US2009183476A1PendingUtilityA1
Gas purifying apparatus and semiconductor manufacturing apparatus
Est. expiryApr 7, 2026(expired)· nominal 20-yr term from priority
H10P 95/00B01D 46/62B01D 46/521B01D 46/52
44
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Claims
Abstract
A gas purifying apparatus for removing particles from a gas. The gas purifying apparatus includes a first filter layer and a second filter layer, and the diameter of a fiber forming the first filter layer is larger than that of a fiber forming the second filter layer. A semiconductor manufacturing apparatus can use such a gas purifying apparatus.
Claims
exact text as granted — not AI-modified1 : A gas purifying apparatus for removing particles from a gas, comprising:
a first filter layer and a second filter layer disposed upstream and downstream of a flow of the gas, respectively, wherein the first filter layer captures particles which are smaller than particles captured by the second filter layer.
2 : The gas purifying apparatus of claim 1 , wherein the diameter of a fiber forming the first filter layer is larger than the diameter of a fiber forming the second filter layer.
3 : The gas purifying apparatus of claim 2 , wherein the particles have diameters no greater than about 50 nm and contain metal.
4 : The gas purifying apparatus of claim 2 , wherein a pressure loss in the first filter layer is smaller than a pressure loss in the second filter layer.
5 : The gas purifying apparatus of claim 1 , wherein the first filter layer is made up of a single layer or plural layers.
6 : The gas purifying apparatus of claim 1 , wherein a material forming the first filter layer is selected from a group including metal, resin, ceramics and activated carbon, and a material forming the second filter layer is glass or resin.
7 : The gas purifying apparatus of claim 1 , further comprising a filtration layer for eliminating an organic material or an ion from the gas.
8 . (canceled)
9 : A gas purifying apparatus for eliminating particles from a gas, comprising:
a first filter layer; and a second filter layer, wherein the first and second filter layers have different characteristics of particle capturing efficiency depending on a diameter variation of the particles.
10 : A gas purifying apparatus for eliminating particles from a gas, comprising:
a first filter layer; and a second filter layer, wherein the first and second filter layers have different particle capturing efficiencies for particles having a same diameter.Join the waitlist — get patent alerts
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