Immersion exposure apparatus and method with detection of liquid on members of the apparatus

Abstract

An exposure apparatus which prevents the damage due to the liquid having flowed out from spreading and enables satisfactory performances of the exposure processes and the measurement processes is provided. An exposure apparatus (EX) includes a movable table (PT), a base member ( 41 ) having an upper surface ( 41 A) that guides the movement of the table (PT), and a detecting device ( 60 ) that detects whether there is a liquid on the upper surface ( 41 A) of the base member ( 41 ).

1 - 37 . (canceled) 
     
     
         38 . An exposure apparatus comprising:
 a projection optical system including a final optical element disposed most closely to an image surface of the projection optical system;   a stage system having a first stage and a second stage which are movable such that a distance between the first and second stages is changed;   a nozzle member having an opening through which an exposure light can pass, a liquid supply opening via which immersion liquid is supplied, and a liquid recovery opening via which the supplied immersion liquid is collected,   a detecting device disposed below the image surface of the projection optical system, by which a leakage of the immersion liquid is detected; and   a controller,   wherein:   a liquid immersion area of the immersion liquid is formed under the final optical element while supplying the immersion liquid via the liquid supply opening and collecting the supplied immersion liquid via the liquid recovery opening,   the controller controls the stage system such that the first and second stages come close to each other and to move the close first and second stages so as to move the liquid immersion area between an upper surface of the first stage and an upper surface of the second stage, and   a substrate held by one of the first and second stages is exposed with the exposure light through the liquid immersion area covering a portion of an upper surface of the substrate.   
     
     
         39 . The apparatus according to  claim 38 , further comprising a base member over which the first and second stages are moved, wherein the detecting device detects the immersion liquid leaked onto the base member. 
     
     
         40 . The apparatus according to  claim 38 , wherein the detecting device detects the immersion liquid leaked onto a member other than the base member. 
     
     
         41 . The apparatus according to  claim 38 , wherein the other of the first and second stages is a measurement stage. 
     
     
         42 . The apparatus according to  claim 38 , wherein the first stage and the second stage comprise respective tables with respective surfaces facing the projection optical system and perpendicular to an optical axis of the projection optical system, and wherein the substrate is disposed on the surface of the table of the one of the first and second stages and the other of the surfaces is provided with measurement marks and light sensors. 
     
     
         43 . The apparatus according to  claim 38 , wherein the controller controls the stage system such that the first and second stages that have come close to each other are moved unitarily, without separating the stages, to move the liquid immersion area between an upper surface of the first stage and an upper surface of the second stage. 
     
     
         44 . The apparatus according to  claim 38 , wherein the detecting device includes a light projecting portion and a light receiving portion corresponding to the light projecting portion. 
     
     
         45 . The apparatus according to  claim 44 , wherein the light projecting portion and the light receiving portion are attached to fixed members of the exposure apparatus. 
     
     
         46 . The apparatus according to  claim 38 , wherein the first and second stages have air bearings that support the stages on the base member, and wherein surfaces of the air bearings facing the base member have elements of the detecting device thereon. 
     
     
         47 . A twin-stage exposure method, comprising:
 providing a projection optical system including a final optical element disposed most closely to an image surface of the projection optical system;   providing a stage system having a first stage and a second stage which are movable such that a distance between the first and second stages is changed;   providing a nozzle member having an opening through which an exposure light from the projection optical system can pass, a liquid supply opening via which immersion liquid is supplied, and a liquid recovery opening via which the supplied immersion liquid is collected;   providing a detecting device disposed below the image surface of the projection optical system, by which a leakage of the immersion liquid is detected; and   providing a controller;   forming a liquid immersion area of the immersion liquid under the final optical element while supplying the immersion liquid via the liquid supply opening and collecting the supplied immersion liquid via the liquid recovery opening;   causing the controller to control the stage system such that the first and second stages come close to each other and to move the close first and second stages so as to move the liquid immersion area between an upper surface of the first stage and an upper surface of the second stage, and   exposing a substrate held by one of the first and second stages with the exposure light through the liquid immersion area covering a portion of an upper surface of the substrate.   
     
     
         48 . The method according to  claim 47 , further comprising, using the detecting device to detect immersion liquid leaked onto a base member over which the first and second stages are moved or onto a member other than the base member. 
     
     
         49 . A method of manufacturing an exposure apparatus, comprising:
 forming a projection optical system including a final optical element disposed most closely to an image surface of the projection optical system;   forming a stage system having a first stage and a second stage which are movable such that a distance between the first and second stages is changed;   forming a nozzle member having an opening through which an exposure light from the projection optical system can pass, a liquid supply opening via which an immersion liquid is supplied, and a liquid recovery opening via which supplied immersion liquid is collected;   forming a detecting device disposed below the image surface of the projection optical system, by which a leakage of the immersion liquid is detected; and   forming a controller that controls the stage system such that the first and second stages come close to each other and to move the close first and second stages so as to move a liquid immersion area of the immersion liquid between an upper surface of the first stage and an upper surface of the second stage,   wherein: the liquid immersion area of the immersion liquid is adapted to be formed under the final optical element while supplying the immersion liquid via the liquid supply opening and collecting the supplied immersion liquid via the liquid recovery opening, and   wherein one of the first and second stages is adapted to hold a substrate to be exposed with the exposure light through the liquid immersion area covering a portion of an upper surface of the substrate.