Inventor · disambiguated record
Tomohiro Iwano
Also filed as: IWANO TOMOHIRO
41 granted patents·14 pending applications·131 citations·filing 2010–2024
97Inventor score
Files withHITACHI CHEMICAL CO LTD28IWANO TOMOHIRO10SHOWA DENKO MATERIALS CO LTD8RESONAC CORP7MINAMI HISATAKA1
Top patents by PatentIndex Score
55 records- 0194US8728341B2Polishing agent, concentrated one-pack type polishing agent, two-pack type polishing agent and method for polishing substrateRYUZAKI DAISUKE·Filed 2010·Granted May 20, 2014·39 cites·21 claims
- 0293US10196542B2Abrasive, abrasive set, and method for abrading substrateHITACHI CHEMICAL CO LTD·Filed 2015·Granted Feb 5, 2019·9 cites·56 claims
- 0392US11518920B2Slurry, and polishing methodSHOWA DENKO MATERIALS CO LTD·Filed 2019·Granted Dec 6, 2022·4 cites·15 claims
- 0491US11505731B2Slurry and polishing methodSHOWA DENKO MATERIALS CO LTD·Filed 2018·Granted Nov 22, 2022·4 cites·16 claims
- 0591US11499078B2Slurry, polishing solution production method, and polishing methodSHOWA DENKO MATERIALS CO LTD·Filed 2018·Granted Nov 15, 2022·4 cites·18 claims
- 0691US11492526B2Slurry, method for producing polishing liquid, and polishing methodSHOWA DENKO MATERIALS CO LTD·Filed 2018·Granted Nov 8, 2022·4 cites·19 claims
- 0790US2025084294A1Slurry and polishing methodRESONAC CORP·Filed 2024·Application pending·0 cites
- 0890US2025129279A1Slurry, screening method, and polishing methodRESONAC CORP·Filed 2024·Application pending·0 cites
- 0989US2024425737A1Slurry, screening method, and polishing methodRESONAC CORP·Filed 2024·Application pending·0 cites
- 1088US9988573B2Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrateIWANO TOMOHIRO·Filed 2011·Granted Jun 5, 2018·7 cites·80 claims
- 1188US9881801B2Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrateIWANO TOMOHIRO·Filed 2011·Granted Jan 30, 2018·7 cites·82 claims
- 1288US9346978B2Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrateHITACHI CHEMICAL CO LTD·Filed 2013·Granted May 24, 2016·9 cites·39 claims
- 1387US9881802B2Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrateIWANO TOMOHIRO·Filed 2013·Granted Jan 30, 2018·6 cites·25 claims
- 1486US10131819B2Slurry, polishing solution set, polishing solution, and substrate polishing methodHITACHI CHEMICAL CO LTD·Filed 2014·Granted Nov 20, 2018·7 cites·35 claims
- 1586US9932497B2Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrateHITACHI CHEMICAL CO LTD·Filed 2013·Granted Apr 3, 2018·7 cites·36 claims
- 1686US9163162B2Polishing agent, polishing agent set and method for polishing baseHITACHI CHEMICAL CO LTD·Filed 2013·Granted Oct 20, 2015·7 cites·8 claims
- 1783US9982177B2Slurry, polishing fluid set, polishing fluid, and substrate polishing method using sameIWANO TOMOHIRO·Filed 2011·Granted May 29, 2018·6 cites·25 claims
- 1881US12104112B2Slurry, screening method, and polishing methodSHOWA DENKO MATERIALS CO LTD·Filed 2018·Granted Oct 1, 2024·1 cites·19 claims
- 1977US9346977B2Abrasive, abrasive set, and method for abrading substrateHITACHI CHEMICAL CO LTD·Filed 2013·Granted May 24, 2016·3 cites·13 claims
- 2074US2024336810A1Polishing liquid for cmp, polishing liquid set for cmp and polishing methodRESONAC CORP·Filed 2022·Application pending·0 cites
- 2174US2025115795A1Polishing liquid for cmp, polishing liquid set for cmp, and polishing methodRESONAC CORP·Filed 2022·Application pending·0 cites
- 2274US2024336809A1Polishing liquid for cmp, polishing liquid set for cmp, and polishing methodRESONAC CORP·Filed 2022·Application pending·0 cites
- 2373US9447306B2CMP polishing fluid, method for manufacturing same, method for manufacturing composite particle, and method for polishing base materialMINAMI HISATAKA·Filed 2012·Granted Sep 20, 2016·3 cites·17 claims
- 2471US10155886B2Polishing liquid for CMP, and polishing methodHITACHI CHEMICAL CO LTD·Filed 2014·Granted Dec 18, 2018·2 cites·11 claims
- 2570US11814548B2Polishing liquid, polishing liquid set, and polishing methodSHOWA DENKO MATERIALS CO LTD·Filed 2021·Granted Nov 14, 2023·0 cites·22 claims
- 2667US12173219B2Slurry and polishing methodSHOWA DENKO MATERIALS CO LTD·Filed 2018·Granted Dec 24, 2024·0 cites·21 claims
- 2763US10752807B2Slurry, polishing-liquid set, polishing liquid, method for polishing substrate, and substrateHITACHI CHEMICAL CO LTD·Filed 2014·Granted Aug 25, 2020·1 cites·37 claims
- 2862US11767448B2Polishing liquid, polishing liquid set, and polishing methodHITACHI CHEMICAL CO LTD·Filed 2019·Granted Sep 26, 2023·0 cites·29 claims
- 2962US11352523B2Polishing liquid, polishing liquid set and polishing methodHITACHI CHEMICAL CO LTD·Filed 2019·Granted Jun 7, 2022·0 cites·19 claims
- 3062US9039796B2Method for producing abrasive grains, method for producing slurry, and method for producing polishing liquidIWANO TOMOHIRO·Filed 2011·Granted May 26, 2015·1 cites·19 claims
- 3161US11578236B2Slurry, polishing-liquid set, polishing liquid, and polishing method for baseHITACHI CHEMICAL CO LTD·Filed 2020·Granted Feb 14, 2023·0 cites·25 claims
- 3261US11572490B2Polishing liquid, polishing liquid set, and polishing methodHITACHI CHEMICAL CO LTD·Filed 2018·Granted Feb 7, 2023·0 cites·19 claims
- 3360US10825687B2Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrateHITACHI CHEMICAL CO LTD·Filed 2017·Granted Nov 3, 2020·0 cites·15 claims
- 3460US2018251680A1Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrateHITACHI CHEMICAL CO LTD·Filed 2018·Application pending·0 cites
- 3558US10759968B2Abrasive, abrasive set, and method for polishing substrateHITACHI CHEMICAL CO LTD·Filed 2018·Granted Sep 1, 2020·0 cites·17 claims
- 3657US10030172B2Abrasive, abrasive set, and method for polishing substrateHITACHI CHEMICAL CO LTD·Filed 2014·Granted Jul 24, 2018·0 cites·8 claims
- 3756US10703947B2Slurry, polishing fluid set, polishing fluid, and substrate polishing method using sameHITACHI CHEMICAL CO LTD·Filed 2018·Granted Jul 7, 2020·0 cites·6 claims
- 3855US12258491B2Polishing liquid, polishing liquid set, and polishing methodSHOWA DENKO MATERIALS CO LTD·Filed 2021·Granted Mar 25, 2025·0 cites·21 claims
- 3955US11773291B2Polishing liquid, polishing liquid set, and polishing methodHITACHI CHEMICAL CO LTD·Filed 2018·Granted Oct 3, 2023·0 cites·21 claims
- 4055US2013130501A1Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrateIWANO TOMOHIRO·Filed 2013·Application pending·0 cites
- 4155US2013244431A1Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrateIWANO TOMOHIRO·Filed 2013·Application pending·0 cites
- 4255US2013143404A1Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrateIWANO TOMOHIRO·Filed 2013·Application pending·0 cites
- 4351US12247140B2Slurry and polishing methodRESONAC CORP·Filed 2018·Granted Mar 11, 2025·0 cites·16 claims
- 4450US11566150B2Slurry and polishing methodHITACHI CHEMICAL CO LTD·Filed 2017·Granted Jan 31, 2023·0 cites·7 claims
- 4550US10549399B2Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrateHITACHI CHEMICAL CO LTD·Filed 2013·Granted Feb 4, 2020·0 cites·35 claims
- 4649US2013140485A1Method for producing abrasive grains, method for producing slurry, and method for producing polishing liquidIWANO TOMOHIRO·Filed 2013·Application pending·0 cites
- 4749US2013139447A1Method for producing abrasive grains, method for producing slurry, and method for producing polishing liquidIWANO TOMOHIRO·Filed 2013·Application pending·0 cites
- 4847US10557059B2Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrateHITACHI CHEMICAL CO LTD·Filed 2013·Granted Feb 11, 2020·0 cites·39 claims
- 4947US10557058B2Polishing agent, polishing agent set, and substrate polishing methodHITACHI CHEMICAL CO LTD·Filed 2013·Granted Feb 11, 2020·0 cites·12 claims
- 5045US11655394B2Polishing solution and polishing methodHITACHI CHEMICAL CO LTD·Filed 2017·Granted May 23, 2023·0 cites·12 claims
Showing the top 50 of 55 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →