US2013140485A1PendingUtilityA1
Method for producing abrasive grains, method for producing slurry, and method for producing polishing liquid
Est. expiryNov 22, 2030(~4.4 yrs left)· nominal 20-yr term from priority
H10P 95/062H10P 52/00C09K 3/14C09G 1/02C09K 3/1409C09K 3/1463C09K 13/00
49
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Claims
Abstract
In the production method for abrasive grains according to the invention, an aqueous solution of a salt of a tetravalent metal element is mixed with an alkali solution, under conditions such that a prescribed parameter is 5.00 or greater, to obtain abrasive grains including a hydroxide of the tetravalent metal element.
Claims
exact text as granted — not AI-modified1 - 15 . (canceled)
16 . A production method for abrasive grains, wherein a first liquid which is an aqueous solution of a salt of a tetravalent metal element is mixed with a second liquid which is an alkali solution, under conditions such that parameter Z in the following formula (1a) is 5.00 or greater, to yield abrasive grains including a hydroxide of the tetravalent metal element.
Z=[ 1/(ΔpH× k )]×( N/M )/1000 (1a)
[In formula (1a), ΔpH represents a variation in pH per minute in a reaction system, k represents a reaction temperature coefficient represented by the following formula (2), N represents a cycle count (min −1 ), and M represents a substitution count (min −1 ) represented by the following formula (5).]
k= 2 [(T-20)/10] (2)
[In formula (2), T represents a temperature (° C.) of the reaction system.]
M=v/Q (5)
[In formula (5), v represents a mixing rate (m 3 /min) of the first liquid and the second liquid, and Q represents a liquid volume (m 3 ) of the liquid mixture.]
17 . The production method according to claim 16 , wherein the ΔpH is not greater than 5.00.
18 . The production method according to claim 16 , wherein the cycle count N is 1.00 min −1 or greater.
19 . The production method according to claim 16 , wherein the substitution count M is not greater than 1.0 min −1 .
20 . The production method according to claim 16 , wherein a base of the alkali solution is a nitrogen-containing heterocyclic organic base.
21 . The production method according to claim 16 , wherein the mixing rate v is not greater than 1.00×10 −2 m 3 /min.
22 . The production method according to claim 16 , wherein the temperature T is not higher than 60° C.
23 . The production method according to claim 16 , wherein a concentration of the salt of a tetravalent metal element is the first liquid is 0.01 mol/L or greater.
24 . The production method according to claim 16 , wherein an alkaline concentration of the second liquid is not greater than 15.0 mol/L.
25 . The production method according to claim 16 , wherein a pH of the liquid mixture is 2.0 to 7.0.
26 . The production method according to claim 16 , wherein the tetravalent metal element is tetravalent cerium.
27 . A production method for a slurry, wherein abrasive grains obtained by the production method according to claim 16 are mixed with water to obtain a slurry.
28 . A production method for a polishing liquid, wherein a slurry obtained by the production method according to claim 27 is mixed with an additive to obtain a polishing liquid.
29 . A production method for a polishing liquid, wherein abrasive grains obtained by the production method according to claim 16 , an additive and water are mixed to obtain a polishing liquid.
30 . A production method for a slurry, wherein abrasive grains obtained by the production method according to claim 26 are mixed with water to obtain a slurry.
31 . A production method for polishing liquid, wherein a slurry obtained by the production method according to claim 30 is mixed with an additive to obtain a polishing liquid.
32 . A production method for a polishing liquid, wherein abrasive grains obtained by the production method according to claim 26 , an additive and water are mixed to obtain a polishing liquid.Cited by (0)
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