Method and system for forming patterns using charged particle beam lithography with variable pattern dosage

Abstract

A method and system for fracturing or mask data preparation or optical proximity correction or proximity effect correction or mask process correction is disclosed in which a set of shaped beam shots is determined that is capable of forming a pattern on a surface, where the set of shots provides different dosages to different parts of the pattern, and where the dose margin from the set of shots is calculated. A method for forming patterns on a surface is also disclosed.

1 . A method for fracturing or mask data preparation or proximity effect correction or optical proximity correction or mask process correction comprising the step of determining a plurality of shaped beam charged particle beam shots for an exposure pass, wherein the plurality of shaped beam shots is capable of forming a pattern on a surface, wherein the plurality of shaped beam shots provides different dosages to different parts of the pattern, and wherein the step of determining comprises calculating a dose margin from the plurality of shaped beam shots. 
     
     
         2 . The method of  claim 1  wherein the dose margin is optimized. 
     
     
         3 . The method of  claim 2  wherein the plurality of shaped beam shots produces a higher dosage peak near a perimeter of the pattern on the surface than in an interior area of the pattern on the surface. 
     
     
         4 . The method of  claim 1  wherein the calculating comprises charged particle beam simulation. 
     
     
         5 . The method of  claim 4  wherein the charged particle beam simulation includes at least one of a group consisting of forward scattering, backward scattering, resist diffusion, Coulomb effect, etching, fogging, loading and resist charging. 
     
     
         6 . The method of  claim 1 , further comprising the step of revising the plurality of shaped beam shots and recalculating the dose margin if the dose margin is lower than a pre-determined target dose margin. 
     
     
         7 . The method of  claim 1  wherein each shot in the plurality of shaped beam shots comprises an assigned dosage, and wherein the assigned dosages of at least two shots in the plurality of shaped beam shots differ from each other before dosage correction for long-range effects. 
     
     
         8 . The method of  claim 1  wherein each shot in the plurality of shaped beam shots is a variable shaped beam (VSB) shot. 
     
     
         9 . The method of  claim 1  wherein the surface comprises a reticle to be used in an optical lithographic process to manufacture a substrate. 
     
     
         10 . A method for manufacturing a surface using charged particle beam lithography, the method comprising the steps of:
 determining a plurality of shaped beam shots for a plurality of exposure passes; and   forming a pattern on the surface with the plurality of shots,   wherein the plurality of shaped beam shots provides different dosages to different parts of the pattern, and wherein the step of determining comprises calculating a dose margin from the plurality of shaped beam shots.   
     
     
         11 . The method of  claim 10  wherein the dose margin is optimized. 
     
     
         12 . The method of  claim 11  wherein the plurality of shaped beam shots produces a higher dosage peak near a perimeter of the pattern on the surface than in an interior area of the pattern on the surface. 
     
     
         13 . The method of  claim 10  wherein the calculating comprises charged particle beam simulation. 
     
     
         14 . The method of  claim 13  wherein the charged particle beam simulation includes at least one of a group consisting of forward scattering, backward scattering, resist diffusion, Coulomb effect, etching, fogging, loading and resist charging. 
     
     
         15 . The method of  claim 10 , further comprising the step of revising the plurality of shaped beam shots and recalculating the dose margin if the dose margin is lower than a pre-determined target dose margin. 
     
     
         16 . The method of  claim 10  wherein each shot in the plurality of shaped beam shots comprises an assigned dosage, and wherein the assigned dosages of at least two shots in the plurality of shaped beam shots differ before dosage correction for long-range effects. 
     
     
         17 . The method of  claim 16 , further comprising the step performing dose correction for long-range effects, wherein the assigned dosages of at least two shots in the plurality of shaped beam shots differ from each other before the dose correction. 
     
     
         18 . The method of  claim 10  wherein the surface comprises a reticle to be used in an optical lithographic process to manufacture a substrate. 
     
     
         19 . A method for manufacturing an integrated circuit using an optical lithographic process, the optical lithographic process using a reticle manufactured with charged particle beam lithography, the method comprising the steps of:
 determining a plurality of shaped beam shots for an exposure pass; and   forming a pattern on the reticle with the plurality of shaped beam shots,   wherein the plurality of shaped beam shots provides different dosages to different parts of the pattern, and wherein the step of determining comprises calculating a dose margin from the plurality of shaped beam shots.   
     
     
         20 . The method of  claim 19  wherein the calculating comprises charged particle beam simulation. 
     
     
         21 . The method of  claim 20  wherein the charged particle beam simulation includes at least one of a group consisting of forward scattering, backward scattering, resist diffusion, Coulomb effect, etching, fogging, loading and resist charging. 
     
     
         22 . A system for fracturing or mask data preparation or proximity effect correction or optical proximity correction or mask process correction comprising a device capable of determining a plurality of shaped beam charged particle beam shots for an exposure pass, wherein the plurality of shaped beam shots is capable of forming a pattern on a surface, wherein the plurality of shaped beam shots provides different dosages to different parts of the pattern, and wherein the device capable of determining calculates a dose margin from the plurality of shaped beam shots. 
     
     
         23 . The system of  claim 22  wherein the dose margin is optimized. 
     
     
         24 . The system of  claim 23  wherein the plurality of shaped beam shots produces a higher dosage peak near a perimeter of the pattern on the surface than in an interior area of the pattern on the surface. 
     
     
         25 . The system of  claim 22  wherein each shot in the plurality of shaped beam shots is a variable shaped beam (VSB) shot.