- 3066US7221430B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted May 22, 2007·9 cites·12 claims
- 3165US7517213B2Cooling system for the cooling of tool piecesMHT MOLD & HOTRUNNER TECH AG·Filed 2004·Granted Apr 14, 2009·6 cites·11 claims
- 3265US6950174B2Projection exposure system for microlithography and method for generating microlithographic imagesZEISS STIFTUNG·Filed 2004·Granted Sep 27, 2005·5 cites·15 claims
- 3363US12459180B2Optimized injection mold plate, and injection mold comprising sameMHT MOLD & HOTRUNNER TECH AG·Filed 2021·Granted Nov 4, 2025·0 cites·13 claims
- 3463US8002540B2Neck block coolingMHT MOLD & HOTRUNNER TECH AG·Filed 2006·Granted Aug 23, 2011·2 cites·20 claims
- 3562US2025334436A1ConnectorLANDIS & GYR GMBH·Filed 2025·Application pending·0 cites
- 3662US2025334439A1Measurement insertLANDIS & GYR GMBH·Filed 2025·Application pending·0 cites
- 3760US7180667B2Objective with fluoride crystal lensesZEISS CARL SMT AG·Filed 2004·Granted Feb 20, 2007·4 cites·56 claims
- 3860US2025320113A1Plasma shielding for an electrostatic mems deviceASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 3958US7312852B2Polarized radiation in lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Dec 25, 2007·5 cites·29 claims
- 4058US2024342970A1Injection molding tooling tool, cleaning method for an injection molding tooling tool and injection molding methodMHT MOLD & HOTRUNNER TECH AG·Filed 2024·Application pending·0 cites
- 4156US6972831B2Projection exposure system for microlithography and method for generating microlithographic imagesZEISS STIFTUNG·Filed 2004·Granted Dec 6, 2005·3 cites·6 claims
- 4255US9119280B2Radiation sourceKEMPEN ANTONIUS THEODORUS WILHELMUS·Filed 2011·Granted Aug 25, 2015·1 cites·15 claims
- 4355US7929116B2Polarized radiation in lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2008·Granted Apr 19, 2011·0 cites·24 claims
- 4455US2024165542A1Hydrocyclone degassing deviceR L UG HAFTUNGSBESCHRAENKT·Filed 2023·Application pending·0 cites
- 4554US12285885B2Assembly for granulating extruded materialEREMA ENG RECYCLING MASCHINEN & ANLAGEN GMBH·Filed 2020·Granted Apr 29, 2025·0 cites·28 claims
- 4654US2008212052A1Optical arrangement and projection exposure system for microlithography with passive thermal compensationZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 4753US8500435B2Positioning deviceNETER WITOLD·Filed 2007·Granted Aug 6, 2013·0 cites·14 claims
- 4853US7382536B2Objective with fluoride crystal lensesZEISS CARL SMT AG·Filed 2006·Granted Jun 3, 2008·0 cites·61 claims
- 4953US2023292847A1Control circuitry for an aerosol-generating devicePHILIP MORRIS PRODUCTS SA·Filed 2021·Application pending·0 cites
- 5052US11504884B2Device for cooling particulate materialsEREMA ENG RECYCLING MASCHINEN & ANLAGEN GMBH·Filed 2020·Granted Nov 22, 2022·0 cites·28 claims
Showing the top 50 of 86 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Christian Wagner files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →