Substrate holding device, exposure apparatus, and device manufacturing method

Abstract

To provide a substrate holding apparatus which can prevent a liquid from entering into a rear surface side of a substrate. A substrate holding apparatus is provided with a base material, a first holding portion formed on the base material for holding the substrate, and a second holding portion formed on the base material for holding a plate member by surrounding the circumference of a processing substrate held by the first holding portion. The second holding portion holds the plate member so as to form a second space on the side of the rear surface of the plate member. On the rear surface of the plate member, an absorbing member is arranged for absorbing the liquid entered from a gap between the substrate held by the first holding portion and the plate member held by the second holding portion.

What is claimed is: 
     
         1 . An exposure apparatus that exposes a substrate via a projection optical system and via a liquid immersion region, which is formed with a liquid supplied below the projection optical system, the exposure apparatus comprising:
 a stage device that is capable of moving relative to the liquid immersion region, wherein the stage device comprises:
 a holding portion that holds the substrate; 
 a flat portion that is provided so that the substrate held by the holding portion is surrounded by the flat portion; 
 a porous member; and 
 a recovery portion that recovers the liquid via the porous member, the liquid penetrated into a gap, the gap being formed between the flat portion and the substrate held by the holding portion and being moved below the liquid immersion region.