Inventor · disambiguated record
Harold Robert Zable
Also filed as: ZABLE HAROLD ROBERT · ZABLE HAROLD ROBERT FELDMAN
28 granted patents·7 pending applications·252 citations·filing 2003–2023
96Inventor score
Top patents by PatentIndex Score
35 records- 0198US9372391B2Method and system for forming patterns using charged particle beam lithography with variable pattern dosageD2S INC·Filed 2015·Granted Jun 21, 2016·10 cites·25 claims
- 0297US7663621B1Cylindrical wrapping using shader hardwareNVIDIA CORP·Filed 2006·Granted Feb 16, 2010·87 cites·18 claims
- 0396US11062878B2Method and system for determining a charged particle beam exposure for a local pattern densityD2S INC·Filed 2020·Granted Jul 13, 2021·5 cites·15 claims
- 0496US8221939B2Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes having different dosagesZABLE HAROLD ROBERT·Filed 2009·Granted Jul 17, 2012·21 cites·25 claims
- 0595US10444629B2Bias correction for lithographyD2S INC·Filed 2017·Granted Oct 15, 2019·11 cites·12 claims
- 0695US8137871B2Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes which expose different surface areaZABLE HAROLD ROBERT·Filed 2009·Granted Mar 20, 2012·36 cites·26 claims
- 0792US9625809B2Method and system for forming patterns using charged particle beam lithography with variable pattern dosageD2S INC·Filed 2016·Granted Apr 18, 2017·5 cites·18 claims
- 0892US8062813B2Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithographyZABLE HAROLD ROBERT·Filed 2010·Granted Nov 22, 2011·27 cites·29 claims
- 0991US11756765B2Method and system for determining a charged particle beam exposure for a local pattern densityD2S INC·Filed 2021·Granted Sep 12, 2023·2 cites·16 claims
- 1090US10748744B1Method and system for determining a charged particle beam exposure for a local pattern densityD2S INC·Filed 2019·Granted Aug 18, 2020·5 cites·14 claims
- 1190US8329365B2Method for design and manufacture of diagonal patterns with variable shaped beam lithographyFUJIMURA AKIRA·Filed 2011·Granted Dec 11, 2012·8 cites·25 claims
- 1287US8017286B2Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithographyD2S INC·Filed 2009·Granted Sep 13, 2011·12 cites·11 claims
- 1386US7985514B2Method for fracturing a pattern for writing with a shaped charged particle beam writing system using dragged shotsD2S INC·Filed 2009·Granted Jul 26, 2011·12 cites·25 claims
- 1484US10460071B2Shaped beam lithography including temperature effectsD2S INC·Filed 2016·Granted Oct 29, 2019·4 cites·17 claims
- 1582US8492055B2Method and system for fracturing a pattern using lithography with multiple exposure passesZABLE HAROLD ROBERT·Filed 2012·Granted Jul 23, 2013·2 cites·25 claims
- 1680US12243712B2Method and system for determining a charged particle beam exposure for a local pattern densityD2S INC·Filed 2023·Granted Mar 4, 2025·0 cites·17 claims
- 1779US11886166B2Method and system of reducing charged particle beam write timeD2S INC·Filed 2023·Granted Jan 30, 2024·0 cites·20 claims
- 1874US8221940B2Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passesZABLE HAROLD ROBERT·Filed 2009·Granted Jul 17, 2012·4 cites·24 claims
- 1973US11126085B2Bias correction for lithographyD2S INC·Filed 2020·Granted Sep 21, 2021·0 cites·18 claims
- 2072US2023124768A1Method and system for determining a charged particle beam exposure for a local pattern densityD2S INC·Filed 2022·Application pending·0 cites
- 2171US11592802B2Method and system of reducing charged particle beam write timeD2S INC·Filed 2020·Granted Feb 28, 2023·0 cites·18 claims
- 2269US11604451B2Method and system of reducing charged particle beam write timeD2S INC·Filed 2021·Granted Mar 14, 2023·0 cites·19 claims
- 2369US10725383B2Bias correction for lithographyD2S INC·Filed 2019·Granted Jul 28, 2020·0 cites·5 claims
- 2466US2018374675A1Method and system for forming patterns using charged particle beam lithography with variable pattern dosageD2S INC·Filed 2018·Application pending·0 cites
- 2563US8771906B2Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes which expose different surface areaD2S INC·Filed 2013·Granted Jul 8, 2014·0 cites·32 claims
- 2662US8883375B2Method and system for forming a pattern using charged particle beam lithography with multiple exposure passesD2S INC·Filed 2013·Granted Nov 11, 2014·0 cites·27 claims
- 2761US10884395B2Method and system of reducing charged particle beam write timeD2S INC·Filed 2018·Granted Jan 5, 2021·0 cites·20 claims
- 2861US8592108B2Method for design and manufacture of patterns with variable shaped beam lithographyD2S INC·Filed 2012·Granted Nov 26, 2013·0 cites·27 claims
- 2961US2017213698A1Method and System for Forming Patterns Using Charged Particle Beam Lithography with Variable Pattern DosageD2S INC·Filed 2017·Application pending·0 cites
- 3060US8895212B2Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes with different dosagesD2S INC·Filed 2013·Granted Nov 25, 2014·0 cites·29 claims
- 3157US2012219886A1Method and system for forming patterns using charged particle beam lithography with variable pattern dosageFUJIMURA AKIRA·Filed 2011·Application pending·0 cites
- 3249US2011089345A1Method and system for manufacturing a surface using charged particle beam lithographyD2S INC·Filed 2010·Application pending·0 cites
- 3346US7289126B1Gamma-corrected texel storage in a graphics memoryNVIDIA CORP·Filed 2003·Granted Oct 30, 2007·1 cites·32 claims
- 3442US2012217421A1Method and system for forming patterns using charged particle beam lithography with overlapping shotsFUJIMURA AKIRA·Filed 2011·Application pending·0 cites
- 3541US2012128228A1Method for Matching of PatternsFUJIMURA AKIRA·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →