Inventor · disambiguated record
Akira Fujimura
Also filed as: FUJIMURA AKIRA
166 granted patents·55 pending applications·1,942 citations·filing 1974–2025
99Inventor score
Files withD2S INC121FUJIMURA AKIRA26HONDA MOTOR CO LTD23CADENCE DESIGN SYSTEMS INC18NTN TOYO BEARING CO LTD10
Top patents by PatentIndex Score
221 records- 0198US9372391B2Method and system for forming patterns using charged particle beam lithography with variable pattern dosageD2S INC·Filed 2015·Granted Jun 21, 2016·10 cites·25 claims
- 0298US8828628B2Method and system for design of a reticle to be manufactured using variable shaped beam lithographyD2S INC·Filed 2013·Granted Sep 9, 2014·21 cites·21 claims
- 0398US8304148B2Method and system for design of a reticle to be manufactured using variable shaped beam lithographyFUJIMURA AKIRA·Filed 2011·Granted Nov 6, 2012·15 cites·25 claims
- 0498US7901850B2Method and system for design of a reticle to be manufactured using variable shaped beam lithographyD2S INC·Filed 2009·Granted Mar 8, 2011·76 cites·25 claims
- 0598US7754401B2Method for manufacturing a surface and integrated circuit using variable shaped beam lithographyD2S INC·Filed 2009·Granted Jul 13, 2010·76 cites·25 claims
- 0697US12019973B2Method for reticle enhancement technology of a design pattern to be manufactured on a substrateD2S INC·Filed 2023·Granted Jun 25, 2024·3 cites·17 claims
- 0797US8501374B2Method for fracturing and forming a pattern using shaped beam charged particle beam lithographyFUJIMURA AKIRA·Filed 2012·Granted Aug 6, 2013·24 cites·35 claims
- 0897US8202672B2Method and system for design of a reticle to be manufactured using variable shaped beam lithographyFUJIMURA AKIRA·Filed 2011·Granted Jun 19, 2012·15 cites·25 claims
- 0997US4388994AFlat-article sorting apparatusNIPPON ELECTRIC CO·Filed 1980·Granted Jun 21, 1983·297 cites·8 claims
- 1096US11062878B2Method and system for determining a charged particle beam exposure for a local pattern densityD2S INC·Filed 2020·Granted Jul 13, 2021·5 cites·15 claims
- 1196US8473875B2Method and system for forming high accuracy patterns using charged particle beam lithographyFUJIMURA AKIRA·Filed 2011·Granted Jun 25, 2013·39 cites·16 claims
- 1296US8354207B2Method, device, and system for forming circular patterns on a surfaceD2S INC·Filed 2011·Granted Jan 15, 2013·21 cites·22 claims
- 1396US8221939B2Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes having different dosagesZABLE HAROLD ROBERT·Filed 2009·Granted Jul 17, 2012·21 cites·25 claims
- 1496US8017289B2Method for manufacturing a surface and integrated circuit using variable shaped beam lithographyD2S INC·Filed 2011·Granted Sep 13, 2011·16 cites·25 claims
- 1596US7759026B2Method and system for manufacturing a reticle using character projection particle beam lithographyD2S INC·Filed 2008·Granted Jul 20, 2010·25 cites·16 claims
- 1696US7759027B2Method and system for design of a reticle to be manufactured using character projection lithographyD2S INC·Filed 2008·Granted Jul 20, 2010·48 cites·20 claims
- 1795US11783110B2Method for reticle enhancement technology of a design pattern to be manufactured on a substrateD2S INC·Filed 2021·Granted Oct 10, 2023·3 cites·5 claims
- 1895US8900778B2Method for forming circular patterns on a surfaceD2S INC·Filed 2013·Granted Dec 2, 2014·18 cites·12 claims
- 1995US8719739B2Method and system for forming patterns using charged particle beam lithographyD2S INC·Filed 2013·Granted May 6, 2014·22 cites·33 claims
- 2095US8137871B2Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes which expose different surface areaZABLE HAROLD ROBERT·Filed 2009·Granted Mar 20, 2012·36 cites·26 claims
- 2195US8039176B2Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithographyD2S INC·Filed 2009·Granted Oct 18, 2011·33 cites·25 claims
- 2294US9038003B2Method and system for critical dimension uniformity using charged particle beam lithographyD2S INC·Filed 2013·Granted May 19, 2015·12 cites·29 claims
- 2394US8202673B2Method for manufacturing a surface and integrated circuit using variable shaped beam lithographyFUJIMURA AKIRA·Filed 2011·Granted Jun 19, 2012·15 cites·24 claims
- 2494US7824828B2Method and system for improvement of dose correction for particle beam writersCADENCE DESIGN SYSTEMS INC·Filed 2007·Granted Nov 2, 2010·32 cites·47 claims
- 2594US7799489B2Method for design and manufacture of a reticle using variable shaped beam lithographyD2S INC·Filed 2009·Granted Sep 21, 2010·33 cites·25 claims
- 2694US7745078B2Method and system for manufacturing a reticle using character projection lithographyD2S INC·Filed 2008·Granted Jun 29, 2010·17 cites·9 claims
- 2793US9715169B2Method and system for forming a pattern on a reticle using charged particle beam lithographyD2S INC·Filed 2016·Granted Jul 25, 2017·7 cites·6 claims
- 2893US9343267B2Method and system for dimensional uniformity using charged particle beam lithographyD2S INC·Filed 2014·Granted May 17, 2016·12 cites·13 claims
- 2993US9057956B2Method and system for design of enhanced edge slope patterns for charged particle beam lithographyFUJIMURA AKIRA·Filed 2011·Granted Jun 16, 2015·9 cites·24 claims
- 3093US7579606B2Method and system for logic design for cell projection particle beam lithographyD2S INC·Filed 2006·Granted Aug 25, 2009·19 cites·61 claims
- 3192US9625809B2Method and system for forming patterns using charged particle beam lithography with variable pattern dosageD2S INC·Filed 2016·Granted Apr 18, 2017·5 cites·18 claims
- 3292US8916315B2Method for fracturing and forming a pattern using shaped beam charged particle beam lithographyD2S INC·Filed 2013·Granted Dec 23, 2014·5 cites·25 claims
- 3392US8062813B2Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithographyZABLE HAROLD ROBERT·Filed 2010·Granted Nov 22, 2011·27 cites·29 claims
- 3492US8020135B2Manufacturing aware design and design aware manufacturing of an integrated circuitCADENCE DESIGN SYSTEMS INC·Filed 2008·Granted Sep 13, 2011·11 cites·34 claims
- 3591US11756765B2Method and system for determining a charged particle beam exposure for a local pattern densityD2S INC·Filed 2021·Granted Sep 12, 2023·2 cites·16 claims
- 3691US9043734B2Method and system for forming high accuracy patterns using charged particle beam lithographyD2S INC·Filed 2013·Granted May 26, 2015·13 cites·8 claims
- 3791US8302061B2Aware manufacturing of an integrated circuitFUJIMURA AKIRA·Filed 2011·Granted Oct 30, 2012·5 cites·19 claims
- 3891US7712064B2Manufacturing aware design of integrated circuit layoutsCADENCE DESIGN SYSTEMS INC·Filed 2006·Granted May 4, 2010·21 cites·36 claims
- 3991US7395516B2Manufacturing aware design and design aware manufacturingCADENCE DESIGN SYSTEMS INC·Filed 2005·Granted Jul 1, 2008·10 cites·14 claims
- 4091US2025371241A1Computing parasitic values for semiconductor designsD2S INC·Filed 2025·Application pending·0 cites
- 4190US10748744B1Method and system for determining a charged particle beam exposure for a local pattern densityD2S INC·Filed 2019·Granted Aug 18, 2020·5 cites·14 claims
- 4290US9274412B2Method and system for design of a reticle to be manufactured using variable shaped beam lithographyD2S INC·Filed 2014·Granted Mar 1, 2016·3 cites·21 claims
- 4390US8329365B2Method for design and manufacture of diagonal patterns with variable shaped beam lithographyFUJIMURA AKIRA·Filed 2011·Granted Dec 11, 2012·8 cites·25 claims
- 4490US7883272B2Wheel support bearing assemblyNTN TOYO BEARING CO LTD·Filed 2005·Granted Feb 8, 2011·13 cites·6 claims
- 4590US5619973AControl system for internal combustion enginesHONDA MOTOR CO LTD·Filed 1996·Granted Apr 15, 1997·39 cites·1 claims
- 4689US9612530B2Method and system for design of enhanced edge slope patterns for charged particle beam lithographyD2S INC·Filed 2016·Granted Apr 4, 2017·4 cites·16 claims
- 4789US9341936B2Method and system for forming a pattern on a reticle using charged particle beam lithographyD2S INC·Filed 2014·Granted May 17, 2016·9 cites·25 claims
- 4889US9323140B2Method and system for forming a pattern on a reticle using charged particle beam lithographyD2S INC·Filed 2014·Granted Apr 26, 2016·8 cites·26 claims
- 4989US8512919B2Method and system for design of a reticle to be manufactured using variable shaped beam lithographyD2S INC·Filed 2012·Granted Aug 20, 2013·4 cites·16 claims
- 5089US8057970B2Method and system for forming circular patterns on a surfaceFUJIMURA AKIRA·Filed 2009·Granted Nov 15, 2011·10 cites·20 claims
Showing the top 50 of 221 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →