Diffuser support

Abstract

Embodiments of gas distribution apparatus comprise a diffuser support member coupled to a diffuser and moveably disposed through a backing plate. Embodiments of methods of processing a substrate on a substrate receiving surface of a substrate support comprise providing a diffuser in which a diffuser support member supports the diffuser and is moveably disposed through the backing plate.

1 . A gas distribution apparatus, comprising:
 a diffuser,   a backing plate, and   a diffuser support member moveably disposed through the backing plate and coupled to the diffuser.   
   
   
       2 . The apparatus of  claim 1 , wherein a spacing between the backing plate and the diffuser is variable. 
   
   
       3 . The apparatus of  claim 1 , wherein the backing plate further comprises an opening wherein the diffuser support member is moveably disposed therethrough. 
   
   
       4 . The apparatus of  claim 3 , further comprising a sealing device associated with the diffuser support member. 
   
   
       5 . The apparatus of  claim 4 , wherein the sealing device provides a vacuum seal for the opening in the backing plate. 
   
   
       6 . The apparatus of  claim 5 , wherein the sealing device comprises an o-ring in sliding contact with the diffuser support member. 
   
   
       7 . The apparatus of  claim 5 , wherein the sealing device comprises an o-ring in sliding contact with the opening of the backing plate. 
   
   
       8 . The apparatus of  claim 5 , wherein the sealing device comprises a flexible bellows. 
   
   
       9 . The apparatus of  claim 1 , wherein the diffuser support member is coupled to a center region of the diffuser. 
   
   
       10 . The apparatus of  claim 1 , wherein the backing plate is coupled to an edge portion of the diffuser. 
   
   
       11 . A gas distribution apparatus, comprising:
 a chamber body including a bottom and walls,   a backing plate disposed over the chamber body,   a chamber interior volume bounded by the chamber body and the backing plate,   a diffuser disposed within the chamber interior volume, and   a diffuser support member moveably disposed through the backing plate and coupled to the diffuser.   
   
   
       12 . The apparatus of  claim 11 , further comprising a frame structure disposed outside of the chamber interior volume wherein the diffuser support member is coupled to the frame structure. 
   
   
       13 . The apparatus of  claim 12 , wherein the frame structure is electrically isolated from the diffuser support member. 
   
   
       14 . The apparatus of  claim 12 , further comprising a coupling assembly coupling the diffuser support member and the frame structure. 
   
   
       15 . The apparatus of  claim 14 , wherein coupling assembly comprises a hanger coupled to the frame structure and a support ring coupled to the hanger and the diffuser support member. 
   
   
       16 . The apparatus of  claim 15 , wherein support ring comprises an insulative material. 
   
   
       17 . The apparatus of  claim 15 , wherein the support ring comprises a conductive material. 
   
   
       18 . The apparatus of  claim 11 , further comprising an insulative sleeve disposed at least partially around the diffuser support member. 
   
   
       19 . The apparatus of  claim 15 , further comprising an insulative sleeve disposed at least partially around the hanger. 
   
   
       20 . The apparatus of  claim 12 , further comprising a cover over the frame structure to provide electrical isolation thereof. 
   
   
       21 . A gas distribution apparatus, comprising:
 a diffuser,   a backing plate,   a diffuser support member moveably disposed through the backing plate and coupled to the diffuser, and   a variable spacing between the backing plate and the diffuser.   
   
   
       22 . The apparatus of  claim 21 , further comprising a vacuum pump providing a vacuum force to the backing plate. 
   
   
       23 . The apparatus of  claim 21 , wherein the variable spacing between the backing plate and the diffuser is a function of the vacuum pressure applied to backing plate 
   
   
       24 . The apparatus of  claim 21 , wherein movement of the backing plate causes the variable spacing between the backing plate and the diffuser. 
   
   
       25 . A method of processing a substrate on a substrate receiving surface of a substrate support, comprising:
 providing a diffuser within a chamber interior volume bounded by a chamber body and a backing plate,   supporting the diffuser with a diffuser support member moveably disposed through the backing plate,   applying a vacuum pressure within the chamber interior volume wherein the backing plate flexes in response to the vacuum pressure, and   delivering a gas through the diffuser towards the substrate receiving surface of the substrate support.   
   
   
       26 . The method of  claim 25 , further comprising applying an RF power to the diffuser. 
   
   
       27 . The method of  claim 25 , wherein a spacing between the backing plate and the diffuser is variable. 
   
   
       28 . A method of processing a substrate within a chamber, comprising:
 providing a chamber interior volume bounded by walls, a bottom, and a backing plate;   providing a diffuser within the chamber volume;   providing a diffuser support member moveably disposed through the backing plate and coupled to the diffuser; and   coupling the diffuser support member to a structure outside of the chamber interior volume.   
   
   
       29 . The method of  claim 28 , insulating the structure from a RF power provided to the diffuser. 
   
   
       30 . The method of  claim 28 , providing a sealing device to isolate the chamber interior volume and to allow movement of the diffuser support member through the backing plate. 
   
   
       31 . The method of  claim 28 , wherein the sealing device comprises an o-ring in sliding contact to the diffuser support member. 
   
   
       32 . The method of  claim 28 , wherein the sealing device comprises an o-ring in sliding contact to an opening through the backing plate. 
   
   
       33 . The method of  claim 28 , wherein the sealing device is a flexible bellows surrounding at least a portion of the diffuser support member.