Pad conditioner head for conditioning a polishing pad

Abstract

The pad conditioner head for conditioning a polishing pad comprises a bearing seat, a spindle, a protective cover, an annular pressure plate, a self-adaptive platen, a diamond disk and a flexible ring. A flange is mounted on the lower end of the spindle. A press ring is mounted onto a lower surface of the flange. The flexible ring has an upper edge sandwiched between the flange and the press ring and a lower edge sandwiched between the protective cover and the annular pressure plate. The flexible ring, the flange, the annular pressure plate and the self-adaptive platen define a sealed chamber (M). The protective cover, the annular pressure plate, the self-adaptive platen and the diamond disk are rotatable along with the spindle through the flexible ring and movable in an up and down direction relative to the spindle via a deformation of the flexible ring.

1 . A pad conditioner head for conditioning a polishing pad, comprising:
 a bearing seat having an upper end on which a bearing end cap is mounted;   a spindle rotatably mounted in the bearing seat via a bearing, having an axial channel penetrating therethrough along an axial direction thereof, and having an upper end extended from the bearing end cap and a lower end extended from a lower end of the bearing seat, in which a seal is disposed between the lower end of the bearing seat and the spindle, a synchronous belt pulley is mounted on the upper end of the spindle, a rotating joint is mounted in an upper end of the axial channel, a flange is mounted on the lower end of the spindle, and a press ring is mounted onto a lower surface of the flange;   a protective cover disposed surrounding the flange;   an annular pressure plate connected with the protective cover;   a self-adaptive platen having a lower end connected with the annular pressure plate and an upper end movably fitted in the axial channel, in which a connecting channel is formed in the self-adaptive platen;   a diamond disk mounted onto a lower surface of the annular pressure plate; and   a flexible ring having an upper edge sandwiched between the flange and the press ring and a lower edge sandwiched between the protective cover and the annular pressure plate, in which the flexible ring, the flange, the annular pressure plate and the self-adaptive platen define a sealed chamber (M), the protective cover, the annular pressure plate, the self-adaptive platen and the diamond disk are rotatable along with the spindle through the flexible ring and movable in an up and down direction relative to the spindle through a deformation of the flexible ring, and the sealed chamber (M) is communicated with the axial channel through the connecting channel.   
     
     
         2 . The pad conditioner head for conditioning a polishing pad according to  claim 1 , wherein a first seal ring is disposed between the annular pressure plate and the self-adaptive platen, a second seal ring is disposed between the protective cover and the annular pressure plate, and a third seal ring is disposed between the spindle and the flange. 
     
     
         3 . The pad conditioner head for conditioning a polishing pad according to  claim 1 , wherein the seal between the lower end of the bearing seat and the spindle is a labyrinth seal. 
     
     
         4 . The pad conditioner head for conditioning a polishing pad according to  claim 1 , wherein a first air vent is formed in the bearing seat, a second air vent communicated with the first air vent is formed in the bearing end cap, a quick change coupler is mounted in an upper end of the second air vent, and a lower end of the first air vent is open to a space defined between the spindle and an inner bottom surface of the bearing seat such that the seal between the lower end of the bearing seat and the spindle is an air seal. 
     
     
         5 . The pad conditioner head for conditioning a polishing pad according to  claim 1 , wherein the axial channel comprises an upper segment and a lower segment, in which a radial dimension of the lower segment is larger than that of the upper segment. 
     
     
         6 . The pad conditioner head for conditioning a polishing pad according to  claim 5 , wherein the axial channel has a circular cross section. 
     
     
         7 . The pad conditioner head for conditioning a polishing pad according to  claim 1 , wherein the upper edge and the lower edge are in the form of a flat plate and are connected with each other through a flexural transition portion. 
     
     
         8 . The pad conditioner head for conditioning a polishing pad according to  claim 1 , wherein the self-adaptive platen comprises a lower platen body and an upper shaft, in which a groove is formed in a lower surface of the lower platen body, a lower end of the upper shaft is connected with an upper surface of the lower platen body and fitted into the axial channel, and the connecting channel is formed in the upper shaft. 
     
     
         9 . The pad conditioner head for conditioning a polishing pad according to  claim 8 , wherein the connecting channel comprises a vertical channel portion and a lateral channel portion communicated to each other, the vertical channel portion is extended downwardly by a predetermined length from an upper end of the upper shaft, and the lateral channel portion is extended along a circumferential direction of the upper shaft so as to communicate the vertical channel portion and the sealed chamber (M). 
     
     
         10 . The pad conditioner head for conditioning a polishing pad according to  claim 8 , wherein an upper wall of the groove has a sheet structure with a thickness of 0.1-0.5 mm.