Inventor · disambiguated record
Takeyuki Mizutani
Also filed as: MIZUTANI TAKEYUKI
6 granted patents·8 pending applications·31 citations·filing 2004–2018
79Inventor score
Top patents by PatentIndex Score
14 records- 0188US8675174B2Exposure apparatus, exposure method, and method for producing deviceMIZUTANI TAKEYUKI·Filed 2005·Granted Mar 18, 2014·15 cites·44 claims
- 0283US8089615B2Substrate holding apparatus, exposure apparatus, exposing method, and device fabricating methodMIZUTANI TAKEYUKI·Filed 2008·Granted Jan 3, 2012·11 cites·32 claims
- 0374US8040489B2Substrate processing method, exposure apparatus, and method for producing device by immersing substrate in second liquid before immersion exposure through first liquidNIKON CORP·Filed 2005·Granted Oct 18, 2011·3 cites·28 claims
- 0469US8941808B2Immersion lithographic apparatus rinsing outer contour of substrate with immersion spaceNAKANO KATSUSHI·Filed 2008·Granted Jan 27, 2015·2 cites·20 claims
- 0557US9958785B2Exposure apparatus, exposure method, and method for producing deviceNIKON CORP·Filed 2013·Granted May 1, 2018·0 cites·9 claims
- 0656US2018239261A1Exposure apparatus, exposure method, and method for producing deviceNIKON CORP·Filed 2018·Application pending·0 cites
- 0750US2012008112A1Substrate processing method, exposure apparatus, and method for producing device by immersing substrate in second liquid before immersion exposure through first liquidNAKANO KATSUSHI·Filed 2011·Application pending·0 cites
- 0846US2009109413A1Maintenance method, exposure method and apparatus, and device manufacturing methodNIKON CORP·Filed 2008·Application pending·0 cites
- 0944US2008137047A1Exposure apparatus and device manufacturing methodNIKON CORP·Filed 2008·Application pending·0 cites
- 1042US8780326B2Exposure apparatus, exposure method, and device manufacturing methodKIUCHI TOHRU·Filed 2006·Granted Jul 15, 2014·0 cites·20 claims
- 1142US2007242248A1Substrate processing method, exposure apparatus, and method for producing deviceNIKON CORP·Filed 2007·Application pending·0 cites
- 1239US2008165330A1Liquid Removing Apparatus, Exposure Apparatus and Device Fabricating MethodNIKON CORP·Filed 2006·Application pending·0 cites
- 1336US2008318152A1Substrate for Exposure, Exposure Method and Device Manufacturing MethodMIZUTANI TAKEYUKI·Filed 2005·Application pending·0 cites
- 1434US2007206167A1Exposure Method and Apparatus, and Device Manufacturing MethodMIZUTANI TAKEYUKI·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →