Extreme ultra violet light source apparatus

Abstract

An extreme ultra violet light source apparatus prevents debris staying and accumulating within a chamber from contaminating the chamber and deteriorating the performance of an important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.

1 . An extreme ultra violet light source apparatus for generating extreme ultra violet light by applying a laser beam to a target, said apparatus comprising:
 a chamber in which extreme ultra violet light is generated;   a driver laser for applying a laser beam to a target supplied to a predetermined position within said chamber to generate plasma;   a collector mirror provided within said chamber, for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light;   an exhaust path communicating with said chamber and connected to an exhausting device, for maintaining an interior of said chamber at a certain pressure;   a catching chamber provided in said exhaust path, for catching debris generated from the plasma; and   a collecting unit for collecting the caught debris out of said chamber.   
     
     
         2 . An extreme ultra violet light source apparatus for generating extreme ultra violet light by applying a laser beam to a target, said apparatus comprising:
 a chamber in which extreme ultra violet light is generated;   a driver laser for applying a laser beam to a target supplied to a predetermined position within said chamber to generate plasma;   a collector mirror provided within said chamber, for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light;   an exhaust path communicating with said chamber and connected to an exhausting device, for maintaining an interior of said chamber at a certain pressure;   a catching and reaction chamber provided in said exhaust path, for catching debris generated from the plasma, and making the caught debris react with an reactive gas to generate a reaction product gas; and   a collecting unit connected to said exhaust path, for treating the reaction product gas to collect the caught debris out of said chamber.   
     
     
         3 . The extreme ultra violet light source apparatus according to  claim 2 , further comprising:
 a skimmer provided between said chamber and said exhaust path, and formed with a debris passage hole for passing the debris from said chamber to said exhaust path; and   a partition wall provided between said exhaust path and said catching and reaction chamber, and formed with a debris passage hole for passing the debris from said exhaust path to said catching and reaction chamber and an exhaust gas vent hole for passing the reactive gas and the reaction product gas from said catching and reaction chamber to said exhaust path.   
     
     
         4 . The extreme ultra violet light source apparatus according to  claim 2 , wherein said collecting unit is connected to said exhaust path and said catching and reaction chamber. 
     
     
         5 . The extreme ultra violet light source apparatus according to  claim 2 , further comprising:
 a switching valve communicating with said chamber, wherein said extreme ultra violet light source apparatus comprises plural exhaust paths respectively communicating with said collecting unit, and the plural exhaust paths to communicate with said chamber are switched by said switching valve.   
     
     
         6 . The extreme ultra violet light source apparatus according to  claim 2 , further comprising:
 a heating device provided in said catching and reaction chamber, for heating said reactive gas.   
     
     
         7 . The extreme ultra violet light source apparatus according to  claim 1 , further comprising:
 a charging device for charging neutral particles.   
     
     
         8 . The extreme ultra violet light source apparatus according to  claim 1 , further comprising:
 a magnetic field generating device including a coil that generates a magnetic field for focusing and guiding charged debris to said exhaust path.   
     
     
         9 . The extreme ultra violet light source apparatus according to  claim 1 , further comprising:
 a magnetic field generating device including at least two coils that generate magnetic fields for focusing and guiding charged debris to said exhaust path, wherein a diameter of a coil at an exhaust path side is larger than a diameter of a coil at an opposite side to said exhaust path.   
     
     
         10 . The extreme ultra violet light source apparatus according to  claim 1 , wherein said target includes tin (Sn). 
     
     
         11 . The extreme ultra violet light source apparatus according to  claim 1 , wherein said target includes a droplet target. 
     
     
         12 . The extreme ultra violet light source apparatus according to  claim 1 , wherein said target includes a wire target. 
     
     
         13 . The extreme ultra violet light source apparatus according to  claim 12 , wherein said wire target includes a coated wire target. 
     
     
         14 . The extreme ultra violet light source apparatus according to  claim 1 , wherein said drive laser includes a carbon dioxide (CO 2 ) laser.