Patterning of magnetic thin film using energized ions and thermal excitation
Abstract
A method for patterning a magnetic thin film on a substrate includes: providing a pattern about the magnetic thin film, with selective regions of the pattern permitting penetration of energized ions of one or more elements. Energized ions are generated with sufficient energy to penetrate selective regions and a portion of the magnetic thin film adjacent the selective regions. The substrate is placed to receive the energized ions. The portion of the magnetic thin film is subjected to thermal excitation. The portions of the magnetic thin film are rendered to exhibit a magnetic property different than selective other portions. A method for patterning a magnetic media with a magnetic thin film on both sides of the media is also disclosed.
Claims
exact text as granted — not AI-modified1 . An apparatus for processing recording media, comprising:
a process chamber; a substrate support disposed within the process chamber, the substrate support having a surface with a plurality of substrate support sites thereon, the substrate support adapted to support a plurality of magnetic recording media; a power supply coupled to the process chamber and adapted to generate a plasma; and a doping gas supply coupled to the process chamber and adapted to provide a doping gas to the interior of the process chamber.
2 . The apparatus of claim 1 , further comprising:
an annealing chamber; and a substrate handler adapted to transfer the plurality of magnetic recording media from the process chamber to the annealing chamber.
3 . The apparatus of claim 1 , wherein the substrate support comprises a conductive surface.
4 . The apparatus of claim 1 , wherein the substrate support comprises a plasma-protective coating.
5 . The apparatus of claim 1 , wherein the substrate support is a rod.
6 . The apparatus of claim 5 , wherein the rod includes a graphite coating thereon.
7 . The apparatus of claim 5 , wherein the rod includes a silicon coating thereon.
8 . The apparatus of claim 5 , further comprising a plurality of clamps for affixing substrates to the support.
9 . The apparatus of claim 1 , further comprising a plurality of clamps for affixing substrates to the support.
10 . The apparatus of claim 1 , wherein the power supply is an RF power supply and is connected between the substrate support and a wall of the process chamber.
11 . The apparatus of claim 10 , further comprising a direct current power supply for applying a bias to substrates supported on the substrate support.
12 . An apparatus for processing recording media, comprising:
a process chamber; a substrate support disposed within the process chamber, the substrate support having a surface with a plurality of substrate support sites thereon, the substrate support adapted to support a plurality of magnetic recording media; an RF power supply connected between the substrate support and a wall of the process chamber; and a doping gas supply coupled to the process chamber through a pipe and a valve and adapted to provide a doping gas to the interior of the process chamber.
13 . The apparatus of claim 12 , further comprising a direct current power supply for applying a bias to substrates supported on the substrate support.
14 . The apparatus of claim 13 , wherein the substrate support is a rod.
15 . The apparatus of claim 14 , wherein the rod includes a silicon coating thereon.
16 . The apparatus of claim 14 , wherein the rod includes a graphite coating thereon.
17 . The apparatus of claim 15 , further comprising a plurality of clamps for affixing substrates to the support.
18 . The apparatus of claim 16 , further comprising a plurality of clamps for affixing substrates to the support.Join the waitlist — get patent alerts
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