US2012118383A1PendingUtilityA1
Autonomous Integrated Circuit
Est. expiryNov 15, 2030(~4.3 yrs left)· nominal 20-yr term from priority
Inventors:Stephen W. BedellNorma E. Sosa CortesWilfried E. HaenschSteven J. KoesterDevendra K. SadanaKatherine L. SaengerGhavam G. ShahidiDavood Shahrjerdi
H10F 77/935H10F 71/121H10F 71/103H10F 10/172H10F 10/166H10F 10/19H10F 10/17H10F 19/50Y02E10/548Y02E10/547Y02P70/50
60
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Claims
Abstract
An autonomous integrated circuit (IC) includes a solar cell formed on a bottom substrate of a silicon-on-insulator (SOI) substrate as a handle substrate; an insulating layer of the SOI substrate located on top of the solar cell; and a device layer formed on a top semiconductor layer of the SOI substrate located on top of the insulating layer, wherein a top contact of the device layer is electrically connected to a bottom contact of the solar cell such that the solar cell is enabled to power the device layer.
Claims
exact text as granted — not AI-modified1 . A method for forming an autonomous integrated circuit (IC) on a silicon-on-insulator (SOI) substrate, the SOI substrate comprising a top semiconductor layer on top of an insulating layer on top of a bottom substrate, the method comprising:
forming a solar cell on the bottom substrate of the SOI substrate as a handle substrate; forming a device layer, the device layer comprising a top contact, on the top semiconductor layer; and electrically connecting a bottom contact of the solar cell to the top contact of the device layer so as to enable the solar cell to power the device layer.
2 . The method of claim 1 , wherein the top semiconductor layer and bottom substrate comprise silicon, and wherein the insulating layer comprises silicon oxide.
3 . The method of claim 1 , further comprising forming a via through the insulating layer from the device layer to the solar cell.
4 . The method of claim 1 , further comprising forming a protective layer on the solar cell before forming the device layer.
5 . The method of claim 4 , wherein the protective layer comprises one of transparent conducting oxide and a nitride.
6 . The method of claim 4 , further comprising forming the bottom contact of the solar cell on the protective layer.
7 . The method of claim 4 , further comprising recessing the protective layer and forming the bottom contact of the solar cell on the solar cell.
8 . The method of claim 4 , further comprising removing the protective layer after forming the device layer and performing additional solar cell processing before forming a second protective layer on the solar cell, forming a bottom contact to the solar cell, and electrically connecting the bottom contact of the solar cell to the top contact of the device layer.
9 . The method of claim 1 , wherein the solar cell comprises one of a single junction solar cell, a single heterojunction solar cell, a multijunction solar cell, an interdigitated solar cell, and a tandem solar cell.
10 . The method of claim 1 , wherein the device layer comprises a complementary metal-oxide-semiconductor (CMOS) device layer.
11 . The method of claim 1 , wherein at least a portion of forming the solar cell using the bottom substrate of the SOI substrate as a handle substrate is performed before formation of the SOI substrate.
12 . The method of claim 1 , further comprising gluing the device layer to the solar cell using a dielectric glue, wherein the dielectric glue comprises the insulating layer, to form the SOI substrate.
13 . An autonomous integrated circuit (IC), comprising;
a solar cell formed on a bottom substrate of a silicon-on-insulator (SOI) substrate as a handle substrate; an insulating layer of the SOI substrate located on top of the solar cell; and a device layer formed on a top semiconductor layer of the SOI substrate located on top of the insulating layer, wherein a top contact of the device layer is electrically connected to a bottom contact of the solar cell such that the solar cell is enabled to power the device layer.
14 . The autonomous IC of claim 13 , wherein the top semiconductor layer and bottom substrate comprise silicon, and wherein the insulating layer comprises silicon oxide.
15 . The autonomous IC of claim 13 , further comprising a via located in the insulating layer connecting the device layer to the solar cell.
16 . The autonomous IC of claim 13 , further comprising a protective layer located under the solar cell.
17 . The autonomous IC of claim 16 , wherein the protective layer comprises one of transparent conducting oxide and a nitride.
18 . The autonomous IC of claim 16 , wherein the bottom contact of the solar cell is formed on the protective layer.
19 . The autonomous IC of claim 16 , wherein the bottom contact of the solar cell is formed in a recess in the protective layer and on the solar cell.
20 . The autonomous IC of claim 13 , wherein the solar cell comprises one of a single junction solar cell, a single heterojunction solar cell, an interdigitated solar cell, and a tandem solar cell.Cited by (0)
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