US2011024964A1PendingUtilityA1

Substrate processing pallet with cooling

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Assignee: NEXX SYSTEMS INCPriority: Mar 9, 2007Filed: Oct 8, 2010Published: Feb 3, 2011
Est. expiryMar 9, 2027(~0.7 yrs left)· nominal 20-yr term from priority
H10P 72/0434H10P 72/72H10P 72/32H10P 72/0432
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Claims

Abstract

In one exemplary embodiment, a substrate processing pallet is provided. The substrate processing pallet includes a base member, and an interface pad attachable to the base member. The interface pad has substantially the same coefficient of thermal expansion as the base member and adapted to facilitate cooling of the substrate. The substrate processing pallet also having a surface of the base member having features for aligning a substrate on the interface pad.

Claims

exact text as granted — not AI-modified
1 . A substrate processing pallet comprising:
 a base member;   an interface pad attachable to the base member, the interface pad having substantially the same coefficient of thermal expansion as the base member and adapted to facilitate cooling of the substrate; and   a surface of the base member having features for aligning a substrate on the interface pad.   
     
     
         2 . The substrate processing pallet of  claim 1  further comprising a bonding layer for bonding the base member and the interface pad. 
     
     
         3 . The substrate processing pallet of  claim 1  further comprising:
 at least one recess adapted to receive a substrate, the recess including a support structure adapted to contact a portion of the substrate through the composite interface pad, and a plurality of apertures through each of which a lift pin may extend to initially support the substrate above the recess and to subsequently retract to deposit the substrate onto the composite interface pad; and 
 a plurality of side surfaces, at least one of the side surfaces having a process positioning feature adapted to engage with a process chamber feature located inside of a process chamber to particularly position the pallet within the process chamber in response to the pallet be placed into the process chamber, at least one of the side surfaces having a transport positioning feature adapted to engage with a first end effector alignment feature of a first transport mechanism to particularly position the pallet with respect to the end effector, and at least one of the side surfaces having one or more support features, each adapted to engage with a corresponding end effector support feature of the transport mechanism to support the pallet on the end effector during transport. 
 
     
     
         4 . The substrate processing pallet of  claim 1  wherein the base member comprises aluminum. 
     
     
         5 . The substrate processing pallet of  claim 1  wherein the interface pad comprises a composite material. 
     
     
         6 . The substrate processing pallet of  claim 5  wherein the composite material comprises an alumina particulate and a polymer matrix. 
     
     
         7 . The substrate processing pallet of  claim 1  further comprising a removable, chemically resistant cover for facilitating cleaning. 
     
     
         8 . The substrate processing pallet of  claim 7  wherein in the chemically resistant cover comprises a feature adapted for positioning and/or gripping the substrate. 
     
     
         9 . The substrate processing pallet of  claim 1  further comprising a means for cooling the pallet. 
     
     
         10 . The substrate processing pallet of  claim 9  wherein the means for cooling the pallet comprises a water cooled plate in thermal communication with the pallet. 
     
     
         11 . The substrate processing pallet of  claim 9  further comprising an interface layer disposed between the pallet and the means for cooling the pallet, to facilitate thermal conductance between the pallet and the means for cooling the pallet. 
     
     
         12 . The substrate processing pallet of  claim 1  further comprising a process alignment feature for matching corresponding tray alignment features, to facilitate the use of a close tolerance process shield.

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