Method and apparatus for surface processing of a substrate using an energetic particle beam

Abstract

Method and apparatus for processing a substrate with an energetic particle beam. Features on the substrate are oriented relative to the energetic particle beam and the substrate is scanned through the energetic particle beam. The substrate is periodically indexed about its azimuthal axis of symmetry, while shielded from exposure to the energetic particle beam, to reorient the features relative to the major dimension of the beam.

We claim: 
     
         1 . A system for processing a substrate with an energetic particle beam, the system comprising:
 a source configured to emit the energetic particle beam, said source having a major dimension, and said source configured to distribute the beam with a substantially uniform flux distribution across at least a portion of said major dimension;   a vacuum chamber containing said source and including a treatment zone across which the beam impinges the substrate; and   a fixture disposed inside said vacuum chamber at a position spaced from said source, said fixture includes a first stage configured to hold the substrate and a second stage adapted to translate said first stage relative to said source, said first stage configured to index the substrate about an azimuthal axis to different angular orientations, and said second stage capable of translating the substrate through said treatment zone with each of said different angular orientations and to a parking area outside of said treatment zone in which said first stage is used to index the substrate.   
     
     
         2 . The system of  claim 1  wherein said second stage is adapted to translate the substrate linearly relative to said major dimension of said source within said treatment zone. 
     
     
         3 . The system of  claim 1  wherein said second stage is adapted to translate the substrate in an arc having a radius of curvature such that a direction of movement within said treatment zone is substantially perpendicular to said major dimension of said source. 
     
     
         4 . The system of  claim 1  wherein said source is adapted to move relative to the substrate in an arc substantially perpendicular to said major dimension of said source for changing an average incident angle of the ion beam relative to the substrate. 
     
     
         5 . The system of  claim 1  further comprising:
 a third stage configured to tilt said first stage about a pivot axis aligned with said major axis of said source so that said azimuthal axis is inclined tilted relative to a direction of the energetic particle beam to define an angle of incidence.