Method and system for uniformly applying a multi-phase cleaning solution to a substrate

Abstract

A system for cleaning a substrate includes a carrier and a cleaning station. The carrier is capable of holding the substrate and is movably coupled to a pair of guide tracks extending a length of the system. The cleaning station includes a force applicator, a gate and a dispenser. The force applicator has an applicator length and is coupled to the cleaning station, is rotatable and is adjustable to a first height off the surface of the carrier during cleaning. The gate is a hollow structure disposed at a trailing edge of the force applicator. The gate is set to a height off the carrier surface that is less than or equal to the first height. The gate includes a gate length that at least spans the applicator length. The dispenser is disposed at a leading edge of the force applicator and is configured to supply cleaning solution during cleaning.

What is claimed is: 
     
         1 . A system for cleaning a substrate having surface contaminants thereon, comprising:
 a carrier capable of holding the substrate and movably coupled to a pair of guide tracks extending along a length of the system;   a cleaning station including a force applicator, a gate and a dispenser,   wherein the force applicator has an applicator length and is operatively connected to the cleaning station above a surface of the carrier and the pair of guide tracks, wherein the force applicator is rotatable, the force applicator is set to a first height off the surface of the carrier as the substrate is being cleaned,   wherein the gate is disposed at an adjacent orientation and at a trailing edge of the force applicator, the gate is a hollow structure and is set to a height off the surface of the carrier, wherein the height of the gate is less than or equal to the first height, the gate having a gate length that extends to at least span the applicator length,   wherein the dispenser is disposed at an adjacent orientation to a leading edge of the force applicator, the dispenser configured to supply a cleaning solution during cleaning of the substrate.   
     
     
         2 . The system of  claim 1 , wherein the force applicator is a hollow structure with a plurality of internal channels and openings dispersed throughout the applicator length of the force applicator, the plurality of channels and openings configured to dispense the cleaning solution to a surface of the substrate. 
     
     
         3 . The system of  claim 1 , wherein the force applicator is rotatable along an axis of rotation that is parallel to the surface of the substrate. 
     
     
         4 . The system of  claim 1 , wherein the force applicator is comprised of a flexible material enclosed around a plurality of drums, the drums configured to impart rotational motion to the flexible material around the drums. 
     
     
         5 . The system of  claim 1 , wherein the force applicator includes a plurality of baffles distributed along a longitudinal surface of the force applicator so as to align with an axis of rotation of the force applicator, the baffles configured to apply a force against the cleaning solution, wherein the first height of the force applicator adjusted to prevent the baffles from contacting the surface of the substrate. 
     
     
         6 . The system of  claim 1 , wherein the force applicator is disposed separately from the gate to allow the force applicator to move independent of the gate. 
     
     
         7 . The system of  claim 1 , wherein the force applicator, the gate and the dispenser are mounted on a mechanical arm to enable movement across the surface of the substrate in unison. 
     
     
         8 . The system of  claim 1 , wherein the gate is affixed to the trailing edge of the force applicator via one or more arm extensions, wherein the arm extensions are operatively connected to rotational axis at one or more edge surfaces of the force applicator and are configured to enable adjustment of the height of the gate relative to the surface of the carrier. 
     
     
         9 . The system of  claim 1 , wherein the gate has a partial annular shape with an arch beginning from above the substrate surface to cover a top surface of the force applicator, the arch of the gate defined to provide sufficient space for the force applicator to rotate. 
     
     
         10 . The system of  claim 1 , wherein the dispenser is attached to a portion of the gate positioned over the force applicator so as to supply the cleaning solution to the force applicator and the surface of the substrate. 
     
     
         11 . The system of  claim 1 , wherein the dispenser is a nozzle that is positioned to supply the cleaning solution directly to the leading edge of the force applicator. 
     
     
         12 . The system of  claim 1 , wherein the dispenser is a manifold that stretches entire applicator length of the force applicator and is configured to supply the cleaning solution directly to the surface of the substrate. 
     
     
         13 . The system of  claim 1 , further includes one or more motorized drive units, the motorized drive units attached to the force applicator so as to adjust a vertical distance of the force applicator from the surface of the carrier and to rotate the force applicator toward a surface of the substrate, when present, during cleaning. 
     
     
         14 . The system of  claim 1 , further includes a containment housing in which the first cleaning station including the force applicator, the dispenser and the gate is disposed, the containment housing includes a mechanical arm attached to a side of the containment housing, wherein the mechanical arm is used for mounting the force applicator, the dispenser and the gate so as to move the force applicator, the gate and the dispenser in unison across the length of the system. 
     
     
         15 . A system for cleaning a substrate having surface contaminants thereon, comprising:
 a vacuum chuck configured to hold the substrate and impart a rotational velocity to the substrate;   a cleaning station including a force applicator and a gate,
 wherein the force applicator has an applicator length that covers a diameter of the substrate, when present, and is operatively connected to the cleaning station above a surface of the vacuum chuck, wherein the force applicator is rotatable along an axis of rotation that is parallel to the surface of the substrate, the force applicator is set to a first height off the surface of the vacuum chuck as the substrate is being cleaned, 
 wherein the gate is affixed to a trailing edge of the force applicator via one or more arm extensions, the gate is defined as a hollow structure and is set to a height off the surface of the vacuum chuck, wherein the height of the gate is less than or equal to the first height, the gate includes a gate length that extends to at least span the applicator length. 
   
     
     
         16 . the system of  claim 15 , wherein the force applicator is a hollow structure with a plurality of internal channels and openings dispersed throughout the applicator length of the force applicator, the plurality of channels and openings configured to dispense a cleaning solution to a surface of the substrate 
     
     
         17 . The system of  claim 15 , wherein the first height ranges between about 0.1 mm to about 5 mm from the surface of the vacuum chuck. 
     
     
         18 . The system of  claim 15 , wherein the arm extensions are configured to enable adjustment of the height of the gate relative to the surface of the substrate disposed over the vacuum chuck, when present. 
     
     
         19 . The system of  claim 15 , wherein the force applicator includes a plurality of baffles disposed along a longitudinal surface of the force applicator, the plurality of baffles aligned with an axis of rotation of the force applicator, the baffles configured to apply a force against the cleaning solution.