Substrate processing method, exposure apparatus, and method for producing device by immersing substrate in second liquid before immersion exposure through first liquid

Abstract

An immersion type lithographic apparatus includes at least one immersion space and an immersion system configured to at least partially fill the immersion space with a liquid. The apparatus is configured to rinse at least part of the immersion space with a rinsing liquid before the apparatus is used to project a patterned beam of radiation onto a substrate.

1 . A substrate processing method comprising:
 exposing a substrate by radiating an exposure light beam onto the substrate through a first liquid; and   cleaning the substrate with a second liquid after the substrate has made contact with the first liquid to miniaturize or remove a foreign matter adhered onto the substrate due to an eluted matter eluted from the substrate into the first liquid.   
     
     
         2 . The substrate processing method according to  claim 1 , wherein the substrate is cleaned with the second liquid after radiating the exposure light beam onto the substrate through the first liquid. 
     
     
         3 . The substrate processing method according to  claim 2 , wherein a circumferential edge portion of the substrate is cleaned with the second liquid. 
     
     
         4 . The substrate processing method according to  claim 2 , wherein:
 the substrate includes a base material and a photosensitive material with which a surface of the base material is coated; and   the base material is exposed at the circumferential edge portion.   
     
     
         5 . The substrate processing method according to  claim 1 , wherein a back surface of a base material is cleaned with the second liquid. 
     
     
         6 . The substrate processing method according to  claim 1 , wherein:
 the exposure light beam is radiated in a state in which the substrate is held by a substrate holder; and   the substrate is cleaned with the second liquid before unloading the substrate out of the substrate holder.   
     
     
         7 . The substrate processing method according to  claim 1 , wherein:
 the exposure light beam is radiated in a state in which the substrate is held by a substrate holder; and   the substrate is cleaned with the second liquid after unloading the substrate out of the substrate holder.   
     
     
         8 . The substrate processing method according to  claim 1 , wherein:
 the substrate includes a base material and a photosensitive material with which a surface of the base material is coated; and   the eluted matter includes an eluted matter eluted from the photosensitive material.   
     
     
         9 . The substrate processing method according to  claim 1 , wherein the first liquid is same as the second liquid. 
     
     
         10 . The substrate processing method according to  claim 1 , wherein the first liquid is different from the second liquid. 
     
     
         11 . The substrate processing method according to  claim 1 , wherein the eluted matter is a component of the photosensitive material. 
     
     
         12 . The substrate processing method according to  claim 1 , further comprising post-baking the exposed substrate, wherein cleaning is performed before post-baking the exposed substrate. 
     
     
         13 . A substrate processing method comprising:
 holding a substrate by a holder;   exposing the substrate by radiating an exposure light beam onto the substrate through a first liquid; and   cleaning the exposed substrate with a second liquid while holding the exposed substrate by the holder.   
     
     
         14 . A method for producing a device, comprising:
 the substrate processing method as defined in  claim 1 ;   developing the substrate; and   processing the developed substrate.   
     
     
         15 . An exposure apparatus which exposes a substrate by forming a liquid immersion area of a first liquid on the substrate and radiating an exposure light beam onto the substrate through the first liquid, the exposure apparatus comprising:
 a cleaning device which cleans the substrate with a second liquid, after the substrate has made contact with the first liquid, to miniaturize or remove a foreign matter adhered onto the substrate due to an eluted matter eluted from the substrate into the first liquid.   
     
     
         16 . The exposure apparatus according to  claim 15 , further comprising:
 a substrate holder which holds the substrate onto which the exposure light beam is radiated; and   a transport system which transports the substrate, wherein:   the cleaning device is provided at an intermediate position of a transport passage of the transport system.   
     
     
         17 . The exposure apparatus according to  claim 15 , further comprising:
 a substrate holder which holds the substrate onto which the exposure light beam is radiated; and   a nozzle member which has a supply port for supplying the first liquid onto the substrate held on the substrate holder,   wherein the cleaning device supplies the second liquid from the supply port of the nozzle member.   
     
     
         18 . The exposure apparatus according to  claim 17 , wherein the substrate is cleaned when the nozzle member and the substrate held by the substrate holder move relative to each other. 
     
     
         19 . The exposure apparatus according to  claim 18 , wherein the cleaning device cleans a circumferential edge portion of the substrate held by the substrate holder. 
     
     
         20 . The exposure apparatus according to  claim 15 , wherein the first liquid is same as the second liquid. 
     
     
         21 . The exposure apparatus according to  claim 15 , wherein the first liquid is different from the second liquid. 
     
     
         22 . The exposure apparatus according to  claim 15 , wherein the substrate includes a base material and a photosensitive material with which the base material is coated, and the eluted matter is a component of the photosensitive material. 
     
     
         23 . A method for producing a device, comprising:
 the substrate processing method as defined in  claim 13 ;   developing the substrate; and   processing the developed substrate.   
     
     
         24 . A method for producing a device, comprising using the exposure apparatus as defined in  claim 15 .