Inventor · disambiguated record
Robert J. Small
Also filed as: SMALL ROBERT J · SMALL ROBERT JAMES
36 granted patents·12 pending applications·1,908 citations·filing 1977–2011
98Inventor score
Files withEKC TECHNOLOGY INC29DUPONT AIR PROD NANOMATERIALS3ASHLAND OIL INC2SMALL ROBERT J2ADVANCED PROCESS TECHNOLOGIES LLC1
Top patents by PatentIndex Score
48 records- 0197US5981454APost clean treatment composition comprising an organic acid and hydroxylamineEKC TECHNOLOGY INC·Filed 1997·Granted Nov 9, 1999·272 cites·8 claims
- 0296US6313039B1Chemical mechanical polishing composition and processEKC TECHNOLOGY INC·Filed 2000·Granted Nov 6, 2001·125 cites·16 claims
- 0396US6117783AChemical mechanical polishing composition and processEKC TECHNOLOGY INC·Filed 1997·Granted Sep 12, 2000·240 cites·6 claims
- 0495US6546939B1Post clean treatmentEKC TECHNOLOGY INC·Filed 2000·Granted Apr 15, 2003·106 cites·40 claims
- 0595US6156661APost clean treatmentEKC TECHNOLOGY INC·Filed 1999·Granted Dec 5, 2000·164 cites·12 claims
- 0692US6916772B2Sulfoxide pyrolid(in)one alkanolamine cleaner compositionEKC TECHNOLOGY INC·Filed 2002·Granted Jul 12, 2005·58 cites·37 claims
- 0791US6248704B1Compositions for cleaning organic and plasma etched residues for semiconductors devicesEKC TECHNOLOGY INC·Filed 1999·Granted Jun 19, 2001·116 cites·23 claims
- 0890US7144849B2Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentialsEKC TECHNOLOGY INC·Filed 2005·Granted Dec 5, 2006·11 cites·12 claims
- 0990US6235693B1Lactam compositions for cleaning organic and plasma etched residues for semiconductor devicesEKC TECHNOLOGY INC·Filed 1999·Granted May 22, 2001·111 cites·21 claims
- 1090US5911835AMethod of removing etching residueEKC TECHNOLOGY INC·Filed 1997·Granted Jun 15, 1999·102 cites·17 claims
- 1189US7273060B2Methods for chemically treating a substrate using foam technologyEKC TECHNOLOGY INC·Filed 2006·Granted Sep 25, 2007·16 cites·30 claims
- 1289US6498131B1Composition for cleaning chemical mechanical planarization apparatusEKC TECHNOLOGY INC·Filed 2000·Granted Dec 24, 2002·56 cites·14 claims
- 1388US6777380B2Compositions for cleaning organic and plasma etched residues for semiconductor devicesEKC TECHNOLOGY INC·Filed 2001·Granted Aug 17, 2004·59 cites·17 claims
- 1487US6319885B1Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentialsEKC TECHNOLOGIES INC·Filed 2000·Granted Nov 20, 2001·30 cites·7 claims
- 1586US7419911B2Compositions and methods for rapidly removing overfilled substratesEKC TECHNOLOGY INC·Filed 2004·Granted Sep 2, 2008·37 cites·24 claims
- 1686US6645930B1Clean room wipes for neutralizing caustic chemicalsEKC TECHNOLOGY INC·Filed 2000·Granted Nov 11, 2003·28 cites·52 claims
- 1784US6251150B1Slurry composition and method of chemical mechanical polishing using sameEKC TECHNOLOGY INC·Filed 1999·Granted Jun 26, 2001·75 cites·43 claims
- 1883US6635186B1Chemical mechanical polishing composition and processEKC TECHNOLOGY INC·Filed 1999·Granted Oct 21, 2003·45 cites·6 claims
- 1982US7923424B2Semiconductor cleaning using superacidsADVANCED PROCESS TECHNOLOGIES LLC·Filed 2006·Granted Apr 12, 2011·9 cites·19 claims
- 2082US7387130B2Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentialsEKC TECHNOLOGY INC·Filed 2006·Granted Jun 17, 2008·4 cites·11 claims
- 2182US6110881ACleaning solutions including nucleophilic amine compound having reduction and oxidation potentialsEKC TECHNOLOGY INC·Filed 1996·Granted Aug 29, 2000·61 cites·5 claims
- 2280US7135445B2Process for the use of bis-choline and tris-choline in the cleaning of quartz-coated polysilicon and other materialsEKC TECHNOLOGY INC·Filed 2003·Granted Nov 14, 2006·27 cites·27 claims
- 2379US7051742B2Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentialsEKC TECHNOLOGY INC·Filed 2004·Granted May 30, 2006·12 cites·24 claims
- 2479US6638326B2Compositions for chemical mechanical planarization of tantalum and tantalum nitrideEKC TECHNOLOGY INC·Filed 2001·Granted Oct 28, 2003·22 cites·10 claims
- 2578US6756308B2Chemical-mechanical planarization using ozoneEKC TECHNOLOGY INC·Filed 2001·Granted Jun 29, 2004·21 cites·19 claims
- 2677US7456140B2Compositions for cleaning organic and plasma etched residues for semiconductor devicesEKC TECHNOLOGY INC·Filed 2004·Granted Nov 25, 2008·24 cites·7 claims
- 2776US7247566B2CMP method for copper, tungsten, titanium, polysilicon, and other substrates using organosulfonic acids as oxidizersDUPONT AIR PROD NANOMATERIALS·Filed 2003·Granted Jul 24, 2007·23 cites·18 claims
- 2874US7314823B2Chemical mechanical polishing composition and processDUPONT AIRPRODUCTS NANOMATERIA·Filed 2005·Granted Jan 1, 2008·4 cites·30 claims
- 2971US6866792B2Compositions for chemical mechanical planarization of copperEKC TECHNOLOGY INC·Filed 2001·Granted Mar 15, 2005·15 cites·45 claims
- 3069US7033942B2Chemical mechanical polishing composition and processDUPONT AIR PROD NANOMATERIALS·Filed 2003·Granted Apr 25, 2006·8 cites·29 claims
- 3165US6852682B2Composition for cleaning chemical mechanical planarization apparatusEKC TECHNOLOGY INC·Filed 2002·Granted Feb 8, 2005·9 cites·12 claims
- 3263US2009011967A1Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentialsEKC TECHNOLOGY INC·Filed 2008·Application pending·0 cites
- 3361US7276180B2Chemical mechanical polishing composition and processDUPONT AIR PROD NANOMATERIALS·Filed 2003·Granted Oct 2, 2007·4 cites·20 claims
- 3455US4120819AMethod for platinum or palladium catalyst reactivationASHLAND OIL INC·Filed 1977·Granted Oct 17, 1978·10 cites·5 claims
- 3546US4960944ATetralin oxidationWESLEY II LIMITED PARTNERSHIP·Filed 1989·Granted Oct 2, 1990·3 cites·15 claims
- 3645US2011187010A1Semiconductor cleaning using superacidsSMALL ROBERT J·Filed 2011·Application pending·0 cites
- 3743US2002052301A1Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentialsFiled 2001·Application pending·0 cites
- 3841US2004025444A1Fenton's reagent composition for chemical-mechanical polishing, method of using same, and substrate treated with sameEKC TECHNOLOGY INC·Filed 2003·Application pending·0 cites
- 3940US2006183654A1Semiconductor cleaning using ionic liquidsSMALL ROBERT J·Filed 2006·Application pending·0 cites
- 4039US2004161938A1Chemical-mechanical planarization using ozoneFiled 2004·Application pending·0 cites
- 4139US2004217006A1Residue removers for electrohydrodynamic cleaning of semiconductorsFiled 2004·Application pending·0 cites
- 4238US7033409B2Compositions for chemical mechanical planarization of tantalum and tantalum nitrideDANANOMATERIALS LLC·Filed 2003·Granted Apr 25, 2006·1 cites·20 claims
- 4338US2004134873A1Abrasive-free chemical mechanical polishing composition and polishing process containing sameFiled 2003·Application pending·0 cites
- 4437US2003032567A1Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentialsEKC TECHNOLOGY INC·Filed 2002·Application pending·0 cites
- 4536US2004140288A1Wet etch of titanium-tungsten filmFiled 2003·Application pending·0 cites
- 4636US2004038840A1Oxalic acid as a semiaqueous cleaning product for copper and dielectricsFiled 2003·Application pending·0 cites
- 4735US2002111024A1Chemical mechanical polishing compositionsFiled 2001·Application pending·0 cites
- 4832US4127611AProcess for the reductive methylation of an acid hydrazideASHLAND OIL INC·Filed 1977·Granted Nov 28, 1978·0 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →