Batch processing platform for ald and cvd

Abstract

A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.

1 . A substrate processing apparatus, comprising:
 a substrate processing chamber;   a buffer chamber positioned adjacent to the substrate processing chamber;   a processing cassette that is adapted to support two or more substrates at a first spacing, wherein the processing cassette is transferable between the buffer chamber and the substrate processing chamber;   a staging cassette that is adapted to support two or more substrates at the first spacing; and   a transfer robot adapted to transfer a substrate between a substrate transport pod and the staging cassette using a single substrate handling blade, and to transfer substrates between the staging cassette and the processing cassette using multiple substrate handling blades.   
     
     
         2 . The apparatus of  claim 1 , further comprising a factory interface having:
 an atmospheric transfer region in which the staging cassette and the transfer robot are disposed;   a filtration unit that is adapted to provide filtered air to the atmospheric transfer region; and   at least one load station for mounting the substrate transport pod adjacent the atmospheric transfer region,   wherein the at least one load station is further adapted to open the substrate transport pod so that the interior of the substrate transport pod is in fluid communication with the atmospheric transfer region, and wherein the substrate transport pod is adapted to contain two or more substrates horizontally at a second spacing.   
     
     
         3 . The apparatus of  claim 1 , wherein the transfer robot is further adapted to remain translationally stationary while transferring one or more substrates between the processing cassette and the staging cassette. 
     
     
         4 . The apparatus of  claim 1 , further comprising:
 a second substrate processing chamber;   a second buffer chamber positioned adjacent to the second substrate processing chamber;   a second processing cassette that is adapted to support two or more substrates at the first spacing, wherein the second processing cassette is transferable between the second buffer chamber and the second substrate processing chamber; and   a second staging cassette that is adapted to support two or more substrates at the first spacing, wherein the transfer robot is further adapted to transfer substrates between the second staging cassette and the second processing cassette using the multiple substrate handling blades.   
     
     
         5 . The apparatus of  claim 4 , wherein the transfer robot is further adapted to transfer substrates between the first processing cassette and the second staging cassette using the multiple substrate handling blades. 
     
     
         6 . The apparatus of  claim 1 , wherein the multiple substrate handling blades are fixed-pitch substrate handling blades. 
     
     
         7 . The apparatus of  claim 1 , further comprising:
 a fluid delivery system that is in fluid communication with an internal process volume of the substrate processing chamber, wherein the fluid delivery system is adapted to deliver a precursor-containing fluid to the internal process volume so that a chemical vapor deposition (CVD) or an atomic layer deposition (ALD) process can be performed on one or more substrates positioned therein; and   a facilities tower proximate the substrate processing chamber, wherein the facilities tower contains precursor-containing ampoules, and wherein the fluid delivery system fluidly couples the facilities tower to the substrate processing chamber by means of an overhead rack.   
     
     
         8 . The apparatus of  claim 1 , further comprising:
 a vertical lift mechanism adapted to transfer a processing cassette into and out of the substrate processing chamber.   
     
     
         9 . The apparatus of  claim 1 , wherein the transfer robot has:
 a two-bar linkage arm; and   a motion assembly that is adapted to position the two-bar linkage arm along a linear path, wherein the linear path contains locations proximate the at least one load station and the substrate processing chamber.   
     
     
         10 . The apparatus of  claim 1 , further comprising:
 a second substrate processing chamber; and   a service aisle that is disposed between the first and the second substrate processing chambers and is adapted to provide all necessary service access to the transfer robot and the first and second processing chambers.   
     
     
         11 . The apparatus of  claim 10 , further comprising:
 a first load station and a second load station, wherein the first load station is proximate the first substrate processing chamber and the second load station is proximate the second substrate processing chamber.   
     
     
         12 . The apparatus of  claim 11 , further comprising:
 a second transfer robot disposed in the atmospheric transfer region proximate the second load station and the second substrate processing chamber and adapted to transfer a substrate between the second load station and the second substrate processing chamber, wherein the second transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades, and wherein the first transfer robot is proximate the first load station and the first substrate processing chamber.   
     
     
         13 . A substrate processing apparatus, comprising:
 a substrate processing chamber;   a processing cassette that is adapted to support two or more substrates;   a cassette handler robot adapted to transfer the processing cassette between a staging platform and the substrate processing chamber;   a substrate transfer robot that is adapted to transfer substrates between a substrate transport pod and the processing cassette;   a buffer chamber having one or more walls that form an internal volume, wherein the internal volume is positioned below the substrate processing chamber; and   a cassette transfer region in which the staging platform is disposed that is generally maintained at atmospheric pressure.   
     
     
         14 . The apparatus of  claim 13 , wherein the cassette handler robot is a linear translator and wherein the linear translator is adapted to contain a lift mechanism. 
     
     
         15 . The apparatus of  claim 13 , wherein the cassette handler robot is a rotary table. 
     
     
         16 . The apparatus of  claim 15 , wherein the first processing cassette is on a staging platform and the rotary table is adapted to:
 receive a second processing cassette from a lift mechanism;   rotatably swap the positions of the first processing cassette and the second processing cassette; and   position the first processing cassette to enable transferal of the first processing cassette between the substrate processing chamber and the cassette transfer region by use of the lift mechanism.   
     
     
         17 . The apparatus of  claim 16 , wherein the staging platform is on the rotary table. 
     
     
         18 . The apparatus of  claim 17 , wherein the rotary table is contained in the internal volume. 
     
     
         19 . The apparatus of  claim 18 , wherein the rotary table is adapted to horizontally translate the first processing cassette and the second processing cassette. 
     
     
         20 . The apparatus of  claim 13 , further comprising a factory interface having:
 an atmospheric transfer region in which the staging cassette and the transfer robot are disposed;   a filtration unit that is adapted to provide filtered air to the atmospheric transfer region; and   at least one load station for mounting the substrate transport pod adjacent the atmospheric transfer region,   wherein the at least one load station is further adapted to open the substrate transport pod so that the interior of the substrate transport pod is in fluid communication with the atmospheric transfer region, and wherein the substrate transport pod is adapted to contain two or more substrates horizontally at a second spacing.