Assignee
IWANO TOMOHIRO
JP·5 granted patents·5 pending applications·27 citations·filing 2011–2013
Top patents by PatentIndex Score
10 records- 0188US9988573B2Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrateIWANO TOMOHIRO·Filed 2011·Granted Jun 5, 2018·7 cites·80 claims
- 0288US9881801B2Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrateIWANO TOMOHIRO·Filed 2011·Granted Jan 30, 2018·7 cites·82 claims
- 0387US9881802B2Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrateIWANO TOMOHIRO·Filed 2013·Granted Jan 30, 2018·6 cites·25 claims
- 0483US9982177B2Slurry, polishing fluid set, polishing fluid, and substrate polishing method using sameIWANO TOMOHIRO·Filed 2011·Granted May 29, 2018·6 cites·25 claims
- 0562US9039796B2Method for producing abrasive grains, method for producing slurry, and method for producing polishing liquidIWANO TOMOHIRO·Filed 2011·Granted May 26, 2015·1 cites·19 claims
- 0655US2013130501A1Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrateIWANO TOMOHIRO·Filed 2013·Application pending·0 cites
- 0755US2013244431A1Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrateIWANO TOMOHIRO·Filed 2013·Application pending·0 cites
- 0855US2013143404A1Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrateIWANO TOMOHIRO·Filed 2013·Application pending·0 cites
- 0949US2013140485A1Method for producing abrasive grains, method for producing slurry, and method for producing polishing liquidIWANO TOMOHIRO·Filed 2013·Application pending·0 cites
- 1049US2013139447A1Method for producing abrasive grains, method for producing slurry, and method for producing polishing liquidIWANO TOMOHIRO·Filed 2013·Application pending·0 cites
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