Inventor · disambiguated record
Yasushi Toma
Also filed as: NABEYA OSAMU · TOMA YASUSHI
20 granted patents·20 pending applications·279 citations·filing 1994–2024
95Inventor score
Top patents by PatentIndex Score
40 records- 0197US8497476B2Inspection deviceHATAKEYAMA MASAHIRO·Filed 2012·Granted Jul 30, 2013·42 cites·10 claims
- 0295US6368493B1Electrolytic machining method and apparatusMORI YUZO·Filed 2000·Granted Apr 9, 2002·35 cites·11 claims
- 0394US6743349B2Electrochemical machining method and apparatusEBARA CORP·Filed 2001·Granted Jun 1, 2004·26 cites·18 claims
- 0492US8742344B2Inspection apparatusEBARA CORP·Filed 2013·Granted Jun 3, 2014·10 cites·9 claims
- 0589US6602396B2Electrolytic machining method and apparatusMORI YUZO·Filed 2001·Granted Aug 5, 2003·16 cites·43 claims
- 0688US6875335B2Electrolytic machining method and apparatusMORI YUZO·Filed 2003·Granted Apr 5, 2005·15 cites·42 claims
- 0786US10157722B2Inspection deviceEBARA CORP·Filed 2016·Granted Dec 18, 2018·3 cites·15 claims
- 0882US7101465B2Electrolytic processing device and substrate processing apparatusEBARA CORP·Filed 2003·Granted Sep 5, 2006·14 cites·62 claims
- 0977US5883470AFast atomic beam source with an inductively coupled plasma generatorEBARA CORP·Filed 1997·Granted Mar 16, 1999·70 cites·20 claims
- 1070US8946629B2Inspection apparatusEBARA CORP·Filed 2014·Granted Feb 3, 2015·1 cites·10 claims
- 1168US7255778B2Electrochemical machining method and apparatusEBARA CORP·Filed 2004·Granted Aug 14, 2007·6 cites·17 claims
- 1268US7208076B2Substrate processing apparatus and methodEBARA CORP·Filed 2002·Granted Apr 24, 2007·10 cites·27 claims
- 1364US7638030B2Electrolytic processing apparatus and electrolytic processing methodEBARA CORP·Filed 2003·Granted Dec 29, 2009·3 cites·24 claims
- 1464US2015097116A1Inspection apparatusEBARA CORP·Filed 2014·Application pending·0 cites
- 1563US2024274394A1Insulating structure, electrostatic lens, and charged particle beam deviceEBARA CORP·Filed 2024·Application pending·0 cites
- 1661US7527723B2Electrolytic processing apparatus and electrolytic processing methodEBARA CORP·Filed 2005·Granted May 5, 2009·2 cites·6 claims
- 1760US2023393085A1Method of evaluating primary optical system of electron beam observation device, evaluation device used therefor, and method of manufacturing sameEBARA CORP·Filed 2023·Application pending·0 cites
- 1860US2014014848A1Inspection deviceEBARA CORP·Filed 2013·Application pending·0 cites
- 1954US8133380B2Method for regenerating ion exchangerSAITO TAKAYUKI·Filed 2008·Granted Mar 13, 2012·0 cites·8 claims
- 2053US7427345B2Method and device for regenerating ion exchanger, and electrolytic processing apparatusEBARA CORP·Filed 2002·Granted Sep 23, 2008·3 cites·36 claims
- 2153US5594166ACantilever for use with atomic force microscope and process for the production thereofEBARA RES CO LTD·Filed 1994·Granted Jan 14, 1997·15 cites·6 claims
- 2248US10002740B2Inspection deviceEBARA CORP·Filed 2017·Granted Jun 19, 2018·0 cites·13 claims
- 2347US7563356B2Composite processing apparatus and methodEBARA CORP·Filed 2004·Granted Jul 21, 2009·0 cites·1 claims
- 2447US2008067077A1Electrolytic liquid for electrolytic polishing and electrolytic polishing methodKODERA AKIRA·Filed 2007·Application pending·0 cites
- 2546US2009107851A1Electrolytic polishing method of substrateKODERA AKIRA·Filed 2008·Application pending·0 cites
- 2646US2009095637A1Electrochemical polishing method and polishing methodTOMA YASUSHI·Filed 2008·Application pending·0 cites
- 2745US2008171440A1Pre-polishing treatment solution for interconnect substrate, polishing method, and method and apparatus for manufacturing interconnect substrateKODERA AKIRA·Filed 2008·Application pending·0 cites
- 2845US2007187259A1Substrate processing apparatus and methodKOBATA ITSUKI·Filed 2007·Application pending·0 cites
- 2944US2005183963A1Electrode for electrolytic processingFiled 2005·Application pending·0 cites
- 3041US2008217164A1Electrolytic Processing ApparatusTOMA YASUSHI·Filed 2005·Application pending·0 cites
- 3140US2007187257A1Electrolytic processing apparatus and electrolytic processing methodEBARA CORP·Filed 2005·Application pending·0 cites
- 3240US2008188162A1Electrochemical mechanical polishing apparatus conditioning method, and conditioning solutionKOBATA ITSUKI·Filed 2008·Application pending·0 cites
- 3340US2009078583A1Electrochemical mechanical polishing method and electrochemical mechanical polishing apparatusKOBATA ITSUKI·Filed 2008·Application pending·0 cites
- 3438US5614663ACantilever for use with atomic force microscope and process for the production thereofEBARA RES CO LTD·Filed 1995·Granted Mar 25, 1997·8 cites·6 claims
- 3537US2006091005A1Electolytic processing apparatusTOMA YASUSHI·Filed 2003·Application pending·0 cites
- 3637US2004256237A1Electrolytic processing apparatus and methodFiled 2002·Application pending·0 cites
- 3736US2003132103A1Electrolytic processing device and substrate processing apparatusFiled 2002·Application pending·0 cites
- 3836US2005115838A1Electrolytic processing apparatus and methodFiled 2003·Application pending·0 cites
- 3935US2010325913A1Substrate processing method and substrate processing apparatusWANG XINMING·Filed 2010·Application pending·0 cites
- 4033US2006289298A1Electrolytic processing apparatus and methodKOBATA ITSUKI·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →