Exposure Apparatus and method for producing device

Abstract

An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a flow passage in which exposure liquid flows, the flow passage being in fluidic communication with the space. The apparatus also includes a cleaning system which cleans the member.

1 . An exposure apparatus comprising:
 an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate;   a member having a flow passage in which exposure liquid flows, the flow passage being in fluidic communication with the space; and   a cleaning system which cleans the member.   
   
   
       2 . The exposure apparatus according to  claim 1 , wherein the cleaning system cleans the member by removing the exposure liquid remaining on the member. 
   
   
       3 . The exposure apparatus according to  claim 2 , wherein the cleaning system sucks the exposure liquid remaining on the member. 
   
   
       4 . The exposure apparatus according to  claim 2 , wherein the cleaning system blows off the exposure liquid remaining on the member. 
   
   
       5 . The exposure apparatus according to  claim 1 , wherein the cleaning system includes a suction port. 
   
   
       6 . The exposure apparatus according to  claim 1 , wherein the cleaning system supplies a gas to a surface of the member.