Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials

Abstract

A composition for removing resists and etching residue from substrates containing at least one nucleophilic amine compound having oxidation and reduction potentials, at least one organic solvent, water and, optionally, a chelating agent is described. The chelating agent is preferred to be included since it provides added stability and activity to the cleaning composition so that the composition has long term effectiveness. If a chelating agent is not present, the composition, while providing for adequate stripping and cleaning upon initial use of the composition following mixing, has only short term stability. In this latter instance, the nucleophilic amine compound and organic solvent components of the composition preferably are maintained separate from each other until it is desired to use the composition. Thereafter, the components are combined. Following use of the composition, the non-used portion of the composition can be disposed of or be reactivated by the addition of a chelating agent.

1 - 19 . (canceled) 
     
     
         20 . A resist and etching residue removal composition comprising:
 (1) from about 5% to 50% by weight of hydroxylamine or a derivative thereof having a general formula of:   
       
         
           
           
               
               
           
         
         wherein R 1 , R 2 , and R 3  are independently hydrogen; a C 1 -C 6  straight, branched or cyclo alkyl, alkenyl, or alkynyl group; an acyl group; a straight or branched alkoxy group, amidyl group, carboxyl group, alkoxyalkyl group, alkylamino group, alkylsulfonyl group, or sulfonic acid group; or a salt thereof; 
         (2) tetramethyl ammonium hydroxide; 
         (3) from about 10% to 80% by weight of at least one organic solvent miscible with the hydroxylamine or the hydroxylamine derivative; and 
         (4) from about 5% to 30% by weight of an aromatic hydroxy-functional compound having a general formula of: 
       
       
         
           
           
               
               
           
         
         
           wherein n=1-4, m=2-5 and each R is independently hydrogen; a C 1 -C 6  straight, branched or cyclo alkyl, alkenyl, or alkynyl group; an acyl group; a straight or branched alkoxy group, amidyl group, carboxyl group, alkoxyalkyl group, alkylamino group, alkylsulfonyl group, or sulfonic acid group; or a salt thereof. 
         
       
     
     
         21 . The composition of  claim 20 , wherein the composition comprises more than one organic solvent. 
     
     
         22 . The composition of  claim 20 , wherein the at least one organic solvent is selected from the group consisting of dimethylsulfoxide, N-methyl-2-pyrrolidinone, N,N-dimethylpropanamide, N,N-dimethylformamide, ethylene glycol, ethylene glycol alkyl ether, diethylene glycol alkyl ether, triethylene glycol alkyl ether, propylene glycol, propylene glycol alkyl ether, dipropylene glycol alkyl ether, tripropylene glycol alkyl ether, N-substituted pyrrolidone, and mixture thereof