Inventor · disambiguated record
Kazuya Dobashi
Also filed as: DOBASHI KAZUYA
27 granted patents·17 pending applications·59 citations·filing 2003–2025
94Inventor score
Files withTOKYO ELECTRON LTD32DOBASHI KAZUYA5TAMURA AKITAKE2TEL MFG AND ENGINEERING OF AMERICA INC2INAI KENSUKE1
Top patents by PatentIndex Score
44 records- 0188US9960056B2Substrate cleaning method, substrate cleaning apparatus and vacuum processing systemTOKYO ELECTRON LTD·Filed 2013·Granted May 1, 2018·10 cites·15 claims
- 0287US11694872B2Pattern enhancement using a gas cluster ion beamTEL MFG AND ENGINEERING OF AMERICA INC·Filed 2022·Granted Jul 4, 2023·1 cites·22 claims
- 0384US10381233B2Method and apparatus for substrate processingTOKYO ELECTRON LTD·Filed 2017·Granted Aug 13, 2019·5 cites·11 claims
- 0484US9837260B2Cleaning method, processing apparatus, and storage mediumINAI KENSUKE·Filed 2012·Granted Dec 5, 2017·12 cites·9 claims
- 0581US9099298B2Substrate cleaning apparatus and substrate cleaning methodDOBASHI KAZUYA·Filed 2012·Granted Aug 4, 2015·6 cites·9 claims
- 0680US10786837B2Method for cleaning chamber of substrate processing apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Sep 29, 2020·3 cites·12 claims
- 0777US9881815B2Substrate cleaning method, substrate cleaning device, and vacuum processing deviceTOKYO ELECTRON LTD·Filed 2013·Granted Jan 30, 2018·4 cites·8 claims
- 0871US8404590B2Plasma processing method and storage mediumLEE SUNG TAE·Filed 2011·Granted Mar 26, 2013·3 cites·13 claims
- 0971US2025372394A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1071US2025383604A1Substrate treatment method and substrate treatment apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1170US7383841B2Method of cleaning substrate-processing device and substrate-processing deviceTOKYO ELECTRON LTD·Filed 2003·Granted Jun 10, 2008·10 cites·22 claims
- 1269US9214364B2Substrate cleaning apparatus and vacuum processing systemDOBASHI KAZUYA·Filed 2012·Granted Dec 15, 2015·3 cites·13 claims
- 1368US11865590B2Substrate cleaning method, processing container cleaning method, and substrate processing deviceTOKYO ELECTRON LTD·Filed 2022·Granted Jan 9, 2024·0 cites·4 claims
- 1468US11450506B2Pattern enhancement using a gas cluster ion beamTEL MFG AND ENGINEERING OF AMERICA INC·Filed 2020·Granted Sep 20, 2022·0 cites·22 claims
- 1564US8673086B2Method and device for cleaning a substrate and storage mediumTAMURA AKITAKE·Filed 2009·Granted Mar 18, 2014·2 cites·10 claims
- 1663US12172198B2Gas cluster processing device and gas cluster processing methodTOKYO ELECTRON LTD·Filed 2022·Granted Dec 24, 2024·0 cites·7 claims
- 1758US11504751B2Substrate cleaning method, processing container cleaning method, and substrate processing deviceTOKYO ELECTRON LTD·Filed 2019·Granted Nov 22, 2022·0 cites·4 claims
- 1858US2009194233A1Component for semicondutor processing apparatus and manufacturing method thereofTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 1957US11772138B2Processing apparatus and processing method, and gas cluster generating apparatus and gas cluster generating methodTOKYO ELECTRON LTD·Filed 2022·Granted Oct 3, 2023·0 cites·18 claims
- 2057US2011244693A1Component for semiconductor processing apparatus and manufacturing method thereofTAMURA AKITAKE·Filed 2011·Application pending·0 cites
- 2154US12165848B2Substrate processing method, substrate processing apparatus, and method for producing nanowire or nanosheet transistorTOKYO ELECTRON LTD·Filed 2020·Granted Dec 10, 2024·0 cites·20 claims
- 2252US11517943B2Cleaning method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Dec 6, 2022·0 cites·16 claims
- 2349US11267021B2Gas cluster processing device and gas cluster processing methodTOKYO ELECTRON LTD·Filed 2018·Granted Mar 8, 2022·0 cites·6 claims
- 2449US2005139234A1Method of cleaning substrate processing apparatus and computer-readable recording mediumTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 2547US7923680B2Analysis method and analysis apparatusTOKYO ELECTRON LTD·Filed 2007·Granted Apr 12, 2011·0 cites·12 claims
- 2644US10049899B2Substrate cleaning apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Aug 14, 2018·0 cites·4 claims
- 2744US2016163533A1Tantalum oxide film removal method and apparatusTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 2844US2016148818A1Titanium oxide film removal method and apparatusTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 2944US2009183476A1Gas purifying apparatus and semiconductor manufacturing apparatusTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 3042US8574448B2Plasma generation method, cleaning method, and substrate processing methodKANNAN HIROSHI·Filed 2010·Granted Nov 5, 2013·0 cites·20 claims
- 3142US2015027501A1Substrate cleaning method and substrate cleaning apparatusTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 3242US2006226119A1Method for generating plasma method for cleaning and method for treating substrateTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 3341US10163622B2Substrate cleaning method, substrate processing method, substrate processing system and semiconductor device manufacturing methodTOKYO ELECTRON LTD·Filed 2015·Granted Dec 25, 2018·0 cites·9 claims
- 3441US8268185B2Method for analyzing quartz memberDOBASHI KAZUYA·Filed 2007·Granted Sep 18, 2012·0 cites·8 claims
- 3540US11446714B2Processing apparatus and processing method, and gas cluster generating apparatus and gas cluster generating methodTOKYO ELECTRON LTD·Filed 2017·Granted Sep 20, 2022·0 cites·10 claims
- 3640US2015144595A1Gas cluster irradiation mechanism, substrate processing apparatus using same, and gas cluster irradiation methodTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 3738US11761075B2Substrate cleaning apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Sep 19, 2023·0 cites·32 claims
- 3838US2012312334A1Resist removal apparatus and resist removal methodDOBASHI KAZUYA·Filed 2012·Application pending·0 cites
- 3937US2019035651A1Substrate cleaning method, substrate cleaning device, and method of selecting cluster generating gasTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 4035US2012071003A1Vacuum Processing Apparatus, Vacuum Processing Method, and Micro-Machining ApparatusDOBASHI KAZUYA·Filed 2011·Application pending·0 cites
- 4134US2015251913A1Graphene machining methodTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 4234US2016001334A1Substrate cleaning method and substrate cleaning apparatusTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 4331US9875915B2Method for removing metal contamination and apparatus for removing metal contaminationTOKYO ELECTRON LTD·Filed 2015·Granted Jan 23, 2018·0 cites·22 claims
- 4429US2017032984A1Liquid processing method and liquid processing apparatusTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →