Inventor · disambiguated record
Katsushi Nakano
Also filed as: NAKANO KATSUSHI
30 granted patents·24 pending applications·403 citations·filing 1995–2021
97Inventor score
Top patents by PatentIndex Score
54 records- 0199US7388649B2Exposure apparatus and method for producing deviceNIKON CORP·Filed 2005·Granted Jun 17, 2008·121 cites·50 claims
- 0294US8174668B2Exposure apparatus and method for producing deviceKOBAYASHI NAOYUKI·Filed 2007·Granted May 8, 2012·11 cites·78 claims
- 0393US8760617B2Exposure apparatus and method for producing deviceNIKON CORP·Filed 2013·Granted Jun 24, 2014·4 cites·95 claims
- 0488US9720332B2Information calculation method, exposure apparatus, exposure method, device manufacturing method, program, and recording mediumNIKON CORP·Filed 2014·Granted Aug 1, 2017·4 cites·63 claims
- 0587US8384877B2Exposure apparatus and method for producing deviceNIKON CORP·Filed 2007·Granted Feb 26, 2013·4 cites·30 claims
- 0687US8169592B2Exposure apparatus and method for producing deviceKOBAYASHI NAOYUKI·Filed 2008·Granted May 1, 2012·4 cites·83 claims
- 0787US8130363B2Exposure apparatus and method for producing deviceKOBAYASHI NAOYUKI·Filed 2008·Granted Mar 6, 2012·4 cites·36 claims
- 0887US8072576B2Exposure apparatus and method for producing deviceKOBAYASHI NAOYUKI·Filed 2007·Granted Dec 6, 2011·4 cites·38 claims
- 0986US10642159B2Information calculation method, exposure apparatus, exposure method, device manufacturing method, program, and recording mediumNIKON CORP·Filed 2017·Granted May 5, 2020·2 cites·34 claims
- 1083US10942457B2Information calculation method, exposure apparatus, exposure method, device manufacturing method, program, and recording mediumNIKON CORP·Filed 2020·Granted Mar 9, 2021·1 cites·4 claims
- 1183US5656769AScanning probe microscopeNIKON CORP·Filed 1995·Granted Aug 12, 1997·71 cites·39 claims
- 1281US9746781B2Exposure apparatus and method for producing deviceNIKON CORP·Filed 2014·Granted Aug 29, 2017·2 cites·54 claims
- 1377US8053937B2Linear motor, stage apparatus and exposure apparatusNIKON CORP·Filed 2006·Granted Nov 8, 2011·8 cites·13 claims
- 1477US6635891B1Hollow-beam apertures for charged-particle-beam microlithography apparatus and methods for making and using sameNIKON CORP·Filed 2000·Granted Oct 21, 2003·13 cites·27 claims
- 1574US11360394B2Information calculation method, exposure apparatus, exposure method, device manufacturing method, program, and recording mediumNIKON CORP·Filed 2021·Granted Jun 14, 2022·0 cites·7 claims
- 1674US8040489B2Substrate processing method, exposure apparatus, and method for producing device by immersing substrate in second liquid before immersion exposure through first liquidNIKON CORP·Filed 2005·Granted Oct 18, 2011·3 cites·28 claims
- 1771US6802986B2Low-aberration deflectors for use in charged-particle-beam optical systems, and methods for fabricating such deflectorsNIKON CORP·Filed 2002·Granted Oct 12, 2004·7 cites·9 claims
- 1869US8941808B2Immersion lithographic apparatus rinsing outer contour of substrate with immersion spaceNAKANO KATSUSHI·Filed 2008·Granted Jan 27, 2015·2 cites·20 claims
- 1966US6566663B1Charged-particle-beam optical components and systems including ferrite exhibiting reduced image displacement from temperature fluctuationsNIKON CORP·Filed 2001·Granted May 20, 2003·6 cites·22 claims
- 2065US8111374B2Analysis method, exposure method, and device manufacturing methodNAKANO KATSUSHI·Filed 2006·Granted Feb 7, 2012·2 cites·16 claims
- 2165US6223591B1Probe needle arrangement and movement method for use in an atomic force microscopeNIKON CORP·Filed 1998·Granted May 1, 2001·28 cites·16 claims
- 2264US8514366B2Exposure method and apparatus, maintenance method and device manufacturing methodNAKANO KATSUSHI·Filed 2008·Granted Aug 20, 2013·1 cites·59 claims
- 2364US6018991AScanning probe microscope having cantilever attached to driving memberNIKON CORP·Filed 1997·Granted Feb 1, 2000·25 cites·13 claims
- 2461US2008231825A1Exposure Apparatus and method for producing deviceNIKON CORP·Filed 2008·Application pending·0 cites
- 2560US8253924B2Exposure method, exposure apparatus and device manufacturing methodUEHARA YUSAKU·Filed 2006·Granted Aug 28, 2012·2 cites·43 claims
- 2660US2018292759A1Substrate holding device, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2018·Application pending·0 cites
- 2758US2017329239A1Exposure apparatus and method for producing deviceNIKON CORP·Filed 2017·Application pending·0 cites
- 2858US2018364597A1Exposure apparatus, exposure method, exposure apparatus maintenance method, exposure apparatus adjustment method and device manufacturing methodNIKON CORP·Filed 2018·Application pending·0 cites
- 2957US10061214B2Exposure apparatus, exposure method, exposure apparatus maintenance method, exposure apparatus adjustment method and device manufacturing methodSAGAWA NATSUKO·Filed 2010·Granted Aug 28, 2018·1 cites·35 claims
- 3056US5767400AHydraulic test system mounted with borehole television set for simultaneous observation in front and lateral directionsDORYOKURO KAKUNENRYO·Filed 1996·Granted Jun 16, 1998·38 cites·7 claims
- 3155US2013301019A1Exposure method and apparatus, maintenance method and device manufacturing methodNIKON CORP·Filed 2013·Application pending·0 cites
- 3255US2016231653A1Substrate holding device, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2016·Application pending·0 cites
- 3354US2013278908A1Exposure apparatus and exposure method, maintenance method, and device manufacturing methodNIKON CORP·Filed 2013·Application pending·0 cites
- 3451US2009262316A1Exposure apparatus and method for producing deviceNIKON CORP·Filed 2006·Application pending·0 cites
- 3551US2007085989A1Exposure apparatus and exposure method, maintenance method, and device manufacturing methodNIKON CORP·Filed 2006·Application pending·0 cites
- 3650US2012008112A1Substrate processing method, exposure apparatus, and method for producing device by immersing substrate in second liquid before immersion exposure through first liquidNAKANO KATSUSHI·Filed 2011·Application pending·0 cites
- 3749US2010045949A1Exposure apparatus, maintaining method and device fabricating methodNIKON CORP·Filed 2009·Application pending·0 cites
- 3849US2010283979A1Exposure apparatus, exposing method, and device fabricating methodNIKON CORP·Filed 2009·Application pending·0 cites
- 3948US2009061331A1Exposure method and apparatus, maintenance method, and device manufacturing methodNIKON CORP·Filed 2008·Application pending·0 cites
- 4046US8305553B2Exposure apparatus and device manufacturing methodNAKANO KATSUSHI·Filed 2005·Granted Nov 6, 2012·0 cites·58 claims
- 4146US2005040137A1Low-aberration deflectors for use in charged-particle-beam optical systems, and methods for fabricating such deflectorsNIKON CORP·Filed 2004·Application pending·0 cites
- 4246US2008204687A1Exposing method, exposure apparatus, device fabricating method, and substrate for immersion exposureNIKON CORP·Filed 2008·Application pending·0 cites
- 4344US8294873B2Exposure method, device manufacturing method, and substrateNAKANO KATSUSHI·Filed 2005·Granted Oct 23, 2012·0 cites·23 claims
- 4443US5896926APacker type groundwater sampling system and water sampling methodDORYOKURO KAKUNENRYO·Filed 1996·Granted Apr 27, 1999·25 cites·8 claims
- 4543US2009033890A1Exposure apparatus, substrate processing method, and device producing methodNIKON CORP·Filed 2006·Application pending·0 cites
- 4642US2009226846A1Exposure Apparatus, Exposure Method, and Device Manufacturing MethodNIKON CORP·Filed 2006·Application pending·0 cites
- 4742US2007242248A1Substrate processing method, exposure apparatus, and method for producing deviceNIKON CORP·Filed 2007·Application pending·0 cites
- 4841US2007164234A1Exposure apparatus and device manufacturing methodNIKON CORP·Filed 2005·Application pending·0 cites
- 4939US5784401ATemperature distribution measurement methods and apparatusNIKON CORP·Filed 1996·Granted Jul 21, 1998·10 cites·16 claims
- 5038US2003067734A1Methods for electrostatically chucking an object to an electrostatic chuck that reduce uncorrectable placement error of the objectNIKON CORP·Filed 2002·Application pending·0 cites
Showing the top 50 of 54 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →