Package carrier, semiconductor package, and process for fabricating same
Abstract
A package carrier includes: (1) a dielectric layer; (2) a first electrically conductive pattern, embedded in the dielectric layer and disposed adjacent to a first surface of the dielectric layer, and including a plurality of first pads; (3) a plurality of first electrically conductive posts, extending through the dielectric layer, wherein each of the first electrically conductive posts includes a first electrically conductive post segment connected to at least one of the first pads and a second electrically conductive post segment connected to the first electrically conductive post segment, and a lateral extent of the first electrically conductive post segment is different from a lateral extent of the second electrically conductive post segment; and (4) a second electrically conductive pattern, disposed adjacent to a second surface of the dielectric layer, and including a plurality of second pads connected to respective ones of the second electrically conductive post segments.
Claims
exact text as granted — not AI-modified1 . A package carrier, comprising:
a dielectric layer having a plurality of openings; a first conductive pattern, disposed adjacent to a first surface of the dielectric layer, the first conductive pattern including a plurality of first pads; and a plurality of conductive vias disposed in respective ones of the openings, wherein each conductive via includes a first via segment, connected to at least one of the first pads, and a second via segment, connected to the first via segment, such that a lateral extent of the first via segment is different from a lateral extent of the second via segment.
2 . The package carrier as claimed in claim 1 , wherein the first conductive pattern is embedded in the dielectric layer.
3 . The package carrier as claimed in claim 1 , wherein the lateral extent of the first via segment is greater than the lateral extent of the second via segment.
4 . The package carrier as claimed in claim 1 , wherein the conductive vias provide a locking mechanism with respect to the dielectric layer.
5 . The package carrier as claimed in claim 1 , further comprising:
a second conductive pattern, disposed adjacent to a second surface of the dielectric layer and including a plurality of second pads, wherein the second via segment of each conductive via is connected to at least one of the second pads.
6 . The package carrier as claimed in claim 5 , further comprising:
a chip pad support, extending through the dielectric layer, wherein the first conductive pattern includes a third pad corresponding to a chip pad, and the chip pad support includes a first support segment, connected to the chip pad, and a second support segment, connected to the first support segment.
7 . The package carrier as claimed in claim 6 , wherein the second conductive pattern includes a fourth pad connected to the second support segment, a lateral extent of the first support segment is greater than the lateral extent of the first via segment, and a lateral extent of the second support segment is greater than the lateral extent of the second via segment.
8 . The package carrier as claimed in claim 7 , wherein the lateral extent of the first support segment is greater than the lateral extent of the second support segment.
9 . The package carrier as claimed in claim 1 , further comprising:
a chip pad support, extending through the dielectric layer, wherein the first conductive pattern includes a chip pad, and the chip pad support includes a first support segment, connected to the chip pad, and a second support segment, connected to the first support segment.
10 . A semiconductor package, comprising:
a package carrier, including:
a dielectric layer;
a top conductive pattern, disposed adjacent to a top surface of the dielectric layer, and including a plurality of first pads;
a bottom conductive pattern, disposed adjacent to a bottom surface of the dielectric layer, and including a plurality of second pads; and
a plurality of conductive vias within the dielectric layer and extending between the top conductive pattern and the bottom conductive pattern, wherein each conductive via includes a first segment, connected to at least one of the first pads, and a second segment, connected to at least one of the second pads; and
a chip, attached to the package carrier and connected to the first pads.
11 . The semiconductor package as claimed in claim 10 , wherein the top conductive pattern is embedded in the dielectric layer.
12 . The semiconductor package as claimed in claim 10 , wherein a lateral extent of the first segment is greater than a lateral extent of the second segment.
13 . The semiconductor package as claimed in claim 10 , wherein the conductive vias provide a locking mechanism with respect to the dielectric layer.
14 . The semiconductor package as claimed in claim 10 , wherein a top surface of the top conductive pattern is aligned with the top surface of the dielectric layer.
15 . The semiconductor package as claimed in claim 10 , wherein the package carrier further includes:
a chip pad support, extending through the dielectric layer, wherein the top conductive pattern includes a third pad corresponding to a chip pad, the chip is disposed adjacent to the chip pad, the chip pad support includes a third segment, connected to the chip pad, and a fourth segment, connected to the third segment, the bottom conductive pattern includes a fourth pad connected to the fourth segment, a lateral extent of the third segment is greater than a lateral extent of the first segment, and a lateral extent of the fourth segment is greater than a lateral extent of the second segment.
16 . The semiconductor package as claimed in claim 15 , further comprising:
at least one conductive bump, disposed adjacent to the fourth pad.
17 . The semiconductor package as claimed in claim 10 , wherein the package carrier further includes:
an etching stop layer, disposed between the conductive vias and the top conductive pattern.
18 . The semiconductor package as claimed in claim 10 , wherein the conductive vias correspond to conductive posts.
19 . A semiconductor fabrication process, comprising:
forming a first conductive pattern including a plurality of first pads; forming a plurality of first via segments on at least some of the first pads; providing a dielectric layer having a plurality of first openings corresponding to the first via segments; applying the dielectric layer to the first conductive pattern and the first via segments; forming a plurality of second openings in the dielectric layer, such that the first via segments are exposed by the second openings; and forming a plurality of second via segments on the first via segments and at least partially within the second openings, such that a diameter of the first via segment is different than a diameter of the second via segment.
20 . The process as claimed in claim 19 , further comprising:
forming a second conductive pattern including a plurality of second pads, wherein the second via segments are connected to at least some of the second pads.Join the waitlist — get patent alerts
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