US2008217164A1PendingUtilityA1

Electrolytic Processing Apparatus

Assignee: TOMA YASUSHIPriority: Mar 29, 2004Filed: Mar 24, 2005Published: Sep 11, 2008
Est. expiryMar 29, 2024(expired)· nominal 20-yr term from priority
H10P 52/203C25F 7/00B23H 5/08
41
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Claims

Abstract

An electrolytic processing apparatus ( 50 ) has feed electrodes ( 74 ) to feed a current to a substrate (W), an ion exchanger ( 76 ) brought into contact with the substrate (W), and process electrodes ( 72 ) to perform an electrolytic process on the substrate (W). The electrolytic processing apparatus ( 50 ) has an electrolytic processing liquid source to supply an electrolytic processing liquid between the substrate (W) and the ion exchanger ( 76 ), and a regeneration liquid supply source to supply a regeneration liquid to a regeneration liquid chambers ( 90 a , 90 b ). The electrolytic processing apparatus ( 50 ) includes regeneration electrodes ( 84 ) spaced from the process electrodes ( 72 ). The feed electrode ( 74 ) has a potential higher than the process electrode ( 72 ) and the same polarity as the process electrode ( 72 ). The process electrode ( 72 ) has a potential higher than the regeneration electrode ( 84 ).

Claims

exact text as granted — not AI-modified
1 . An electrolytic processing apparatus comprising:
 a feed electrode configured to feed an electric current to a conductive material formed on a workpiece;   a contact member configured to be brought into contact with or close to the workpiece;   a process electrode operable to perform an electrolytic process on the conductive material formed on the workpiece;   an electrolytic processing liquid source operable to supply an electrolytic processing liquid between the workpiece and said contact member;   a regeneration liquid chamber configured to immerse said process electrode in a regeneration liquid;   a regeneration liquid supply source operable to supply the regeneration liquid to said regeneration liquid chamber;   a regeneration electrode spaced from said process electrode;   a power supply operable to apply a voltage between said feed electrode, said process electrode, and said regeneration electrode; and   a controller operable to control the voltage applied between said feed electrode, said process electrode, and said regeneration electrode so that said feed electrode has a potential higher than said process electrode and the same polarity as said process electrode, and that said process electrode has a potential higher than said regeneration electrode.   
   
   
       2 . The electrolytic processing apparatus as recited in  claim 1 , further comprising an insulation member disposed between said contact member and said process electrode, said insulation member having liquid permeability. 
   
   
       3 . The electrolytic processing apparatus as recited in  claim 2 , further comprising a diaphragm disposed between said contact member and said insulation member so as to separate the electrolytic processing liquid and said regeneration liquid. 
   
   
       4 . The electrolytic processing apparatus as recited in  claim 3 , wherein said diaphragm comprises an ion exchange film. 
   
   
       5 . The electrolytic processing apparatus as recited in  claim 1 , wherein said contact member comprises an ion exchanger. 
   
   
       6 . The electrolytic processing apparatus as recited in  claim 1 , wherein said process electrode has liquid permeability. 
   
   
       7 . The electrolytic processing apparatus as recited in  claim 1 , wherein said controller is operable to control potentials of said feed electrode, said process electrode, and said regeneration electrode, or currents flowing through said feed electrode, said process electrode, and said regeneration electrode. 
   
   
       8 . The electrolytic processing apparatus as recited in  claim 7 , wherein said controller is operable to control the current flowing through said process electrode so as to be equal to 1 to 30% of the current flowing through said feed electrode or said regeneration electrode.

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